Patents by Inventor Minoru Iijima

Minoru Iijima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11955500
    Abstract: There is provided a solid-state imaging device including: a first substrate including a first semiconductor substrate and a first wiring layer, the first semiconductor substrate having a pixel unit with pixels; a second substrate including a second semiconductor substrate and a second wiring layer, the second semiconductor substrate having a circuit with a predetermined function; and a third substrate including a third semiconductor substrate and a third wiring layer, the third semiconductor substrate having a circuit with a predetermined function, the first, second, and third substrates being stacked in this order, the first substrate and the second substrate being bonded together with the first wiring layer and the second wiring layer opposed to each other, a first coupling structure on bonding surfaces of the first substrate and the second substrate, and including an electrode junction structure with electrodes formed on the respective bonding surfaces in direct contact with each other.
    Type: Grant
    Filed: February 3, 2022
    Date of Patent: April 9, 2024
    Assignee: Sony Semiconductor Solutions Corporation
    Inventors: Reijiroh Shohji, Masaki Haneda, Hiroshi Horikoshi, Minoru Ishida, Takatoshi Kameshima, Ikue Mitsuhashi, Hideto Hashiguchi, Tadashi Iijima
  • Patent number: 11948961
    Abstract: A solid-state imaging device including a first substrate on which a pixel unit is formed, and a first semiconductor substrate and a first multi-layered wiring layer are stacked, a second substrate on which a circuit having a predetermined function is formed, and a second semiconductor substrate and a second multi-layered wiring layer are stacked, and a third substrate on which a circuit having a predetermined function is formed, and a third semiconductor substrate and a third multi-layered wiring layer are stacked. The first substrate, the second substrate, and the third substrate are stacked in this order. A first coupling structure for electrically coupling a circuit of the first substrate and the circuit of the second substrate to each other does not include a coupling structure formed from the first substrate as a base over bonding surfaces of the first substrate and the second substrate.
    Type: Grant
    Filed: July 20, 2022
    Date of Patent: April 2, 2024
    Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
    Inventors: Hideto Hashiguchi, Reijiroh Shohji, Hiroshi Horikoshi, Ikue Mitsuhashi, Tadashi Iijima, Takatoshi Kameshima, Minoru Ishida, Masaki Haneda
  • Patent number: 11926840
    Abstract: The present invention enables simultaneous and stable expression of a plurality of foreign genes by using a stealthy RNA gene expression system that is a complex that does not activate the innate immune mechanism and is formed from an RNA-dependent RNA polymerase, a single-strand RNA binding protein, and negative-sense single-strand RNAs including the following (1) to (8): (1) a target RNA sequence that codes for any protein or functional RNA; (2) an RNA sequence forming a noncoding region and derived from mRNA expressed in animal cells; (3) a transcription initiation signal sequence recognized by the RNA-dependent RNA polymerase; (4) a transcription termination signal sequence recognized by the polymerase; (5) an RNA sequence containing a replication origin recognized by the polymerase; (6) an RNA sequence that codes for the polymerase and of which codons are optimized for the species from which an introduction target cell is derived; (7) an RNA sequence that codes for a protein for regulating the activity o
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: March 12, 2024
    Assignees: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, TOKIWA-BIO INC.
    Inventors: Mahito Nakanishi, Minoru Iijima
  • Patent number: 11834667
    Abstract: The present invention enables simultaneous and stable expression of a plurality of foreign genes by using a stealthy RNA gene expression system that is a complex that does not activate the innate immune mechanism and is formed from an RNA-dependent RNA polymerase, a single-strand RNA binding protein, and negative-sense single-strand RNAs including the following (1) to (8): (1) a target RNA sequence that codes for any protein or functional RNA; (2) an RNA sequence forming a noncoding region and derived from mRNA expressed in animal cells; (3) a transcription initiation signal sequence recognized by the RNA-dependent RNA polymerase; (4) a transcription termination signal sequence recognized by the polymerase; (5) an RNA sequence containing a replication origin recognized by the polymerase; (6) an RNA sequence that codes for the polymerase and of which codons are optimized for the species from which an introduction target cell is derived; (7) an RNA sequence that codes for a protein for regulating the activity o
    Type: Grant
    Filed: November 22, 2019
    Date of Patent: December 5, 2023
    Assignees: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, TOKIWA-BIO INC.
