Abstract: A substrate processing apparatus may be utilized, for example, for a horizontally fixed organic material deposition equipment for manufacturing large-area displays. A substrate processing apparatus may include a titanium cooling plate having an upper surface and a lower surface; an electrostatic chuck including a first dielectric layer provided on the lower surface, an electrode layer provided on the first dielectric layer, and a second dielectric layer provided on the first dielectric layer and the electrode layer, and chucking a glass substrate using an electrostatic force; and a yoke plate positioned on the upper surface and chucking a mask using a magnetic force. The titanium cooling plate may further includes a first channel provided from the upper surface, a second channel provided from the first channel, and a titanium cover plate coupled to the first channel. The titanium cooling plate may provide a cooling flow path using the second channel.

Abstract: A method of analyzing fines migration in a multiphase flow in a sediment layer using X-ray computed tomography (CT) image includes, preparing an X-ray CT image analysis sample; analyzing an X-ray CT image during a depressurization process; calibrating and calculating a fines content; and estimating a fines migration analysis result.

Abstract: A method of analyzing fines migration in a multiphase flow in a sediment layer using X-ray computed tomography (CT) image includes, preparing an X-ray CT image analysis sample; analyzing an X-ray CT image during a depressurization process; calibrating and calculating a fines content; and estimating a fines migration analysis result.