Patents by Inventor Min Peng

Min Peng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5604134
    Abstract: Plasma reactors are used extensively in the manufacture of integrated circuits for the deposition and etching of thin films at low temperatures. Their range of operating temperatures and gas pressures make them highly susceptible to build-up of deposits on the inner surfaces of the reaction chamber which subsequently become dislodged by vibrations, stresses, and other aggravations and are dispersed within the system as particulates. The monitoring of particulate accumulation on wafers is conventionally done by subjecting a test wafer to a simulated operation within the tool under gas flow alone. Some types of plasma reactors incorporate oscillating gas dispersion housings in order to improve homogeneity of the gas mixture. The motion of these housings can induce significant particle displacement within the chamber. The correct monitoring procedure for these tools must therefore include the motion of the distribution housing in addition to the conventional procedures.
    Type: Grant
    Filed: February 2, 1996
    Date of Patent: February 18, 1997
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Kuan-Hui Chang, Tzu-Min Peng, Po-Tao Chu, Shin-Kuei Yen
  • Patent number: 5342502
    Abstract: A method for preparing silicon carbide particles dispersed in an electrolytic bath for composite electroplating of metals includes the steps of washing the silicon carbide particles with an organic solvent; washing the silicon carbide particles with an inorganic acid; grinding the silicon carbide particles; and heating the silicon carbide particles in a nickel-containing solution at a boiling temperature for a predetermined period of time.
    Type: Grant
    Filed: October 21, 1993
    Date of Patent: August 30, 1994
    Assignee: Industrial Technology Research Institute
    Inventors: Yu-Min Peng, Jih-Wen Wang, Chun-Ying Liue, Shinn-Horng Yeh
  • Patent number: 5189563
    Abstract: A video tape editing apparatus for use with first and second video playback devices and a video recording device allows effective editing of homemade video tapes which produces clean, professional transitions of the edit-points. The editing apparatus includes a fade control circuit having a fade selector switch for generating a fade-out control signal to shunt the composite video signal components in a video amplifier when the fade switch is in a first position and for generating a fade-in control signal to remove the shunting of the composite video signal components in the video amplifier when the fade switch is in a second position.
    Type: Grant
    Filed: December 14, 1990
    Date of Patent: February 23, 1993
    Assignee: Sima Products Corporation
    Inventors: Steven M. Breslau, Han-Min Peng, Chieh-Chi Kang