Abstract: A method of processing a substrate is provided. The method processes a substrate by using a substrate processing apparatus including a chamber, a shower head unit for supplying a cleaning gas into the chamber, a first electrode disposed on an upper portion of the shower head unit, a support unit for supporting the substrate, and a second electrode disposed inside the support unit, the method including supplying the cleaning gas into the chamber, and supplying a voltage of a first magnitude to the first electrode and supplying a voltage of a second magnitude greater than the first magnitude to the second electrode.

Abstract: Provided are a substrate treating apparatus and a method thereof that can improve pattern roughness when an etching process is performed for a substrate. The substrate treating method comprises: inserting a substrate into a substrate treating apparatus; injecting a first process gas into the substrate treating apparatus and treating the substrate to a first plasma using the first process gas; and injecting a second process gas into the substrate treating apparatus and treating the substrate to a second plasma using the second process gas, wherein at least some components of the second process gas differ from those of the first process gas.

Abstract: A method of processing a substrate is provided. The method processes a substrate by using a substrate processing apparatus including a chamber, a shower head unit for supplying a cleaning gas into the chamber, a first electrode disposed on an upper portion of the shower head unit, a support unit for supporting the substrate, and a second electrode disposed inside the support unit, the method including supplying the cleaning gas into the chamber, and supplying a voltage of a first magnitude to the first electrode and supplying a voltage of a second magnitude greater than the first magnitude to the second electrode.

Abstract: A message server and a message processing apparatus including the same are provided. According to the embodiments of the present disclosure, when the device management module is not available to be used, a message is directly delivered to the application client through the third party message server so that the reliability of the message forwarded between a sender side and a receiver side can be ensured.

Abstract: A message server and a message processing apparatus including the same are provided. According to the embodiments of the present disclosure, when the device management module is not available to be used, a message is directly delivered to the application client through the third party message server so that the reliability of the message forwarded between a sender side and a receiver side can be ensured.

Abstract: Disclosed is a basic culture medium for mesenchymal stem cells, and a cell therapeutic agent cultured and differentiated using same. The basic culture medium reduces the time taken from collection to mass culturing by increasing the proliferation rate of undifferentiated mesenchymal stem cells derived from an adult tissue such as human marrow and adipose tissue, and also is capable of various differentiations into treating agents for bone-forming cells, for cartilage cells, or for fat cells.

Abstract: Disclosed is a basic culture medium for mesenchymal stem cells, and a cell therapeutic agent cultured and differentiated using same. The basic culture medium reduces the time taken from collection to mass culturing by increasing the proliferation rate of undifferentiated mesenchymal stem cells derived from an adult tissue such as human marrow and adipose tissue, and also is capable of various differentiations into treating agents for bone-forming cells, for cartilage cells, or for fat cells.