    Inventors: Mahito Nakanishi, Minoru Iijima
  • Publication number: 20200190537
    Abstract: The present invention enables simultaneous and stable expression of a plurality of foreign genes by using a stealthy RNA gene expression system that is a complex that does not activate the innate immune mechanism and is formed from an RNA-dependent RNA polymerase, a single-strand RNA binding protein, and negative-sense single-strand RNAs including the following (1) to (8) : (1) a target RNA sequence that codes for any protein or functional RNA; (2) an RNA sequence forming a noncoding region and derived from mRNA expressed in animal cells; (3) a transcription initiation signal sequence recognized by the RNA-dependent RNA polymerase; (4) a transcription termination signal sequence recognized by the polymerase; (5) an RNA sequence containing a replication origin recognized by the polymerase; (6) an RNA sequence that codes for the polymerase and of which codons are optimized for the species from which an introduction target cell is derived; (7) an RNA sequence that codes for a protein for regulating the activity
    Type: Application
    Filed: November 22, 2019
    Publication date: June 18, 2020
    Applicants: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, TOKIWA-BIO INC.
    Inventors: Mahito Nakanishi, Minoru Iijima
  • Publication number: 20200157571
    Abstract: The present invention enables simultaneous and stable expression of a plurality of foreign genes by using a stealthy RNA gene expression system that is a complex that does not activate the innate immune mechanism and is formed from an RNA-dependent RNA polymerase, a single-strand RNA binding protein, and negative-sense single-strand RNAs including the following (1) to (8): (1) a target RNA sequence that codes for any protein or functional RNA; (2) an RNA sequence forming a noncoding region and derived from mRNA expressed in animal cells; (3) a transcription initiation signal sequence recognized by the RNA-dependent RNA polymerase; (4) a transcription termination signal sequence recognized by the polymerase; (5) an RNA sequence containing a replication origin recognized by the polymerase; (6) an RNA sequence that codes for the polymerase and of which codons are optimized for the species from which an introduction target cell is derived; (7) an RNA sequence that codes for a protein for regulating the activity o
    Type: Application
    Filed: December 4, 2019
    Publication date: May 21, 2020
    Applicants: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, TOKIWA-BIO INC.
    Inventors: Mahito Nakanishi, Minoru Iijima
  • Patent number: 10544431
    Abstract: Simultaneous expression of a plurality of foreign genes by using a stealthy RNA gene expression system that is a complex that does not activate the innate immune mechanism and is formed from an RNA-dependent RNA polymerase, a single-strand RNA binding protein, and negative-sense single-strand RNAs including the following (1) to (8): (1) a target RNA sequence that codes for any protein or functional RNA; (2) an RNA sequence forming a noncoding region and derived from mRNA; (3) a transcription initiation signal sequence recognized by the RNA-dependent RNA polymerase; (4) a transcription termination signal sequence recognized by the polymerase; (5) an RNA sequence containing a replication origin recognized by the polymerase; (6) an RNA sequence that codes for the polymerase; (7) an RNA sequence that codes for a protein for regulating the activity of the polymerase; and (8) an RNA sequence that codes for the single-strand RNA binding protein.
    Type: Grant
    Filed: January 18, 2016
    Date of Patent: January 28, 2020
    Assignees: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, TOKIWA-BIO INC.
    Inventors: Mahito Nakanishi, Minoru Iijima
  • Publication number: 20170369903
    Abstract: Simultaneous expression of a plurality of foreign genes by using a stealthy RNA gene expression system that is a complex that does not activate the innate immune mechanism and is formed from an RNA-dependent RNA polymerase, a single-strand RNA binding protein, and negative-sense single-strand RNAs including the following (1) to (8): (1) a target RNA sequence that codes for any protein or functional RNA; (2) an RNA sequence forming a noncoding region and derived from mRNA; (3) a transcription initiation signal sequence recognized by the RNA-dependent RNA polymerase; (4) a transcription termination signal sequence recognized by the polymerase; (5) an RNA sequence containing a replication origin recognized by the polymerase; (6) an RNA sequence that codes for the polymerase; (7) an RNA sequence that codes for a protein for regulating the activity of the polymerase; and (8) an RNA sequence that codes for the single-strand RNA binding protein.
    Type: Application
    Filed: January 18, 2016
    Publication date: December 28, 2017
    Applicants: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, TOKIWA-BIO INC.
