Patents by Inventor Minn-Horng Juang

Minn-Horng Juang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for preventing substrate damage during semiconductor fabrication
    Patent number: 5804493
    Abstract: A method for preventing substrate damage during semiconductor fabrication, comprising, forming a pad oxide layer on the substrate, depositing a polysilicon buffer layer on the pad oxide layer, ion-implanting fluorine into the polysilicon buffer layer, depositing a silicon nitride layer on the polysilicon buffer layer, defining an active region in the substrate, forming a local oxide layer beside the surface of the active region, removing the silicon nitride layer, removing the polysilicon buffer layer by dry etching, and etching the pad oxide layer to expose the substrate surface of active region.
    Type: Grant
    Filed: October 11, 1995
    Date of Patent: September 8, 1998
    Assignee: Mosel Vitelic, Inc.
    Inventors: Minn-Horng Juang, Cheng-Tsung Ni, Chih-Hsien Wang