Patents by Inventor Ming-June Lin

Ming-June Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180163296
    Abstract: An equipment for producing a film comprises a linear plasma generating module and a plasma distributing module. When the plasma flows out from the slit opening of the linear plasma generating module, the sleeve of the plasma distributing module rotates with respect to the liner plasma generating module, so that the plasma flowing out from the slit opening is further uniformly distributed outward by passing through the plurality of holes of the sleeve. The equipment for producing a film is applicable to selenization sulfuring process of the glass substrate.
    Type: Application
    Filed: December 12, 2016
    Publication date: June 14, 2018
    Inventors: WEN-CHUEH PAN, JEN-CHIEH LI, MING-JUNE LIN, HSIU-JUNG YEH
  • Patent number: 9983080
    Abstract: A high-temperature gas pressure measuring method includes a pressure measuring gas housing dividing step for dividing a pressure measuring gas housing into a pressure measuring room and a pressure referring room by a metal diaphragm; a gas introducing step for introducing high temperature gas into the pressure measuring room and introducing a reference pressure gas into the pressure referring room; a displacement measuring step for measuring a displacement of the metal diaphragm, wherein the displacement is caused by pressure difference between the two rooms in pressure measuring gas housing; and a pressure determining step for measuring the pressure of a high-temperature and/or corrosive to-measure pressure gas. The method dispenses with any corrosion-resistant and heat-resistant pressure sensing component and thus cuts costs.
    Type: Grant
    Filed: December 1, 2015
    Date of Patent: May 29, 2018
    Assignee: NATIONAL CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Yih-Hsing Wang, Wen-Chueh Pan, Ming-June Lin, Jen-Chieh Li, Tien-Fu Wu, Tsan-Tung Chen
  • Publication number: 20180127875
    Abstract: An apparatus for performing a selenization and sulfurization process on a glass substrate is introduced. A low-cost, non-toxic selenization and sulfurization process is performed on a large-area glass substrate in a normal-pressure environment with the apparatus to turn element selenium or sulfur into small molecules of high activity at high temperature by pyrolysis or by plasma, especially linear atmospheric pressure plasma. The process is finalized by dispersing the selenium or sulfur molecules uniformly and allowing the glass substrate to undergo reciprocating motion precisely, thereby achieving large-area, uniform selenization and sulfurization of the one-piece glass substrate.
    Type: Application
    Filed: November 4, 2016
    Publication date: May 10, 2018
    Inventors: WEN-CHUEH PAN, JEN-CHIEH LI, MING-JUNE LIN, TIEN-FU WU, TSAN-TUNG CHEN, YIH-HSING WANG, SHIH-SHAN WEI
  • Publication number: 20170153160
    Abstract: A high-temperature gas pressure measuring method includes a pressure measuring gas housing dividing step for dividing a pressure measuring gas housing into a pressure measuring room and a pressure referring room by a metal diaphragm; a gas introducing step for introducing high temperature gas into the pressure measuring room and introducing a reference pressure gas into the pressure referring room; a displacement measuring step for measuring a displacement of the metal diaphragm, wherein the displacement is caused by pressure difference between the two rooms in pressure measuring gas housing; and a pressure determining step for measuring the pressure of a high-temperature and/or corrosive to-measure pressure gas. The method dispenses with any corrosion-resistant and heat-resistant pressure sensing component and thus cuts costs.
    Type: Application
    Filed: December 1, 2015
    Publication date: June 1, 2017
    Inventors: YIH-HSING WANG, WEN-CHUEH PAN, MING-JUNE LIN, JEN-CHIEH LI, TIEN-FU WU, TSAN-TUNG CHEN
  • Publication number: 20170155005
    Abstract: A selenization/sulfurization process apparatus for use with a single-piece glass substrate is characterized by two chambers for heating up a glass substrate quickly and performing selenization/sulfurization on the glass substrate to not only prevent the glass substrate from staying at a soaking temperature of a softening point for a long period of time but also increase the thin-film selenization/sulfurization temperature according to the needs of the process to thereby reduce the duration of soaking selenization/sulfurization, save energy, and save time. The glass substrate undergoes reciprocating motion in the chambers to not only attain uniform temperature throughout the glass substrate but also distribute a selenization/sulfurization gas across the glass substrate uniformly during the selenization/sulfurization operation. The recycled liquid selenium/sulfur and inert gas are reusable to thereby reduce material costs.
