Patents by Inventor Mingyeong Jeong

Mingyeong Jeong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12319860
    Abstract: An etchant composition is disclosed that provides selective etching of an indium oxide film or a sliver-containing metal layer. The etchant composition includes nitric acid, an organic acid, a sulfur compound, and a tin compound. The organic acid does not include the elements of sulfur and tin. The sulfur compound does not include the element of tin. The etchant composition may minimize the damage of a lower metal film and may exhibit excellent etching characteristics in terms of etching rate, bias, residue, precipitation, and etching uniformity.
    Type: Grant
    Filed: November 25, 2022
    Date of Patent: June 3, 2025
    Assignees: Samsung Display Co., Ltd., ENF TECHNOLOGY CO., LTD.
    Inventors: Hyoungsik Kim, Jonghee Park, Sehoon Kim, Boyeon Lee, Yangryeong Kim, Seokil Jung, Ikjoon Kim, Sangseung Park, Wonho Noh, Mingyeong Jeong
  • Publication number: 20230167360
    Abstract: An etchant composition is disclosed that provides selective etching of an indium oxide film or a sliver-containing metal layer. The etchant composition includes nitric acid, an organic acid, a sulfur compound, and a tin compound. The organic acid does not include the elements of sulfur and tin. The sulfur compound does not include the element of tin. The etchant composition may minimize the damage of a lower metal film and may exhibit excellent etching characteristics in terms of etching rate, bias, residue, precipitation, and etching uniformity.
    Type: Application
    Filed: November 25, 2022
    Publication date: June 1, 2023
    Inventors: Hyoungsik Kim, Jonghee Park, Sehoon Kim, Boyeon Lee, Yangryeong Kim, Seokil Jung, Ikjoon Kim, Sangseung Park, Wonho Noh, Mingyeong Jeong