Abstract: Provided are a cleaning device that may be applied to a manufacturing equipment without stopping operations of the equipment, a cleaning method, and a method of manufacturing a device. The cleaning device includes: a frame substrate configured to frame the cleaning device; a first functional membrane on a first surface of the frame substrate; and a second functional membrane on a second surface of the frame substrate, which is opposite to the first surface. The cleaning method includes: positioning a cleaning device including a frame substrate and functional membranes formed on opposite surfaces of the frame substrate on a support configured to support a substrate, during a semiconductor manufacturing process or a display manufacturing process on the substrate; maintaining the positioning of the cleaning device on the support for a predetermined time period; and removing the cleaning device from the support.