Patents by Inventor Mingtao (Gary) Li

Mingtao (Gary) Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for double-sided imprint lithography
    Patent number: 7717696
    Abstract: Apparatus for double-sided imprint lithography of an apertured substrate comprises a pair of correspondingly apertured molds, a support for an assembly of the substrate and molds, and an alignment mechanism with radially movable elements for aligning the apertures of the molds and the substrate. The movable elements can be at least partially disposed in a spindle and can be removed radially outward by a conically tapered drive rod. Opposing surfaces of the substrate can then be imprinted in registration at the same time, preferably by fluid pressure imprint lithography.
    Type: Grant
    Filed: August 13, 2004
    Date of Patent: May 18, 2010
    Assignee: Nanonex Corp.
    Inventors: Stephen Chou, Linshu Kong, Colby Steere, Mingtao (Gary) Li, Hua Tan, Lin Hu
  • Apparatus for double-sided imprint lithography
    Publication number: 20050146078
    Abstract: Apparatus for double-sided imprint lithography of an apertured substrate comprises a pair of correspondingly apertured molds, a support for an assembly of the substrate and molds, and an alignment mechanism with radially movable elements for aligning the apertures of the molds and the substrate. The movable elements can be at least partially disposed in a spindle and can be removed radially outward by a conically tapered drive rod. Opposing surfaces of the substrate can then be imprinted in registration at the same time, preferably by fluid pressure imprint lithography.
    Type: Application
    Filed: August 13, 2004
    Publication date: July 7, 2005
    Inventors: Stephen Chou, Linshu Kong, Colby Steere, Mingtao (Gary) Li, Hua Tan, Lin Hu