Patents by Inventor MINORU EGAWA

MINORU EGAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Liquid processing apparatus including container, first and second electrodes, insulator surrounding at least part of side face of the first electrode, gas supply device, metallic member surrounding part of side face of the first electrode, and power source
    Patent number: 10446375
    Abstract: A liquid processing apparatus includes a container for holding liquid, a first electrode, a second electrode, a first insulator that has a cylindrical shape and at least partly surrounds a side face of the first electrode via a space, the first insulator having an opening in an end face of the first insulator, a gas supply device that supplies gas into the space and releases the gas into the liquid via the opening, a power source that applies a voltage between the first electrode and the second electrode and generates plasma, and a metallic member that partly surrounds the side face of the first electrode via the space. The metallic member is electrically connected to the first electrode. At least a part of the first insulator is disposed between the first electrode and the metallic member.
    Type: Grant
    Filed: February 21, 2018
    Date of Patent: October 15, 2019
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventor: Minoru Egawa
  • Plasma generating method including generating first plasma without supplying first gas in liquid and generating second plasma in first gas, and plasma generating apparatus
    Patent number: 10220107
    Abstract: A plasma generating method, used in a plasma generating apparatus which includes a container, a first electrode, and a second electrode, includes: supplying a liquid in the container so that the second electrode is in contact with the liquid; in a first period, generating first plasma in a bubble generated in the liquid by applying a first voltage between the first electrode and the second electrode; supplying a first gas in the liquid in a second period after the first period; and generating second plasma in the first gas by applying a second voltage between the first electrode and the second electrode. In generating the first plasma, the first gas is not supplied in the liquid. The bubble contains a second gas.
    Type: Grant
    Filed: March 21, 2017
    Date of Patent: March 5, 2019
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Minoru Egawa, Yoshihiro Sakaguchi
  • LIQUID PROCESSING APPARATUS INCLUDING CONTAINER, FIRST AND SECOND ELECTRODES, INSULATOR SURROUNDING AT LEAST PART OF SIDE FACE OF THE FIRST ELECTRODE, GAS SUPPLY DEVICE, METALLIC MEMBER SURROUNDING PART OF SIDE FACE OF THE FIRST ELECTRODE, AND POWER SOURCE
    Publication number: 20180269040
    Abstract: A liquid processing apparatus includes a container for holding liquid, a first electrode, a second electrode, a first insulator that has a cylindrical shape and at least partly surrounds a side face of the first electrode via a space, the first insulator having an opening in an end face of the first insulator, a gas supply device that supplies gas into the space and releases the gas into the liquid via the opening, a power source that applies a voltage between the first electrode and the second electrode and generates plasma, and a metallic member that partly surrounds the side face of the first electrode via the space. The metallic member is electrically connected to the first electrode. At least a part of the first insulator is disposed between the first electrode and the metallic member.
    Type: Application
    Filed: February 21, 2018
    Publication date: September 20, 2018
    Inventor: MINORU EGAWA
  • PLASMA GENERATING METHOD INCLUDING GENERATING FIRST PLASMA WITHOUT SUPPLYING FIRST GAS IN LIQUID AND GENERATING SECOND PLASMA IN FIRST GAS, AND PLASMA GENERATING APPARATUS
    Publication number: 20170281813
    Abstract: A plasma generating method, used in a plasma generating apparatus which includes a container, a first electrode, and a second electrode, includes: supplying a liquid in the container so that the second electrode is in contact with the liquid; in a first period, generating first plasma in a bubble generated in the liquid by applying a first voltage between the first electrode and the second electrode; supplying a first gas in the liquid in a second period after the first period; and generating second plasma in the first gas by applying a second voltage between the first electrode and the second electrode. In generating the first plasma, the first gas is not supplied in the liquid. The bubble contains a second gas.
    Type: Application
    Filed: March 21, 2017
    Publication date: October 5, 2017
    Inventors: MINORU EGAWA, YOSHIHIRO SAKAGUCHI