Patents by Inventor Ming-Hsiang Yang

Ming-Hsiang Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12223698
    Abstract: A method for searching a path by using a 3D reconstructed map includes: receiving 3D point-cloud map information and 3D material map information; clustering the 3D point-cloud map information with a clustering algorithm to obtain clustering information, and identifying material attributes of objects in the 3D point-cloud map information with a material neural network model to obtain material attribute information; fusing the those map information based on their coordinate information, thereby outputting fused map information; identifying obstacle areas and non-obstacle areas in the fused map information based on an obstacle neural network model, the clustering information, and the material attribute information; and generating 3D path information according to the non-obstacle areas. Since the 3D path information is generated based on those map information, the obstacle areas and flight spaces are effectively determined to generate an accurate flight path.
    Type: Grant
    Filed: May 26, 2022
    Date of Patent: February 11, 2025
    Assignee: National Yang Ming Chiao Tung University
    Inventors: Mang Ou-Yang, Yung-Jhe Yan, Ming-Da Jiang, Ta-Fu Hsu, Shao-Chun Yeh, Kun-Hsiang Chen, Tzung-Cheng Chen
  • Publication number: 20250043227
    Abstract: A microfluidic EP device for exogenous molecules transfection is disclosed that has high speed, high viability, and efficiency for collection of cells after EP. The microfluidic EP device has an EP chamber assembly, an adaptor, a pop up device, a syringe pump assembly, an EP controller, and a system controller. The EP chamber assembly has a MEMS nano channel plate, a MEMS cap, a cell cavity plate, and a cell cavity plate holder. The EP chamber assembly is connected to the pop up device through the adaptor. The pop up device may be an ultrasound vibrator or a motorized rotator. The MEMS cap has inlets/outlets for inputting/outputting cell solution, washing solution, transfected cells, exogenous material solution. The solution fluid is inputted/outputted by plastic tube and needle adaptor to the syringe pump assembly. All operation sequences are controlled by the system controller, which may perform batch operation continuously.
    Type: Application
    Filed: July 31, 2023
    Publication date: February 6, 2025
    Inventors: Chein-Hsun WANG, Yun-Hsiang CHEN, Jyh-Yih LEU, Wen-Chie HUANG, Chin-Hsiang CHANG, Jenping KU, Ming-Tsung YANG
  • Patent number: 12213297
    Abstract: A method comprises forming a first fin including alternating first channel layers and first sacrificial layers and a second fin including alternating second channel layers and second sacrificial layers, forming a capping layer over the first and the second fin, forming a dummy gate stack over the capping layer, forming source/drain (S/D) features in the first and the second fin, removing the dummy gate stack to form a gate trench, removing the first sacrificial layers and the capping layer over the first fin to form first gaps, removing the capping layer over the second fin and portions of the second sacrificial layers to from second gaps, where remaining portions of the second sacrificial layers and the capping layers form a threshold voltage (Vt) modulation layer, and forming a metal gate stack in the gate trench, the first gaps, and the second gaps.
    Type: Grant
    Filed: September 1, 2021
    Date of Patent: January 28, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Shih-Hao Lin, Chih-Hsiang Huang, Shang-Rong Li, Chih-Chuan Yang, Jui-Lin Chen, Ming-Shuan Li
  • Patent number: 11295964
    Abstract: A pressure regulating device cooperates with a semiconductor production system to regulate a pressure in a pipe of a semiconductor production apparatus in the semiconductor production system. The pressure regulating device reduces the pressure in the pipe of the semiconductor apparatus by a suction pump to prevent from liquid leakage when the pipe is broken. In addition, the pressure regulating device can periodically record the pressure change in the pipe to facilitate an operator to judge whether the pipe is damaged and analyze the cause of decrease in production yield.
    Type: Grant
    Filed: December 24, 2019
    Date of Patent: April 5, 2022
    Assignee: GENES TECH CO., LTD.
