Abstract: Disclosed is a method of unilateral biportal endoscopy and a surgical instrument set used in the same. More particularly, the present invention relates to a method of unilateral biportal endoscopy which separately secures a working portal for surgical instruments and an endoscopic portal for an endoscope, thereby providing a more accurate spinal surgery, and to a surgical instrument set which can be effectively applied to the method.

Abstract: A direction adjustable surgical tissue removal device, including: an insert rod having a stopping step at a front end; a slider slidably coupled to the insert rod, moving forward and backward with respect to the stopping step, and having a punching portion forming a jaw in cooperation with the stopping step; a rotary shaft being a hollow member fixed behind the insert rod and rotated by a user; a pushing rod having a front end fixed to the slider sequentially through the rotary shaft and the insert rod and a rear end extending backward; a spring disposed between the rotary shaft and the rear end of the pushing rod and elastically supporting the pushing rod backward; and a handle accommodating a portion of the rotary shaft and moving the pushing rod forward such that the punching portion is pushed toward the stopping step.

Abstract: A dish washing machine having a structure allowing wash water to be evenly sprayed into a washing tub. The dish washing machine includes a cabinet forming an external appearance of the dish washing machine, a washing tub arranged in the cabinet and allowing dishes to be washed therein, a dish basket arranged in the washing tub to accommodate the dishes, a spray unit to spray wash water into the washing tub, a diversion unit arranged inside a flow passage of wash water to divert the wash water sprayed from the spray unit, and a guide member coupled to one side of the diversion unit to allow the diversion unit to move within the washing tub. As the spray unit and the diversion unit are provided, a dead zone which wash water does not reach may be eliminated, and divided and intensive washing may be implemented in the washing tub.

Abstract: This invention relates to a hemostatic member using chitosan having superior hemostatic activity, and more particularly to a chitosan-based hemostatic member for the cervix, suitable for use through insertion into an affected part upon cervical biopsy or surgery, configured to include a hemostatic pack having a projection at an upper end thereof through tying with a thread so as to form a spherical shape using chitosan nonwoven fabrics having a hemostatic function, wherein the thread contains an X-ray-sensitive material, thereby realizing effective hemostasis of the affected part upon cervical biopsy or surgery.

Abstract: Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity and planarization characteristics, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.

Abstract: The present invention relates to a high-frequency treatment device for spinal endoscopic surgery, the device including: a casing; an insert rod extending in a longitudinal direction of the casing; and an electrode tip formed at a front end of the insert rod to apply heat to a treatment part. Accordingly, it is possible to not only immediately remove in-body soft tissues or ligaments that interfere with the visual field of an endoscope in an operation, but quickly stop bleeding, and it is also possible to discharge contaminated substances with a saline solution from a treatment part, thereby allowing an accurate and effective operation.

Abstract: A dish washing machine having a structure allowing wash water to be evenly sprayed into a washing tub. The dish washing machine includes a cabinet forming an external appearance of the dish washing machine, a washing tub arranged in the cabinet and allowing dishes to be washed therein, a dish basket arranged in the washing tub to accommodate the dishes, a spray unit to spray wash water into the washing tub, a diversion unit arranged inside a flow passage of wash water to divert the wash water sprayed from the spray unit, and a guide member coupled to one side of the diversion unit to allow the diversion unit to move within the washing tub. As the spray unit and the diversion unit are provided, a dead zone which wash water does not reach may be eliminated, and divided and intensive washing may be implemented in the washing tub.

Abstract: The present invention relates to a dishwasher and a method for controlling same, and the dishwasher may comprise a wash tub having an opening on at least one side thereof; a spray nozzle, provided in the interior of the wash tub, for spraying wash water; a reflecting module capable of moving in the interior of the wash tub, and reflecting the wash water sprayed by the spray nozzle; and a moving module, to which the reflecting module is detachably attached, for moving same in at least one direction.

