Patents by Inventor Ming Kuie Tseng

Ming Kuie Tseng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Carrier head with flexible membrane to provide controllable pressure and loading area
    Patent number: 6979250
    Abstract: A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a controllable load to a substrate in an area with a controllable inner diameter.
    Type: Grant
    Filed: March 22, 2004
    Date of Patent: December 27, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Steven M. Zuniga, Hung Chih Chen, Ming Kuie Tseng
  • Carrier head with flexible membrane to provide controllable pressure and loading area
    Publication number: 20040192173
    Abstract: A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a controllable load to a substrate in an area with a controllable inner diameter.
    Type: Application
    Filed: March 22, 2004
    Publication date: September 30, 2004
    Inventors: Steven M. Zuniga, Hung Chih Chen, Ming Kuie Tseng
  • Methods for carrier head with multi-part flexible membrane
    Patent number: 6776694
    Abstract: A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a load to a substrate. A central portion of the flexible membrane is formed of a first material with a different rigidity than a second material that forms the annular portion of the flexible membrane.
    Type: Grant
    Filed: July 1, 2002
    Date of Patent: August 17, 2004
    Assignee: Applied Materials Inc.
    Inventors: Steven M. Zuniga, Hung Chih Chen, Ming Kuie Tseng
  • Carrier head with flexible membranes to provide controllable pressure and loading area
    Patent number: 6722965
    Abstract: A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a controllable load to a substrate in an area with a controllable inner diameter.
    Type: Grant
    Filed: July 10, 2001
    Date of Patent: April 20, 2004
    Assignee: Applied Materials Inc.
    Inventors: Steven M. Zuniga, Hung Chih Chen, Ming Kuie Tseng
  • Methods for carrier head with multi-part flexible membrane
    Publication number: 20020182996
    Abstract: A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a load to a substrate. A central portion of the flexible membrane is formed of a first material with a different rigidity than a second material that forms the annular portion of the flexible membrane.
    Type: Application
    Filed: July 1, 2002
    Publication date: December 5, 2002
    Inventors: Steven M. Zuniga, Hung Chih Chen, Ming Kuie Tseng
  • Carrier head with multi-part flexible membrane
    Patent number: 6450868
    Abstract: A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a load to a substrate. A central portion of the flexible membrane is formed of a first material with a different rigidity than a second material that forms the annular portion of the flexible membrane.
    Type: Grant
    Filed: March 27, 2000
    Date of Patent: September 17, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Steven M. Zuniga, Hung Chih Chen, Ming Kuie Tseng
  • CARRIER HEAD WITH MULTI-PART FLEXIBLE MEMBRANE
    Publication number: 20020094767
    Abstract: A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a load to a substrate. A central portion of the flexible membrane is formed of a first material with a different rigidity than a second material that forms the annular portion of the flexible membrane.
    Type: Application
    Filed: March 27, 2000
    Publication date: July 18, 2002
    Applicant: zuniga
    Inventors: Steven M. Zuniga, Hung Chih Chen, Ming Kuie Tseng
  • Carrier head with flexible membranes to provide controllable pressure and loading area
    Publication number: 20020039879
    Abstract: A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a controllable load to a substrate in an area with a controllable inner diameter.
    Type: Application
    Filed: July 10, 2001
    Publication date: April 4, 2002
    Inventors: Steven M. Zuniga, Hung Chih Chen, Ming Kuie Tseng