    Inventor: Ming-Hsiang Yang
  • Publication number: 20210143025
    Abstract: A pressure regulating device cooperates with a semiconductor production system to regulate a pressure in a pipe of a semiconductor production apparatus in the semiconductor production system. The pressure regulating device reduces the pressure in the pipe of the semiconductor apparatus by a suction pump to prevent from liquid leakage when the pipe is broken. In addition, the pressure regulating device can periodically record the pressure change in the pipe to facilitate an operator to judge whether the pipe is damaged and analyze the cause of decrease in production yield.
    Type: Application
    Filed: December 24, 2019
    Publication date: May 13, 2021
    Inventor: MING-HSIANG YANG
  • Publication number: 20160318818
    Abstract: A carbon dioxide gas treatment system comprises: ammonia gas production device for providing ammonia gas; a waste gas treatment device, having a first washing column, a gas inlet, a first circulation water inlet, a first circulation water outlet, a first outlet and a second outlet, the carbon dioxide gas from the gas inlet may mix with ammonia gas to form a mixed gas before get into the first washing column and the mixed gas may mix with water from circulation water inlet in the first washing column to form solid ammonium bicarbonate and liquid ammonia; and a waste water treatment device, having a second washing column, a water inlet, a second circulation water inlet, a second circulation water outlet and a third outlet, the liquid ammonia get into the second washing column through the water inlet and mixed with water from second circulation water inlet to form ammonia gas.
    Type: Application
    Filed: June 29, 2015
    Publication date: November 3, 2016
    Inventors: MING-HSIANG YANG, SHANG-SHAN FAN
  • Publication number: 20150196854
    Abstract: A wastewater treatment device includes a showering-guided furnace, which comprises a tank, a cyclic heating device and a showering structure. The tank has a water inlet port, a cyclic water inlet port, a cyclic water outlet port, a water outlet port and a gas outlet port. The cyclic heating device is used to draw out the wastewater from the tank, heat the drawn wastewater to a cyclic temperature, and guide the heated wastewater into the tank through the cyclic water inlet port. The showering structure is used to make the wastewater to be formed into a plurality of smaller water flows which are showered. A specific composition of the wastewater is gasified and is drawn out from the tank through the gas outlet port. The above-mentioned wastewater treatment device can save much energy and achieve higher recovery efficiency.
    Type: Application
    Filed: June 13, 2014
    Publication date: July 16, 2015
    Inventors: Ming-Hsiang YANG, Shang-Shan FAN
  • Patent number: 8082657
    Abstract: A method for manufacturing a magnetic write head that allows the location of the flare point of a write pole to be accurately located relative to the air bearing surface. The method includes the construction of a lapping guide having an edge feature that is easily and accurately located relative to the flare point of the write pole. This edge feature provides an abrupt change in electrical resistance across the lapping guide at a point when lapping should be terminated. And, since this feature can accurately located relative to the flare point, this provides an easily discernable ending point for lapping.
    Type: Grant
    Filed: December 30, 2008
    Date of Patent: December 27, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Edward Hin Pong Lee, Vladimir Nikitin, Michael Ming Hsiang Yang, Yuan Yao
  • Patent number: 8065788
    Abstract: A method for manufacturing a magnetic head for magnetic data recording, that allows a lapping termination point to be easily and accurately determined during lapping. The method includes constructing a lapping guide that has an electrically is formed to provide an abrupt change in resistance at a point where lapping should be terminated. This point of abrupt resistance change is located relative to the flare point of the write pole that the distance between the flare point and the air bearing surface can be accurately maintained. This abrupt resistance change also makes it possible to monitor both a stripe height defining rough lapping and an angled kiss lapping process using a single measurement channel.
    Type: Grant
    Filed: December 30, 2008
    Date of Patent: November 29, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Unal Murat Guruz, Edward Hin Pong Lee, Vladimir Nikitin, Michael Ming Hsiang Yang, Yuan Yao
  • Patent number: 7835111
    Abstract: A magnetic write head for perpendicular magnetic recording that is resistant to write pole and trailing shield protrusion. The write pole includes a magnetic return pole that is magnetically connected with the trailing shield, the return pole being resistant to deformation or recession such as from mechanically abrasive slider cleaning operations such as soda blast.
