Patents by Inventor Min-Hung Chou

Min-Hung Chou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for passing charge from word lines during manufacture
    Patent number: 7170816
    Abstract: A plasma damage protection circuit includes a word line driver circuit with plasma damage protection features. If, during manufacture, plasma-based processes cause charge to build up on the word lines, the charge passes from the word lines through at least the word line drivers to the semiconductor substrate. Another plasma-based protection circuit includes a device coupled to multiple word line drivers. If, during manufacture, plasma-based processes cause charge to build up on the word lines, the charge passes from the word lines through at least the device to the semiconductor substrate. Thus, these plasma-based protection circuits save space while protecting the integrated circuit from plasma process-based damage.
    Type: Grant
    Filed: December 16, 2004
    Date of Patent: January 30, 2007
    Assignee: Macronix International Co., Ltd.
    Inventors: Jen-Ren Huang, Min-Hung Chou, Yi-Chun Shih
  • Plasma damage protection circuit
    Publication number: 20060133184
    Abstract: A plasma damage protection circuit includes a word line driver circuit with plasma damage protection features. If, during manufacture, plasma-based processes cause charge to build up on the word lines, the charge passes from the word lines through at least the word line drivers to the semiconductor substrate. Another plasma-based protection circuit includes a device coupled to multiple word line drivers. If, during manufacture, plasma-based processes cause charge to build up on the word lines, the charge passes from the word lines through at least the device to the semiconductor substrate. Thus, these plasma-based protection circuits save space while protecting the integrated circuit from plasma process-based damage.
    Type: Application
    Filed: December 16, 2004
    Publication date: June 22, 2006
    Applicant: Macronix International Co., Ltd.
    Inventors: Jen-Ren Huang, Min-Hung Chou, Yi-Chun Shih