Abstract: A solar concentrator and photoelectric conversion structure is described. The solar concentrator and photoelectric conversion structure includes a glass concentrator and at least one photoelectric conversion layer. The glass concentrator forms a light incident surface and a plane. The plane includes a plurality of concentrating elements. Each concentrating element includes a hollow taper and a hollow pillar. The hollow taper includes a first opening. The hollow pillar includes a second opening and a third opening on opposite sides, in which the second opening is correspondingly connected to the first opening. The photoelectric conversion layer deposited onto inner side surfaces of the hollow tapers and the hollow pillars of the concentrating elements. The photoelectric conversion layer includes at least one p-type material and at least one n-type material.

Abstract: The present invention provides a binder-free process for preparing a photoanode of flexible dye-sensitized solar cell, comprising: (a) preparing a TiO2 suspension fluid comprising TiO2, acetylacetone and anhydrous ethanol; (b) preparing a charge solution comprising iodine, ketone and deionized water; (c) mixing said TiO2 suspension fluid and said charge solution to obtain an electrophoresis suspension; (d) soaking a substrate and a cathode into the electrophoresis suspension and proceeding electrophoresis to obtain an TiO2 deposited substrate, in which said substrate and said cathode are flexible; (e) heating the TiO2 deposited substrate; and (f) compressing the heated TiO2 substrate to obtain the photoanode.

Abstract: A solar concentrator and photoelectric conversion structure is described. The solar concentrator and photoelectric conversion structure includes a glass concentrator and at least one photoelectric conversion layer. The glass concentrator forms a light incident surface and a plane. The plane includes a plurality of concentrating elements. Each concentrating element includes a hollow taper and a hollow pillar. The hollow taper includes a first opening. The hollow pillar includes a second opening and a third opening on opposite sides, in which the second opening is correspondingly connected to the first opening. The photoelectric conversion layer deposited onto inner side surfaces of the hollow tapers and the hollow pillars of the concentrating elements. The photoelectric conversion layer includes at least one p-type material and at least one n-type material.

Abstract: A solar concentrator is described. The solar concentrator includes a plane including a plurality of concentrating elements, wherein each concentrating element includes a hollow taper including a first opening; and at least one photoelectric conversion layer covering inner side surfaces of the concentrating elements.

Abstract: A method for manufacturing a micro-nano imprint mould and an imprinting process are described. The method for manufacturing a micro-nano imprint mould includes: providing a mould body including a first surface and a second surface on opposite sides, wherein the mould body includes an imprinting pattern structure set in the first surface, and the imprinting pattern structure includes a plurality of concaves and a plurality of convexes between the concaves; and performing a surface treatment step on the first surface of the mould body to make a first contact angle form between an imprint fluid and the concaves and a second contact angle form between the imprint fluid and the convexes, wherein the first contact angle is different from the second contact angle.

Abstract: A solar concentrator is described. The solar concentrator includes a plane including a plurality of concentrating elements, wherein each concentrating element includes a hollow taper including a first opening; and at least one photoelectric conversion layer covering inner side surfaces of the concentrating elements.

Abstract: A synthesis for a silated acidic polymer by a copolymerization of several monomers includes one acidic monomer and one silated monomer. The silated acidic polymer is used as a resist barrier in imprint lithography and is easily removed by an environmental basic aqua-solution during the stripping process without using RIE (reactive ion etching) process or organic solvent at the last step of resist stripping so that the throughput is enhanced and good etching resistibility together with cost-saving is obtained.

Abstract: A polymer resist having a good flow is used in a nanoimprint lithography. A residual layer remained is thus thinner. Hence, a time spent for etching the residual layer is reduced. And a pattern obtained after the nanoimprint lithography will not be ruined because of a long-time etching. Nevertheless, the present invention can be applied on a hard substrate, like a silicon chip, or a soft substrate, like PET.

Abstract: The present invention processes a synthesis for a silated acidic polymer by a copolymerization of several monomers including one acidic monomer and one silated monomer. The silated acidic polymer is used as a resist barrier in imprint lithography and is easily removed by an environmental basic aqua-solution during the stripping process without using RIE (reactive ion etching) process or organic solvent at the last step of resist stripping so that the throughput is enhanced and good etching resistibility together with cost-saving is obtained.

Abstract: The present invention relates a method for high aspect ratio pattern transfer, by using combination of imprint and Step and Flash techniques to transfer high aspect ratio pattern. The present invention simultaneously saves the developing time and the amount of developer used during the photo-resist pattern transfer process. The present invention is able to avoid separation and dissolution between pattern and substrate that is attacked by developer, and is able to yield high aspect ratio patterns.

Abstract: A pretreatment process of a substrate in a micro/nano imprinting technology is disclosed, comprising deposing the substrate on a holder and performing a plasma treatment or an ion treatment on the substrate. In the plasma treatment of the substrate, a reactive gas is first injected into the chamber to form a plasma, such that the plasma causes a physical reaction and a chemical reaction on the substrate to activate the substrate surface and also remove particles and contaminants adhering to the substrate surface. When the ion treatment is performed on the substrate, an ion source is placed into the chamber and ions and neutral atoms generated by the ion source bombard the substrate, causing a physical reaction and a chemical reaction on the substrate to activate the substrate surface and also remove particles and contaminants adhering to the substrate surface.

Abstract: The present invention relates a method for high aspect ratio pattern transfer, by using combination of imprint and Step and Flash techniques to transfer high aspect ratio pattern. The present invention simultaneously saves the developing time and the amount of developer used during the photo-resist pattern transfer process. The present invention is able to avoid separation and dissolution between pattern and substrate that is attacked by developer, and is able to yield high aspect ratio patterns.

Abstract: A nanocomposite having titanium aluminum carbon nitride and amorphous carbon is disclosed, and the nanocomposite comprises a titanium aluminum carbon nitride grain of nanometer scale and an amorphous carbon matrix, wherein the titanium aluminum carbon nitride grain of nanometer scale is embedded into the amorphous carbon matrix. The method for coating the nanocomposite of titanium aluminum carbon nitride-amorphous carbon on a substrate comprises: depositing the substrate in a reaction chamber; and igniting plasma to clean and remove an oxide layer and adsorptive on the substrate; injecting a reaction gas. The reaction gas is activated and thermal decomposed by plasma to form the nanocomposite coating layer of titanium aluminum carbon nitride-amorphous carbon on the surface of the substrate.

Abstract: This patent discloses the composition of germanate glass and a new method for its fabrication. The composition comprises germanate, the oxide of an alkali earth group, Al.sub.2 O.sub.3, ZnO, a halides compound eg. CaF.sub.2, CaCl.sub.2 and so on,, and can combine with a series of oxygenous compounds such as silicate, borate, phosphate, arsenate, tellurate and so on, if required. The addition of an alkali oxide could increase the glass formation rate and homogeneity, and the defects of devitrification, cord, knot, and blister are reduced. Its fabricated methods which consist of the reduction pressure melting with the addition of a halide and the drying procedure. The germanate glass body that is made is colorless and transparent and it can increase the transmittance of infrared from 20% to greater than 60% in the wave length 2.75-3.0 .mu.m. The price of producing the germanate glass is decreased and the transmittance of this composition system increased from 5% to 80%.