Patents by Inventor MIN JUNG CHUNG

MIN JUNG CHUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11626438
    Abstract: Image sensors are provided. The image sensor may include a substrate including a first surface and a second surface opposite the first surface, a photoelectric conversion layer in the substrate, and a lower capacitor connection pattern on the first surface of the substrate. The second surface of the substrate may be configured to receive incident light. The lower capacitor connection pattern may include a capacitor region and a landing region protruding from the capacitor region. The image sensors may also include a capacitor structure including a first conductive pattern, a dielectric pattern, and a second conductive pattern sequentially stacked on the capacitor region, a first wire on the capacitor structure and connected to the second conductive pattern, and a second wire connected to the landing region. The first conductive pattern may be connected to the lower capacitor connection pattern.
    Type: Grant
    Filed: July 26, 2021
    Date of Patent: April 11, 2023
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Joo Sung Moon, In Gyu Baek, Seung Han Yoo, Hae Min Lim, Min Jung Chung, Jin Yong Choi
  • Publication number: 20210358986
    Abstract: Image sensors are provided. The image sensor may include a substrate including a first surface and a second surface opposite the first surface, a photoelectric conversion layer in the substrate, and a lower capacitor connection pattern on the first surface of the substrate. The second surface of the substrate may be configured to receive incident light. The lower capacitor connection pattern may include a capacitor region and a landing region protruding from the capacitor region. The image sensors may also include a capacitor structure including a first conductive pattern, a dielectric pattern, and a second conductive pattern sequentially stacked on the capacitor region, a first wire on the capacitor structure and connected to the second conductive pattern, and a second wire connected to the landing region. The first conductive pattern may be connected to the lower capacitor connection pattern.
    Type: Application
    Filed: July 26, 2021
    Publication date: November 18, 2021
    Inventors: JOO SUNG MOON, IN GYU BAEK, SEUNG HAN YOO, HAE MIN LIM, MIN JUNG CHUNG, JIN YONG CHOI
  • Patent number: 11107850
    Abstract: Image sensors are provided. The image sensor may include a substrate including a first surface and a second surface opposite the first surface, a photoelectric conversion layer in the substrate, and a lower capacitor connection pattern on the first surface of the substrate. The second surface of the substrate may be configured to receive incident light. The lower capacitor connection pattern may include a capacitor region and a landing region protruding from the capacitor region. The image sensors may also include a capacitor structure including a first conductive pattern, a dielectric pattern, and a second conductive pattern sequentially stacked on the capacitor region, a first wire on the capacitor structure and connected to the second conductive pattern, and a second wire connected to the landing region. The first conductive pattern may be connected to the lower capacitor connection pattern.
    Type: Grant
    Filed: May 15, 2019
    Date of Patent: August 31, 2021
    Inventors: Joo Sung Moon, In Gyu Baek, Seung Han Yoo, Hae Min Lim, Min Jung Chung, Jin Yong Choi
  • Publication number: 20200105810
    Abstract: Image sensors are provided. The image sensor may include a substrate including a first surface and a second surface opposite the first surface, a photoelectric conversion layer in the substrate, and a lower capacitor connection pattern on the first surface of the substrate. The second surface of the substrate may be configured to receive incident light. The lower capacitor connection pattern may include a capacitor region and a landing region protruding from the capacitor region. The image sensors may also include a capacitor structure including a first conductive pattern, a dielectric pattern, and a second conductive pattern sequentially stacked on the capacitor region, a first wire on the capacitor structure and connected to the second conductive pattern, and a second wire connected to the landing region. The first conductive pattern may be connected to the lower capacitor connection pattern.
    Type: Application
    Filed: May 15, 2019
    Publication date: April 2, 2020
    Inventors: JOO SUNG MOON, IN GYU BAEK, SEUNG HAN YOO, HAE MIN LIM, MIN JUNG CHUNG, JIN YONG CHOI