Patents by Inventor Minhuei Wang

Minhuei Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photopatternable materials and related electronic devices and methods
    Patent number: 9704997
    Abstract: The present polymeric materials can be patterned with relatively low photo-exposure energies and are thermally stable, mechanically robust, resist water penetration, and show good adhesion to metal oxides, metals, metal alloys, as well as organic materials. In addition, these polymeric materials can be solution-processed (e.g., by spin-coating), and can exhibit good chemical (e.g., solvent and etchant) resistance in the cured form.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: July 11, 2017
    Assignee: Flexterra, Inc.
    Inventors: Shaofeng Lu, Daniel Batzel, Chun Huang, Minhuei Wang, Meko McCray, Yu Xia, Antonio Facchetti
  • Photopatternable Materials and Related Electronic Devices and Methods
    Publication number: 20160190337
    Abstract: The present polymeric materials can be patterned with relatively low photo-exposure energies and are thermally stable, mechanically robust, resist water penetration, and show good adhesion to metal oxides, metals, metal alloys, as well as organic materials. In addition, these polymeric materials can be solution-processed (e.g., by spin-coating), and can exhibit good chemical (e.g., solvent and etchant) resistance in the cured form.
    Type: Application
    Filed: November 16, 2015
    Publication date: June 30, 2016
    Inventors: Shaofeng Lu, Daniel Batzel, Chun Huang, Minhuei Wang, Meko McCray, Yu Xia, Antonio Facchetti
  • Photopatternable materials and related electronic devices and methods
    Patent number: 9190493
    Abstract: The present polymeric materials can be patterned with relatively low photo-exposure energies and are thermally stable, mechanically robust, resist water penetration, and show good adhesion to metal oxides, metals, metal alloys, as well as organic materials. In addition, these polymeric materials can be solution-processed (e.g., by spin-coating), and can exhibit good chemical (e.g., solvent and etchant) resistance in the cured form.
    Type: Grant
    Filed: July 15, 2014
    Date of Patent: November 17, 2015
    Assignee: Polyera Corporation
    Inventors: Shaofeng Lu, Daniel Batzel, Chun Huang, Minhuei Wang, Meko McCray, Yu Xia, Antonio Facchetti
  • Coating materials for oxide thin film transistors
    Patent number: 9171961
    Abstract: The present teachings provide a coating composition (a passivation formulation) for preparing a coating material in a metal oxide thin film transistor, where the coating material comprises a polymer blend including a polymer and a stabilizing agent. Incorporation of a stabilizing agent according to the present teachings in the coating material can lead to improved device performance of the metal oxide thin film transistor, in particular, reduced shift in the threshold voltage and long-term bias-stress stability.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: October 27, 2015
    Assignee: Polyera Corporation
    Inventors: Antonio Facchetti, William Christopher Sheets, Don Frye, Jingqi Wang, Chung-Chin Hsiao, Minhuei Wang