Patents by Inventor Min-Sub Kang

Min-Sub Kang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7923684
    Abstract: A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
    Type: Grant
    Filed: November 20, 2008
    Date of Patent: April 12, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Min-Sub Kang, Sang-Kil Lee, Kwang-Sik Kim, Kyung-Ho Jung, Sung-Joong Kim
  • Publication number: 20090077696
    Abstract: A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
    Type: Application
    Filed: November 20, 2008
    Publication date: March 19, 2009
    Inventors: Min-Sub Kang, Sang-Kil Lee, Kwang-Sik Kim, Kyung-Ho Jung, Sung-Joong Kim
  • Patent number: 7468512
    Abstract: A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
    Type: Grant
    Filed: June 27, 2006
    Date of Patent: December 23, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Min-Sub Kang, Sang-Kil Lee, Kwang-Sik Kim, Kyung-Ho Jung, Sung-Joong Kim
  • Publication number: 20060231753
    Abstract: A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
    Type: Application
    Filed: June 27, 2006
    Publication date: October 19, 2006
    Inventors: Min-Sub Kang, Sang-Kil Lee, Kwang-Sik Kim, Kyung-Ho Jung, Sung-Joong Kim
  • Patent number: 7091485
    Abstract: A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
    Type: Grant
    Filed: December 9, 2004
    Date of Patent: August 15, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Min-Sub Kang, Sang-Kil Lee, Kwang-Sik Kim, Kyung-Ho Jung, Sung-Joong Kim
  • Publication number: 20050127292
    Abstract: A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
    Type: Application
    Filed: December 9, 2004
    Publication date: June 16, 2005
    Inventors: Min-Sub Kang, Sang-Kil Lee, Kwang-Sik Kim, Kyung-Ho Jung, Sung-Joong Kim
  • Patent number: 6440760
    Abstract: Embodiments of the present invention include methods for measuring a semiconductor wafer which has been subjected to an etching process. Light is radiated at the semiconductor wafer. Light within a selected wavelength band reflected from the semiconductor wafer is measured to provide an output value. A ratio of the output value and a reference value is determined. The reference value may be based on light within the selected wavelength band reflected from a reference surface, such as a bare silicon reference surface. It is determined that the semiconductor wafer is under-etched if the determined ratio does not meet the reference value. A normalized optical impedance or a polarization ratio may be measured based on light within a selected wave length band reflected from the semiconductor wafer to provide the output value in various embodiments of the present invention.
    Type: Grant
    Filed: September 18, 2000
    Date of Patent: August 27, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyung-suk Cho, Sang-mun Chon, Sang-bong Choi, Chung-sam Chun, Min-sub Kang