Abstract: A semiconductor structure for high voltage/high current MOS circuits is provided, including a deep N-well (NMD), a P-well (PW) disposed within NWD, a plurality of field oxide regions (FOX), a plurality of doping regions, including both N+ regions and P+ regions, disposed within NWD and PW, a gate (G) connected to a doping region, a bulk pad (B) connected to a doping regions, a source pad (S) connected to a doping regions and a drain pad (D) connected to a doping region. The top view of the present invention shows that the regions are of non-specific shapes and overlaid in a radial manner, with doping region connected to B being encompassed by doping region connected to S, which in turn encompassed by G, encompassed by FOX, encompassed by doping region connected to D.