    Type: Application
    Filed: December 1, 2015
    Publication date: June 1, 2017
    Inventors: WEN-CHUEH PAN, YIH-HSING WANG, MING-JUNE LIN, JEN-CHIEH LI, SHIH-SHAN WEI, TIEN-FU WU, TSAN-TUNG CHEN
  • Publication number: 20140130982
    Abstract: A thin film processing apparatus assembles a substrate and an auxiliary plate tightly and the substrate is coated with a thin film whereon the auxiliary plate is situated. Since the substrate or the auxiliary plate is transparent for thermal radiation, the thin film heated by thermal radiation symmetrically in thickness direction will be available. Consequentially debonding, warping and cracking of thin film are thus prevented and outgassing from thin film is eliminated as well.
    Type: Application
    Filed: November 13, 2012
    Publication date: May 15, 2014
    Inventors: Chiung-Chieh Su, Sung-Cheng Hu, Chin-Horng Yau, Lin-Sheng Jin, Ming-June Lin, Meng-Chiuan Yu
  • Publication number: 20110052159
    Abstract: An apparatus of thermal processing is provided. A heating lamp and a reflector are disposed over a wafer and the heat flux distribution on the wafer generated by the individual heating lamp is measured and adjusted. A set of heating lamps formed by heating lamps is disposed over the wafer. The heating lamps are in concentric rings and arranged as an axi-symmetric array. The relative position between the set of heating lamps and the wafer is adjusted so that the wafer center is at the position with local mean heat flux from lamps between the most inner lamp subset and its adjacent lamp subset. Followed by adjusting the heating powers, either or both of the wafer and the set of heating lamps are rotated respect to the center of the wafer, so as to improve uniformity of the heat flux distribution on the heated object.
    Type: Application
    Filed: September 3, 2009
    Publication date: March 3, 2011
    Inventors: Chiung-Chieh Su, Meng-Chiuan Yu, Ming-June Lin, Yong-Sen Su
  • Patent number: 7262390
    Abstract: An adjusting technology of thermal processing is provided. A heating lamp and a reflector are disposed over a wafer and the heat flux distribution on the wafer generated by the individual heating lamp is measured and adjusted. A set of heating lamps formed by heating lamps is disposed over the wafer. The heating lamps are in concentric rings and arranged as an axi-symmetric array. The relative position between the set of heating lamps and the wafer is adjusted so that the wafer center is at the position with local mean heat flux from lamps between the most inner lamp subset and its adjacent lamp subset. Followed by adjusting the heating powers, either or both of the wafer and the set of heating lamps are rotated respect to the center of the wafer, so as to improve uniformity of the heat flux distribution on the heated object.
    Type: Grant
    Filed: November 9, 2005
    Date of Patent: August 28, 2007
    Assignee: Chung Shan Institute of Science and Technology, Armaments Bureau, M.N.D.
    Inventors: Chiung-Chieh Su, Meng-Chiuan Yu, Jen-Chieh Tsao, Ming-June Lin, Yong-Sen Su, Yi-Hsiang Lai
  • Publication number: 20060291823
    Abstract: An adjusting technology of thermal processing is provided. A heating lamp and a reflector are disposed over a wafer and the heat flux distribution on the wafer generated by the individual heating lamp is measured and adjusted. A set of heating lamps formed by heating lamps is disposed over the wafer. The heating lamps are in concentric rings and arranged as an axi-symmetric array. The relative position between the set of heating lamps and the wafer is adjusted so that the wafer center is at the position with local mean heat flux from lamps between the most inner lamp subset and its adjacent lamp subset. Followed by adjusting the heating powers, either or both of the wafer and the set of heating lamps are rotated respect to the center of the wafer, so as to improve uniformity of the heat flux distribution on the heated object.
    Type: Application
    Filed: November 9, 2005
    Publication date: December 28, 2006
    Inventors: Chiung-Chieh Su, Meng-Chiuan Yu, Jen-Chieh Tsao, Ming-June Lin, Yong-Sen Su, Yi-Hsiang Lai