Abstract: The present inventive concept relates to a liquid crystal display and a manufacturing method thereof. The liquid crystal display includes: a first display panel, a second display panel, and a sealant and a liquid crystal layer disposed therebetween and a protrusion disposed on the first display panel, disposed between a display area and the sealant, and protruding toward the second display panel, wherein the first display panel includes a first substrate, the protrusion includes a peak where an upper surface of the protrusion is the highest with respect to an upper surface of the first substrate, a first portion disposed between the peak and the sealant, and a second portion disposed between the peak and the display area, and an inclination of the upper surface of the first portion is gentler than an inclination of the upper surface of the second portion in a cross-sectional view.

Abstract: A method of precisely inspecting the entire surface of a mask at a high speed in consideration of optical effects of the mask. The method includes designing a target mask layout for a pattern to be formed on a wafer, and extracting an effective mask layout using an inspection image measured from the target mask layout using an aerial image inspection apparatus as a mask inspection apparatus. The effective mask layout is input to a wafer simulation tool for calculating a wafer image to be formed on the wafer. Optical effects of the mask are detected by comparing the target mask layout with the effective mask layout.

Abstract: A method of precisely inspecting the entire surface of a mask at a high speed in consideration of optical effects of the mask. The method includes designing a target mask layout for a pattern to be formed on a wafer, and extracting an effective mask layout using an inspection image measured from the target mask layout using an aerial image inspection apparatus as a mask inspection apparatus. The effective mask layout is input to a wafer simulation tool for calculating a wafer image to be formed on the wafer. Optical effects of the mask are detected by comparing the target mask layout with the effective mask layout.