Abstract: The present invention relates to a dishwasher and a method for controlling same, and the dishwasher may comprise a wash tub having an opening on at least one side thereof; a spray nozzle, provided in the interior of the wash tub, for spraying wash water; a reflecting module capable of moving in the interior of the wash tub, and reflecting the wash water sprayed by the spray nozzle; and a moving module, to which the reflecting module is detachably attached, for moving same in at least one direction.

Abstract: A method of preparing a low-molecular lignin derivative comprises the step of: preparing lignin by hydrolyzing lignocellulosic biomass with an acid; preparing a first mixture by mixing 100 parts by weight of the lignin and 500 parts or more by weight of a phenolic compound; preparing a second mixture by mixing the first mixture with a solvent including the hydrophobic polar solvent; and recovering a low-molecular lignin derivative from the second mixture.

Abstract: A dishwasher includes a tub that accommodates dishes; a nozzle assembly that sprays washing water; a vane assembly that is moved between a first position and a second position of an inside of the tub and changes a progression path of the washing water so that the sprayed washing water can be directed toward the dishes; and a controller that moves the vane assembly to the second position if the vane assembly is disposed at the first position. When a linear washing portion washes a small quantity of dishes by spraying washing water while making a reciprocal motion in part of an inside of a washing chamber, a washing time can be reduced, and concentrated washing can also be performed.

Abstract: A dishwasher includes a tub that accommodates dishes; a nozzle assembly that sprays washing water; a vane assembly that is moved between a first position and a second position of an inside of the tub and changes a progression path of the washing water so that the sprayed washing water can be directed toward the dishes; and a controller that moves the vane assembly to the second position if the vane assembly is disposed at the first position. When a linear washing portion washes a small quantity of dishes by spraying washing water while making a reciprocal motion in part of an inside of a washing chamber, a washing time can be reduced, and concentrated washing can also be performed.

Abstract: Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity, planarization characteristic, and excellent thermal resistance, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.

Abstract: A dish washing machine including a drive unit to drive a vane. The drive unit includes a motor to generate driving force, a belt connected to a drive pulley and an idle pulley to transfer the driving force of the motor to the vane the motor, a rail to guide movement of the vane, a rear holder to rotatably support the drive pulley, the rear holder being coupled to one end of the rail by tension of the belt, and a front holder to rotatably support idle pulley, the front holder being coupled to the other end of the rail by the tension of the belt.

Abstract: A rigid polyurethane foam which is a polymerization product of a composition including a concentrated acid hydrolytic lignin, a polyol, and an isocyanate, and a method of preparing the rigid polyurethane foam.

Abstract: Provided are a fluoreneol-based monomer, a polymer for preparing a resist underlayer film obtained therefrom, a resist underlayer film composition containing the polymer, and a method for forming a resist underlayer film using the resist underlayer film composition, wherein the fluoreneol-based monomer is represented by Chemical Formula 2 below:

Abstract: A washing machine includes: a cabinet; a tub; a pump case provided so as to drain washing water; a pump filter that filters foreign substances in washing water and is able to be detached from the pump case; and a pump filter head that is combined with one side of the pump filter and causes the pump filter to rotate, wherein the pump filter head includes: a first head having a first state in which the first head is engaged with one side of the pump case and is combined with the pump case and a second state in which the first head is released from the pump case; and a second head that is positioned at front of the first head and is rotatable separately from the first head in the first state. A user can recognize whether the pump filter is fully fastened to the pump case.

Abstract: Provided are a polymer for an underlayer film, used in semiconductor and display manufacturing processes, an underlayer film composition for semiconductor and display manufacturing processes, containing the same, and a method for forming an underlayer film for semiconductor and display manufacturing processes using the underlayer film composition. The polymer according to the present invention is a polymer including a repeating unit represented by the following Chemical Formula 1: in Chemical Formula 1, Ar, R1 to R6, L, and R? and R? are the same as those in the detailed description of the present invention.

Abstract: Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity, planarization characteristic, and excellent thermal resistance, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.

Abstract: Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity and planarization characteristics, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.