    Type: Grant
    Filed: February 15, 2007
    Date of Patent: November 16, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Eric Wayne Flint, Wen-Chien David Hsiao, Edward Hin Pong Lee, Michael Ming Hsiang Yang
  • Publication number: 20100162556
    Abstract: A method for manufacturing a magnetic head for magnetic data recording, that allows a lapping termination point to be easily and accurately determined during lapping. The method includes constructing a lapping guide that has an electrically is formed to provide an abrupt change in resistance at a point where lapping should be terminated. This point of abrupt resistance change is located relative to the flare point of the write pole that the distance between the flare point and the air bearing surface can be accurately maintained. This abrupt resistance change also makes it possible to monitor both a stripe height defining rough lapping and an angled kiss lapping process using a single measurement channel.
    Type: Application
    Filed: December 30, 2008
    Publication date: July 1, 2010
    Inventors: Unal Murat Guruz, Edward Hin Pong Lee, Vladimir Nikitin, Michael Ming Hsiang Yang, Yuan Yao
  • Publication number: 20100162555
    Abstract: A method for manufacturing a magnetic write head that allows the location of the flare point of a write pole to be accurately located relative to the air bearing surface. The method includes the construction of a lapping guide having an edge feature that is easily and accurately located relative to the flare point of the write pole. This edge feature provides an abrupt change in electrical resistance across the lapping guide at a point when lapping should be terminated. And, since this feature can accurately located relative to the flare point, this provides an easily discernable ending point for lapping.
    Type: Application
    Filed: December 30, 2008
    Publication date: July 1, 2010
    Inventors: Edward Hin Pong Lee, Vladimir Nikitin, Michael Ming Hsiang Yang, Yuan Yao
  • Patent number: 7549215
    Abstract: A structure and method for performing magnetic inductance testing of write heads formed on a wafer. The structure and method allows for the effective inductive testing of magnetic write heads at wafer level even if the write heads have an inductance that is too low to be effectively measured directly. A test head is constructed having a structure similar to that of the write heads, but having a significantly higher magnetic inductance. The higher magnetic inductance of the write head can be provided by extending the shaping layer to or beyond the air bearing surface plane ABS. The inductance of the test head can be further increased by increasing the width of the portion of the shaping layer that extends to the ABS (ie. shaping layer throat) and by increasing the width of the write pole throat.
    Type: Grant
    Filed: March 28, 2007
    Date of Patent: June 23, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Wen-Chien David Hsiao, Michael Ming Hsiang Yang
  • Publication number: 20080235938
    Abstract: A structure and method for performing magnetic inductance testing of write heads formed on a wafer. The structure and method allows for the effective inductive testing of magnetic write heads at wafer level even if the write heads have an inductance that is too low to be effectively measured directly. A test head is constructed having a structure similar to that of the write heads, but having a significantly higher magnetic inductance. The higher magnetic inductance of the write head can be provided by extending the shaping layer to or beyond the air bearing surface plane ABS. The inductance of the test head can be further increased by increasing the width of the portion of the shaping layer that extends to the ABS (ie. shaping layer throat) and by increasing the width of the write pole throat.
    Type: Application
    Filed: March 28, 2007
    Publication date: October 2, 2008
    Inventors: Wen-Chien David Hsiao, Michael Ming Hsiang Yang
  • Publication number: 20080232000
    Abstract: A magnetic write head for perpendicular magnetic recording that is resistant to write pole and trailing shield protrusion. The write pole includes a magnetic return pole that is magnetically connected with the trailing shield, the return pole being resistant to deformation or recession such as from mechanically abrasive slider cleaning operations such as soda blast.
