Patent number: 9741969
Abstract: A carrier generation material is provided, which has a chemical structure of: wherein R1 is hydrogen or alkyl group; each of R2 is independently hydrogen, halogen, —CN, —CF3, —NO2, or alkyl group; each of R3 is independently hydrogen, halogen, —CN, —CF3, —NO2, or alkyl group; R4 is hydrogen, halogen, —CN, —CF3, —NO2, or alkyl group; R5 is hydrogen, halogen, —CN, —CF3, —NO2, or alkyl group; R6 is ?O, ?NH, or malononitrile group, and R7 is hydrogen, halogen, —CN, —CF3, —NO2, or alkyl group.
Type:
Grant
Filed:
September 21, 2015
Date of Patent:
August 22, 2017
Assignee:
National Tsing Hua University
Inventors:
Chien-Hong Cheng, Wei-Ting Hsieh, Chen-Hsun Hung, Min-Jie Huang, Cheng-Chang Lai, Chuang-Yi Liao
Publication number: 20170062771
Abstract: A carrier generation material is provided, which has a chemical structure of: wherein R1 is hydrogen or alkyl group; each of R2 is independently hydrogen, halogen, —CN, —CF3, —NO2, or alkyl group; each of R3 is independently hydrogen, halogen, —CN, —CF3, —NO2, or alkyl group; R4 is hydrogen, halogen, —CN, —CF3, —NO2, or alkyl group; R5 is hydrogen, halogen, —CN, —CF3, —NO2, or alkyl group; R6 is ?O, ?NH, or malononitrile group, and R7 is hydrogen, halogen, —CN, —CF3, —NO2, or alkyl group.
Type:
Application
Filed:
September 21, 2015
Publication date:
March 2, 2017
Inventors:
Chien-Hong Cheng, Wei-Ting Hsieh, Chen-Hsun Hung, Min-Jie Huang, Cheng-Chang Lai, Chuang-Yi Liao