Patents by Inventor Ming-Show Wong

Ming-Show Wong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8710357
    Abstract: A transparent conductive structure is disclosed, including a first transparent conductive layer and a second transparent conductive layer on the first transparent conductive layer, wherein the first transparent conductive layer has a textured structure including wave crests and wave troughs and the second layer has an asymmetric thickness on inclined planes of the wave crests or the wave troughs of the first transparent conductive layer.
    Type: Grant
    Filed: May 1, 2012
    Date of Patent: April 29, 2014
    Assignee: Industrial Technology Research Institute
    Inventors: Yu-Chih Wang, Kai-Hsiang Hung, Ming-Show Wong
  • Publication number: 20130104971
    Abstract: A transparent conductive structure is disclosed, including a first transparent conductive layer and a second transparent conductive layer on the first transparent conductive layer, wherein the first transparent conductive layer has a textured structure including wave crests and wave troughs and the second layer has an asymmetric thickness on inclined planes of the wave crests or the wave troughs of the first transparent conductive layer.
    Type: Application
    Filed: May 1, 2012
    Publication date: May 2, 2013
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Chih Wang, Kai-Hsiang Hung, Ming-Show Wong
  • Patent number: 5789071
    Abstract: A method and apparatus for monitoring and controlling deposition of metal, insulating compounds or other compounds on a substrate by sputtering techniques includes maintaining pulsed, constant, direct current power to the target, sensing the voltage of the target material used in the process, simultaneously rapidly sensing the partial pressure of the reactive gas, and simultaneously biasing the substrate to activate the reactive gas or otherwise energizing the reactive gas in the vicinity of the substrate. Low temperature coating (eg., below 550.degree. C.) of compounds such as alumina is effected by introduction of an extra energy source such as a radio frequency coil to the sputtering system to enhance the ionization potential of the positive ions. The asymmetric direct current pulsed magnetron power source is coupled to the cathode, as well as the substrate to be coated.
    Type: Grant
    Filed: December 12, 1996
    Date of Patent: August 4, 1998
    Assignee: Northwestern University
    Inventors: William D. Sproul, Scott A. Barnett, Anthony Lefkow, Ming-Show Wong, Phillip Yashar
  • Patent number: 5783295
    Abstract: The present invention provides a coated article comprising a substrate that can be non-crystalline or crystalline such as a polycrystalline engineering material, having advantageous mechanical properties and a superlattice-type protective composite coating on the substrate. The composite coating comprises a plurality of vapor deposited, ion bombarded, polycrystalline layers of different adjacent compositions formed one atop the other in lamellar manner. The polycrystalline layers have sufficiently thin individual layer thicknesses (e.g. not exceeding about 150 nanometers) and sufficiently distinct and different compositions proximate their interfaces despite being ion bombarded as to constitute superlattice layers that exhibit a collective hardness exceeding the hardness of any individual layer material in homogenous or bulk form.
    Type: Grant
    Filed: July 5, 1996
    Date of Patent: July 21, 1998
    Assignee: Northwestern University
    Inventors: Scott A. Barnett, William D. Sproul, Ming-show Wong, Xi Chu
  • Patent number: 5776615
    Abstract: A composite material having high hardness comprises a carbon nitrogen compound, such as CN.sub.x where x is greater than 0.1 and up to 1.33, deposited on a metal or metal compound selected to promote deposition of substantially crystalline CN.sub.x. The carbon nitrogen compound is deposited on a crystal plane of the metal or metal compound sufficiently lattice-matched with a crystal plane of the carbon nitrogen compound that the carbon nitrogen compound is substantially crystalline. A plurality of layers of the compounds can be formed in alternating sequence to provide a multi-layered, superlattice coating having a coating hardness in the range of 45-55 GPa, which corresponds to the hardness of a BN coating and approaches that of a diamond coating.
    Type: Grant
    Filed: February 14, 1995
    Date of Patent: July 7, 1998
    Assignee: Northwestern University
    Inventors: Ming-Show Wong, Dong Li, Yip-Wah Chung, William D. Sproul, Xi Chu, Scott A. Barnett
  • Patent number: 5725913
    Abstract: A composite material having high hardness comprises a carbon nitrogen compound, such as CN.sub.x where x is greater than 0.1 and up to 1.33, deposited on a metal or metal compound selected to promote deposition of substantially crystalline CN.sub.x. The carbon nitrogen compound is deposited on a crystal plane of the metal or metal compound sufficiently lattice-matched with a crystal plane of the carbon nitrogen compound that the carbon nitrogen compound is substantially crystalline. A plurality of layers of the compounds can be formed in alternating sequence to provide a multi-layered, superlattice coating having a coating hardness in the range of 45-55 GPa, which corresponds to the hardness of a BN coating and approaches that of a diamond coating.
    Type: Grant
    Filed: October 23, 1996
    Date of Patent: March 10, 1998
    Assignee: Northwestern University
    Inventors: Ming-Show Wong, Dong Li, Yin-Wah Chung, William D. Sproul, Xi Chu, Scott A. Barnett