Abstract: An integrated circuit (IC) chip includes a via contact plug extending inside a through hole passing through a substrate and a device layer, a via contact liner surrounding the via contact plug, a connection pad liner extending along a bottom surface of the substrate, a dummy bump structure integrally connected to the via contact plug, and a bump structure connected to the connection pad liner. A method of manufacturing an IC chip includes forming an under bump metallurgy (UBM) layer inside and outside the through hole and forming a first connection metal layer, a second connection metal layer, and a third connection metal layer. The first connection metal layer covers the UBM layer inside the through hole, the second connection metal layer is integrally connected to the first connection metal layer, and the third connection metal layer covers the UBM layer on the connection pad liner.

Abstract: A display driver integrated circuit (IC) device includes a first substrate having a first front surface and a first back surface; a first interlayer insulating layer on the first front surface; a wiring layer in the first interlayer insulating layer; a first bonding insulating layer on the first interlayer insulating layer; a second substrate having a second front surface and a second back surface, the second front surface being disposed toward the first front surface; a second interlayer insulating layer on the second front surface a second bonding insulating layer on the second interlayer insulating layer and physically bonded to the first bonding insulating layer; and a back via stack structure penetrating the second substrate, the second interlayer insulating layer, the second bonding insulating layer, the first bonding insulating layer, and the first interlayer insulating layer and electrically connected to the wiring layer.

Abstract: A method of manufacturing a semiconductor device includes providing a substrate including a first region and a second region, forming a first channel layer in the first region of the substrate, forming an isolation region in the substrate to electrically isolate a portion of the first region from a portion of the second region, etching an upper surface of the second region of the substrate, forming a protection layer covering the first channel layer in the first region of the substrate and the second region of the substrate, removing the protection layer on the second region of the substrate, forming a gate insulation material layer on the protection layer and on the second region of the substrate, and removing the gate insulation material layer and the protection layer on the first region of the substrate.

Abstract: An integrated circuit (IC) chip includes a via contact plug extending inside a through hole passing through a substrate and a device layer, a via contact liner surrounding the via contact plug, a connection pad liner extending along a bottom surface of the substrate, a dummy bump structure integrally connected to the via contact plug, and a bump structure connected to the connection pad liner. A method of manufacturing an IC chip includes forming an under bump metallurgy (UBM) layer inside and outside the through hole and forming a first connection metal layer, a second connection metal layer, and a third connection metal layer. The first connection metal layer covers the UBM layer inside the through hole, the second connection metal layer is integrally connected to the first connection metal layer, and the third connection metal layer covers the UBM layer on the connection pad liner.

Abstract: A display driver integrated circuit (IC) device includes a first substrate having a first front surface and a first back surface; a first interlayer insulating layer on the first front surface; a wiring layer in the first interlayer insulating layer; a first bonding insulating layer on the first interlayer insulating layer; a second substrate having a second front surface and a second back surface, the second front surface being disposed toward the first front surface; a second interlayer insulating layer on the second front surface a second bonding insulating layer on the second interlayer insulating layer and physically bonded to the first bonding insulating layer; and a back via stack structure penetrating the second substrate, the second interlayer insulating layer, the second bonding insulating layer, the first bonding insulating layer, and the first interlayer insulating layer and electrically connected to the wiring layer.

Abstract: An integrated circuit (IC) chip includes a via contact plug extending inside a through hole passing through a substrate and a device layer, a via contact liner surrounding the via contact plug, a connection pad liner extending along a bottom surface of the substrate, a dummy bump structure integrally connected to the via contact plug, and a bump structure connected to the connection pad liner. A method of manufacturing an IC chip includes forming an under bump metallurgy (UBM) layer inside and outside the through hole and forming a first connection metal layer, a second connection metal layer, and a third connection metal layer. The first connection metal layer covers the UBM layer inside the through hole, the second connection metal layer is integrally connected to the first connection metal layer, and the third connection metal layer covers the UBM layer on the connection pad liner.

Abstract: A display driver integrated circuit (IC) device includes a first substrate having a first front surface and a first back surface; a first interlayer insulating layer on the first front surface; a wiring layer in the first interlayer insulating layer; a first bonding insulating layer on the first interlayer insulating layer; a second substrate having a second front surface and a second back surface, the second front surface being disposed toward the first front surface; a second interlayer insulating layer on the second front surface a second bonding insulating layer on the second interlayer insulating layer and physically bonded to the first bonding insulating layer; and a back via stack structure penetrating the second substrate, the second interlayer insulating layer, the second bonding insulating layer, the first bonding insulating layer, and the first interlayer insulating layer and electrically connected to the wiring layer.

Abstract: A method of manufacturing a semiconductor device includes providing a substrate including a first region and a second region, forming a first channel layer in the first region of the substrate, forming an isolation region in the substrate to electrically isolate a portion of the first region from a portion of the second region, etching an upper surface of the second region of the substrate, forming a protection layer covering the first channel layer in the first region of the substrate and the second region of the substrate, removing the protection layer on the second region of the substrate, forming a gate insulation material layer on the protection layer and on the second region of the substrate, and removing the gate insulation material layer and the protection layer on the first region of the substrate.

Abstract: A display driver integrated circuit (IC) device includes a first substrate having a first front surface and a first back surface; a first interlayer insulating layer on the first front surface; a wiring layer in the first interlayer insulating layer; a first bonding insulating layer on the first interlayer insulating layer; a second substrate having a second front surface and a second back surface, the second front surface being disposed toward the first front surface; a second interlayer insulating layer on the second front surface a second bonding insulating layer on the second interlayer insulating layer and physically bonded to the first bonding insulating layer; and a back via stack structure penetrating the second substrate, the second interlayer insulating layer, the second bonding insulating layer, the first bonding insulating layer, and the first interlayer insulating layer and electrically connected to the wiring layer.

Abstract: An integrated circuit (IC) chip includes a via contact plug extending inside a through hole passing through a substrate and a device layer, a via contact liner surrounding the via contact plug, a connection pad liner extending along a bottom surface of the substrate, a dummy bump structure integrally connected to the via contact plug, and a bump structure connected to the connection pad liner. A method of manufacturing an IC chip includes forming an under bump metallurgy (UBM) layer inside and outside the through hole and forming a first connection metal layer, a second connection metal layer, and a third connection metal layer. The first connection metal layer covers the UBM layer inside the through hole, the second connection metal layer is integrally connected to the first connection metal layer, and the third connection metal layer covers the UBM layer on the connection pad liner.