Abstract: An interconnect structure includes a conductive feature embedded in a dielectric feature. The conductive feature has a first horizontal portion and a first vertical portion. The first horizontal portion extends in a horizontal direction to terminate at two edge surfaces. The first horizontal portion includes graphene layers stacked on each other, and an intercalation material interposed among the graphene layers. The intercalation material includes a first atom dopant including one of a group 1 metal, a group 2 metal, a group 3 metal, a lanthanide series metal, an actinide series metal, and combinations thereof. The first vertical portion extends in a vertical direction and is in contact with one of the two edge surfaces of the first horizontal portion. The first vertical portion is made of a first electrically conductive metal material.

Abstract: A package structure is provided. The package structure includes a semiconductor die over a redistribution structure, bonding elements below the redistribution structure, and an underfill layer surrounding the bonding elements and the redistribution structure. The semiconductor die has a rectangular profile in a plan view. A pitch of the bonding elements is defined as the sum of a diameter of the bonding elements and a spacing between neighboring two of the bonding elements. A first circular area of the redistribution structure is entirely covered and in direct contact with the underfill layer. The center of the first circular area is aligned with a first corner of the rectangular profile of the semiconductor die. A diameter of the first circular area is greater than twice the pitch of the bonding elements.

Abstract: A method of fabricating a contact structure includes the following steps. An opening is formed in a dielectric layer. A conductive material layer is formed within the opening and on the dielectric layer, wherein the conductive material layer includes a bottom section having a first thickness and a top section having a second thickness, the second thickness is greater than the first thickness. A first treatment is performed on the conductive material layer to form a first oxide layer on the bottom section and on the top section of the conductive material layer. A second treatment is performed to remove at least portions of the first oxide layer and at least portions of the conductive material layer, wherein after performing the second treatment, the bottom section and the top section of the conductive material layer have substantially equal thickness.

Abstract: A semiconductor structure includes a semiconductor substrate, an interconnect structure disposed on the semiconductor substrate and including a conductive interconnect; and a cap layer disposed on the interconnect structure. The cap layer includes a cap portion disposed on the conductive interconnect. The cap portion includes a plurality of two-dimensional material sheets stacked on each other and has a lower surface proximate to the conductive interconnect. The lower surface of the cap portion is formed with a plurality of dangling bonds such that the cap portion is adhered to the conductive interconnect through the dangling bonds.

Abstract: A memory device and a manufacturing method are provided. The memory device includes active regions defined in a semiconductor substrate by an isolation structure, wherein the active regions are arranged as an array along first and second directions, and extend along a third direction; and word lines, extending through the active regions along the second direction in the semiconductor substrate. The active regions are arranged in pairs along the second direction. The active regions in the same pair are closely adjacent to each other by a first spacing. Adjacent pairs of the active regions are separated by a greater second spacing. A featured portion of each active region below an intersecting word line has a first side closely adjacent to the other active region in the same pair by the first spacing and a second side separated from another pair of the active regions by the second spacing, and has an inclined top surface ascending from the second side to the first side.

Abstract: An interconnect structure and methods of forming the same are described. In some embodiments, the structure includes a first dielectric layer and one or more first conductive features disposed in the first dielectric layer. The one or more first conductive features includes a first metal. The structure further includes a plurality of graphene layers disposed on each of the one or more first conductive features, the plurality of graphene layers include a second metal intercalated therebetween, and the second metal is different from the first metal.

Abstract: The present invention relates to a method for predicting human immune response to therapeutic cancer vaccine. This method includes a series of culturing procedures and a modified ELISPOT assay to detect total antibody, antigen specific antibody, and cytokine induction ability from human individual's PBMC.

Abstract: The present invention relates to a pharmaceutical composition for inducing damages of endothelial cells, a pharmaceutical composition for treating a tumor, and a method for treating a tumor by using the same. In addition, the pharmaceutical compositions for inducing damages of endothelial cells comprises: an effective amount of Concanavalin A (Con A).