Patents by Inventor Ming-Dao Wu

Ming-Dao Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200348339
    Abstract: Disclosed are a supplementary bushing, a test probe, and a supplementary testing device. The supplementary bushing has a closed end, an open end, a receiving groove, and at least one first fixing portion. The closed end has a first contact, and the receiving groove is concavely formed from an open end towards the closed end. The first fixing portion is disposed on an inner surface of the receiving groove. The test probe is installed in the receiving hole of a base of the supplementary testing device and has a testing end and a connecting end. The testing end has a second contact, a second fixing portion and a stop portion.
    Type: Application
    Filed: April 30, 2019
    Publication date: November 5, 2020
    Inventors: MING-DAO WU, SHIH-HUNG LO, HAO-WEN CHIEN, FU-CHENG CHUANG, WEI-CHU CHEN, KUO-WEI CHANG, BOR-CHEN TSAI, CHIH-FENG CHEN
  • Publication number: 20200348338
    Abstract: A test pin contact buffer, fixed to a test pin base, is a sheet-like structure made of a composite material including a conductive material and an insulating material, and defines at least one contact area corresponding to at least one test pin of the test pin base. The contact area has at least one cutout hole, an insulating deformation structure and a conductive head structure. The insulating deformation structure is extendable and made of the insulating material and extends outward from the conductive head structure. The cutout hole enables the contact area to be in a partial hollow state, which is beneficial for deformation of the insulating deformation structure. The test pin can be used for performing measurement in an indirect manner, reducing the wear of the test pin, prolonging the service life, and improving the measurement speed and efficiency.
    Type: Application
    Filed: April 30, 2019
    Publication date: November 5, 2020
    Inventors: MING-DAO WU, SHIH-HUNG LO, FU-CHENG CHUANG, ZHAO-YUAN TSAI, HAO-WEN CHIEN, BOR-CHEN TSAI, CHIH-FENG CHEN
  • Patent number: 10065852
    Abstract: A MEMS device includes a substrate, a supporter, a first back plate, a second back plate and a diaphragm. The substrate has a cavity. The supporter is over the substrate. The first back plate is over the cavity and fixed on the supporter. The second back plate is over the cavity and fixed on the supporter. The diaphragm is between the first back plate and the second back plate. The diaphragm includes a first sub-diaphragm and a second sub-diaphragm over the cavity and fixed on the supporter.
    Type: Grant
    Filed: September 26, 2016
    Date of Patent: September 4, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Chun-Wen Cheng, Chia-Hua Chu, Ming-Dao Wu, Tzu-Heng Wu
  • Publication number: 20180086624
    Abstract: A MEMS device includes a substrate, a supporter, a first back plate, a second back plate and a diaphragm. The substrate has a cavity. The supporter is over the substrate. The first back plate is over the cavity and fixed on the supporter. The second back plate is over the cavity and fixed on the supporter. The diaphragm is between the first back plate and the second back plate. The diaphragm includes a first sub-diaphragm and a second sub-diaphragm over the cavity and fixed on the supporter.
    Type: Application
    Filed: September 26, 2016
    Publication date: March 29, 2018
    Inventors: CHUN-WEN CHENG, CHIA-HUA CHU, MING-DAO WU, TZU-HENG WU
  • Patent number: 8240057
    Abstract: A method of manufacturing a self-aligned stylus with high sphericity includes the steps of: forming a polymeric layer on a substrate; placing a sphere on the polymeric layer; softening the polymeric layer to make a portion of the sphere sink into the polymeric layer; forming a specific light absorbing layer on the polymeric layer; illuminating the sphere and the specific light absorbing layer with specific light such that the specific light is focused by the sphere to expose the polymeric layer to form an exposed portion and an unexposed portion; removing the specific light absorbing layer; and baking the polymeric layer and then removing the unexposed portion. A self-aligned stylus with high sphericity is also disclosed.
    Type: Grant
    Filed: April 22, 2008
    Date of Patent: August 14, 2012
    Assignee: National Taiwan University
    Inventors: Wen-Pin Shih, Yao-Chuan Tsai, Duo-Ru Chang, Li-Chi Tsao, Ming-Dao Wu, Po-Jen Shih
  • Publication number: 20090109196
    Abstract: A method of manufacturing a self-aligned stylus with high sphericity includes the steps of: forming a polymeric layer on a substrate; placing a sphere on the polymeric layer; softening the polymeric layer to make a portion of the sphere sink into the polymeric layer; forming a specific light absorbing layer on the polymeric layer; illuminating the sphere and the specific light absorbing layer with specific light such that the specific light is focused by the sphere to expose the polymeric layer to form an exposed portion and an unexposed portion; removing the specific light absorbing layer; and baking the polymeric layer and then removing the unexposed portion. A self-aligned stylus with high sphericity is also disclosed.
    Type: Application
    Filed: April 22, 2008
    Publication date: April 30, 2009
    Inventors: Wen-Pin SHIH, Yao-Chuan TSAI, Duo-Ru CHANG, Li-Chi TSAO, Ming-Dao WU, Po-Jen SHIH