    Type: Application
    Filed: February 15, 2007
    Publication date: September 25, 2008
    Inventors: Eric Wayne Flint, Wen-Chien David Hsiao, Edward Hin Pong Lee, Michael Ming Hsiang Yang
  • Patent number: 7339763
    Abstract: A disk drive thin-film write head has a first ferromagnetic pole tip that includes a pedestal pole layer and a capping layer on the pedestal pole layer. A substantial portion of the pedestal pole layer is formed of a lower-moment alloy and the capping layer is formed of a higher-moment alloy and is made thick enough to compensate for the lower-moment alloy in the pedestal pole layer. The pedestal pole layer may be a bilayer of two different NiFe alloys with the upper layer in the bilayer having a higher moment, and the capping layer may be a CoFe alloy. The width of the pedestal pole layer is substantially reduced to reduce the pole tip area exposed. The reduced pole tip area and the increased use of lower-moment alloys enable a thinner protective film to be used to protect the pole tips from corrosion.
    Type: Grant
    Filed: March 4, 2005
    Date of Patent: March 4, 2008
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Eric Wayne Flint, Wen-Chien David Hsiao, Yiping Hsiao, Michael Ming Hsiang Yang
  • Patent number: 7292408
    Abstract: A magnetic write head for use in a data recording system having first and second magnetic pole, the first pole having a P1 pedestal. An electrically conductive coil passes through a space between the first and second poles for inducing a magnetic flux through the yoke formed by the first and second poles. A bi-layer insulation layer disposed between the poles includes a layer of photoresist for preventing voids and a layer of alumina formed thereover to provide a structural brace to prevent recession of the P1 pedestal during manufacturing operations such as soda blast.
    Type: Grant
    Filed: July 30, 2004
    Date of Patent: November 6, 2007
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Andrew Chiu, Edward Hin Pong Lee, John Jaekoyun Yang, Michael Ming Hsiang Yang, Sue Siyang Zhang
  • Patent number: 7129177
    Abstract: During fabrication of a write head via holes are first opened in a gap layer, followed by formation of seed layers instead of the other way around. Moreover a first seed layer is formed, and without the first seed layer being used a second seed layer is formed. The second seed layer (which is the topmost layer) is used in plating to form coils (e.g. of copper) for the write head. After coil formation, the first seed layer is used for plating to form vias (e.g. of NiFe). The two seed layers may be formed in a single operation by using two different targets in a vacuum deposition chamber. Moreover, a single insulation layer is sufficient to insulate and protect all plated elements, regardless of whether they are formed by use of the first seed layer or the second seed layer.
    Type: Grant
    Filed: October 29, 2004
    Date of Patent: October 31, 2006
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Douglas Kei Tak Tsang, Jorge D. Colonia, Yvette Chung Nga Winton, Michael Ming Hsiang Yang
  • Patent number: 7030893
    Abstract: The present invention discloses a method for driving a full-color LED display board with high resolution. It features three original color LED pixels that are arranged in a diamond pattern to form LED array, and an interlacing scan circuit is used to control the LED array. As a result, the display of a new pixel can be inserted between two contiguous pixels and the resolution of the full-color LED display board increases.
    Type: Grant
    Filed: February 25, 2003
    Date of Patent: April 18, 2006
    Assignee: Neo-Led Technology Co., Ltd.
    Inventor: Ming-Hsiang Yang
  • Publication number: 20050067690
    Abstract: The specification discloses a highly heat dissipative chip module along with its substrate. The chip module contains a highly heat dissipative substrate with several chips installed thereon. The highly heat dissipative substrate is prepared by forming an insulating layer on the surface of a metal compound plate. A copper wired layer is installed on the insulating layer. The copper wired layer can be used to adhere to the chip. The material of the substrate is preferably an aluminum compound material with a high thermal conduction coefficient. It has the advantages of having a light weight and reducing thermal deformations. The insulating layer is also formed using a material with good thermal conductivity, particularly metal oxides with thermal conduction coefficients higher than resins or fibers. The chip can thus homogeneously distribute heat to the whole printed circuit board, dissipating heat into the ambient space.
    Type: Application
    Filed: September 30, 2004
    Publication date: March 31, 2005
    Inventors: Ming-Hsiang Yang, Yuan-Fa Chu