Patents by Inventor Minju CHA

Minju CHA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor process wastewater treatment system and semiconductor process wastewater treatment method using the same
    Patent number: 11760674
    Abstract: A semiconductor process wastewater treatment system and a semiconductor process wastewater treatment method using the same are disclosed. The disclosed semiconductor process wastewater treatment system may comprises: a processing unit configured to receive semiconductor process wastewater and treats the semiconductor process wastewater through a plurality of operations; and a membrane filtration tank arranged separately from the processing unit, the membrane filtration tank having a ceramic nano-membrane for filtering the semiconductor process wastewater which has passed through the processing unit, wherein the ceramic nano-membrane may include a carbon-based nano-material. The ceramic nano-membrane may include a graphene-based nano-material as the carbon-based nano-material.
    Type: Grant
    Filed: October 26, 2021
    Date of Patent: September 19, 2023
    Assignees: SK hynix Inc., Ewha University—Industry Collaboration Foundation
    Inventors: Sehyuk Ahn, Chanhyuk Park, Soyoun Kim, Minju Cha
  • SEMICONDUCTOR PROCESS WASTEWATER TREATMENT SYSTEM AND SEMICONDUCTOR PROCESS WASTEWATER TREATMENT METHOD USING THE SAME
    Publication number: 20220127177
    Abstract: A semiconductor process wastewater treatment system and a semiconductor process wastewater treatment method using the same are disclosed. The disclosed semiconductor process wastewater treatment system may comprises: a processing unit configured to receive semiconductor process wastewater and treats the semiconductor process wastewater through a plurality of operations; and a membrane filtration tank arranged separately from the processing unit, the membrane filtration tank having a ceramic nano-membrane for filtering the semiconductor process wastewater which has passed through the processing unit, wherein the ceramic nano-membrane may include a carbon-based nano-material. The ceramic nano-membrane may include a graphene-based nano-material as the carbon-based nano-material.
    Type: Application
    Filed: October 26, 2021
    Publication date: April 28, 2022
    Inventors: Sehyuk AHN, Chanhyuk PARK, Soyoun KIM, Minju CHA