Abstract: A display device and a method of manufacturing the same are provided. The display device comprises a substrate comprising a display area in which emission areas are arranged, a main non-display area around the display area, a hole area surrounded by the display area, and an additional non-display area between the hole area and the display area; a circuit layer; a light emitting element layer; a sealing layer; a through portion in the hole area and penetrating at least the substrate; and sealing auxiliary structures in the additional non-display area and sequentially surrounding the hole area. Each of the sealing auxiliary structures comprises a first undercut portion in which a first cover layer protrudes from a first main layer; and a second undercut portion in which a second cover layer protrudes from a second main layer.

Abstract: A deposition mask for making a display device, the deposition mask includes: a frame including a first opening; a first member disposed above the first opening of the frame and including a first portion surrounding at least one second opening and a second portion disposed in the second opening and physically separated from the first portion; and a second member disposed on the first member and including a first connecting portion connected to the frame and a second mesh portion overlapping the second portion.

Abstract: A deposition mask for making a display device, the deposition mask includes: a frame including a first opening; a first member disposed above the first opening of the frame and including a first portion surrounding at least one second opening and a second portion disposed in the second opening and physically separated from the first portion; and a second member disposed on the first member and including a first connecting portion connected to the frame and a second mesh portion overlapping the second portion.

Abstract: A deposition mask unit includes a deposition mask sheet including a plurality of openings, and a deposition mask frame including a raised portion at which the deposition mask sheet is attachable to the deposition mask frame. The raised portion includes a support portion, and a bonding portion protruding from an upper surface of the support portion, an upper surface of the bonding portion being curved.

Abstract: A deposition mask for making a display device, the deposition mask includes: a frame including a first opening; a first member disposed above the first opening of the frame and including a first portion surrounding at least one second opening and a second portion disposed in the second opening and physically separated from the first portion; and a second member disposed on the first member and including a first connecting portion connected to the frame and a second mesh portion overlapping the second portion.

Abstract: A deposition mask unit includes a deposition mask sheet including a plurality of openings, and a deposition mask frame including a raised portion at which the deposition mask sheet is attachable to the deposition mask frame. The raised portion includes a support portion, and a bonding portion protruding from an upper surface of the support portion, an upper surface of the bonding portion being curved.

Abstract: The present invention relates to a display device and a manufacturing method thereof, wherein a spoilage layer generated in a manufacturing process is removed, and a manufacturing method of a display device according to an exemplary embodiment of the present invention includes: forming a thin film transistor on a substrate including a plurality of pixel areas; forming a pixel electrode connected to the thin film transistor in the pixel area; forming a sacrificial layer on the pixel electrode; forming a barrier layer on the sacrificial layer; forming a common electrode on the barrier layer; forming a roof layer on the common electrode; patterning the barrier layer, the common electrode, and the roof layer to exposed a portion of the sacrificial layer thereby forming an injection hole; removing the sacrificial layer to form a microcavity for a plurality of pixel areas; removing the barrier layer.

Abstract: A device for monitoring a liquid crystal display includes: a substrate including a display region and a non-display region disposed at an edge of the display region. The display region includes: a thin film transistor disposed on the substrate, a pixel electrode disposed on the substrate and connected to the thin film transistor, a first sacrificial layer disposed on the pixel electrode, and a roof layer disposed on the sacrificial layer. The non-display region includes: a second sacrificial layer disposed on the substrate, and the roof layer disposed on the second sacrificial layer. The first sacrificial layer has a first longitudinal dimension and a first cross-sectional area, and the second sacrificial layer has a second longitudinal dimension and a second cross-sectional area. The first cross-sectional area is the same as the second cross-sectional area. The second longitudinal dimension is greater than the first longitudinal dimension.

Abstract: A device for monitoring a liquid crystal display includes: a substrate including a display region and a non-display region disposed at an edge of the display region. The display region includes: a thin film transistor disposed on the substrate, a pixel electrode disposed on the substrate and connected to the thin film transistor, a first sacrificial layer disposed on the pixel electrode, and a roof layer disposed on the sacrificial layer. The non-display region includes: a second sacrificial layer disposed on the substrate, and the roof layer disposed on the second sacrificial layer. The first sacrificial layer has a first longitudinal dimension and a first cross-sectional area, and the second sacrificial layer has a second longitudinal dimension and a second cross-sectional area. The first cross-sectional area is the same as the second cross-sectional area. The second longitudinal dimension is greater than the first longitudinal dimension.

Abstract: The present invention relates to a display device and a manufacturing method thereof, wherein a spoilage layer generated in a manufacturing process is removed, and a manufacturing method of a display device according to an exemplary embodiment of the present invention includes: forming a thin film transistor on a substrate including a plurality of pixel areas; forming a pixel electrode connected to the thin film transistor in the pixel area; forming a sacrificial layer on the pixel electrode; forming a barrier layer on the sacrificial layer; forming a common electrode on the barrier layer; forming a roof layer on the common electrode; patterning the barrier layer, the common electrode, and the roof layer to exposed a portion of the sacrificial layer thereby forming an injection hole; removing the sacrificial layer to form a microcavity for a plurality of pixel areas; removing the barrier layer.

Abstract: The present invention relates to a display device and a manufacturing method thereof, wherein a spoilage layer generated in a manufacturing process is removed, and a manufacturing method of a display device according to an exemplary embodiment of the present invention includes: forming a thin film transistor on a substrate including a plurality of pixel areas; forming a pixel electrode connected to the thin film transistor in the pixel area; forming a sacrificial layer on the pixel electrode; forming a barrier layer on the sacrificial layer; forming a common electrode on the barrier layer; forming a roof layer on the common electrode; patterning the barrier layer, the common electrode, and the roof layer to exposed a portion of the sacrificial layer thereby forming an injection hole; removing the sacrificial layer to form a microcavity for a plurality of pixel areas; removing the barrier layer.

Abstract: A device for monitoring a liquid crystal display includes: a substrate including a display region and a non-display region disposed at an edge of the display region. The display region includes: a thin film transistor disposed on the substrate, a pixel electrode disposed on the substrate and connected to the thin film transistor, a first sacrificial layer disposed on the pixel electrode, and a roof layer disposed on the sacrificial layer. The non-display region includes: a second sacrificial layer disposed on the substrate, and the roof layer disposed on the second sacrificial layer. The first sacrificial layer has a first longitudinal dimension and a first cross-sectional area, and the second sacrificial layer has a second longitudinal dimension and a second cross-sectional area. The first cross-sectional area is the same as the second cross-sectional area. The second longitudinal dimension is greater than the first longitudinal dimension.

Abstract: The present invention relates to a display device and a manufacturing method thereof, wherein a spoilage layer generated in a manufacturing process is removed, and a manufacturing method of a display device according to an exemplary embodiment of the present invention includes: forming a thin film transistor on a substrate including a plurality of pixel areas; forming a pixel electrode connected to the thin film transistor in the pixel area; forming a sacrificial layer on the pixel electrode; forming a barrier layer on the sacrificial layer; forming a common electrode on the barrier layer; forming a roof layer on the common electrode; patterning the barrier layer, the common electrode, and the roof layer to exposed a portion of the sacrificial layer thereby forming an injection hole; removing the sacrificial layer to form a microcavity for a plurality of pixel areas; removing the barrier layer.