    Inventors: Mahito Nakanishi, Minoru Iijima
  • Patent number: 8709698
    Abstract: A radical polymerization initiator represented by the following formula (G) in the formula (G), R71 and R72 are each a hydrocarbon group of 3 to 6 carbon atoms which may contain nitrogen atom; R73 and R74 are each a hydrogen atom or an acid-dissociating, dissolution-suppressing group; and at least one of R73 and R74 is an acid-dissociating, dissolution-suppressing group represented by the following formula (R78); and wherein R77 is a hydrocarbon group of 1 to 26 carbon atoms which may contain hetero atoms.
    Type: Grant
    Filed: September 12, 2011
    Date of Patent: April 29, 2014
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Minoru Iijima, Takanori Yamagishi
  • Publication number: 20120071638
    Abstract: A copolymer for positive type lithography, having at least a recurring unit (A) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (A) [in the formula (A), R10 is a hydrogen atom or a hydrocarbon group which may be substituted by fluorine atom; R11 is a crosslinked, alicyclic hydrocarbon group; n is an integer of 0 or 1; and R12 is an acid-dissociating, dissolution-suppressing group], and a terminal structure (B) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (B) [in the formula (B), R21 is a hydrocarbon group which may contain nitrogen atom; R22 is an acid-dissociating, dissolution-suppressing group; and p is a site of bonding with copolymer main chain].
    Type: Application
    Filed: September 12, 2011
    Publication date: March 22, 2012
    Applicant: Maruzen Petrochemical Co., Ltd.
    Inventors: Minoru Iijima, Takanori Yamagishi
  • Patent number: 8067516
    Abstract: A copolymer for positive type lithography, having at least a recurring unit (A) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (A) [in the formula (A), R10 is a hydrogen atom or a hydrocarbon group which may be substituted by fluorine atom; R11 is a crosslinked, alicyclic hydrocarbon group; n is an integer of 0 or 1; and R12 is an acid-dissociating, dissolution-suppressing group], and a terminal structure (B) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (B) [in the formula (B), R21 is a hydrocarbon group which may contain nitrogen atom; R22 is an acid-dissociating, dissolution-suppressing group; and p is a site of bonding with copolymer main chain]. The copolymer is used in chemically amplified positive type lithography and is superior in lithography properties (e.g.
    Type: Grant
    Filed: May 4, 2007
    Date of Patent: November 29, 2011
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Minoru Iijima, Takanori Yamagishi
  • Patent number: 7345119
    Abstract: An olefin polymerization solid catalyst including a reaction product of a transition metal compound and an organoaluminum compound carried on a support having silica treated with an organoaluminum-oxy compound.
    Type: Grant
    Filed: November 30, 2004
    Date of Patent: March 18, 2008
    Assignee: Maruzen Petrochemical Company, Limited
    Inventors: Toshifumi Takemori, Minoru Iijima, Yoshihisa Hayashida, Masashi Iida
  • Publication number: 20070269741
    Abstract: A copolymer for positive type lithography, having at least a recurring unit (A) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (A) [in the formula (A), R10 is a hydrogen atom or a hydrocarbon group which may be substituted by fluorine atom; R11 is a crosslinked, alicyclic hydrocarbon group; n is an integer of 0 or 1; and R12 is an acid-dissociating, dissolution-suppressing group], and a terminal structure (B) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (B) [in the formula (B), R21 is a hydrocarbon group which may contain nitrogen atom; R22 is an acid-dissociating, dissolution-suppressing group; and p is a site of bonding with copolymer main chain]. The copolymer is used in chemically amplified positive type lithography and is superior in lithography properties (e.g.
    Type: Application
    Filed: May 4, 2007
    Publication date: November 22, 2007
    Inventors: Minoru Iijima, Takanori Yamagishi
  • Publication number: 20060287469
    Abstract: The present invention provides a copolymer for semiconductor lithography, comprising: at least, a recurring unit (A) having a structure wherein an alkali-soluble group has been protected with an acid-dissociating, dissolution-suppressing group, and a terminal structure (F) represented by the following formula (F): (wherein X1 and X2 are each independently a hydrogen atom, a halogen atom or a hydrocarbon group of 1 to 4 carbon atoms which may be substituted with halogen atom; Y11 to Y14 are a hydrogen atom, or an ether bond or a hydrocarbon bond of 1 to 2 carbon atoms, each formed between Y11 and Y12 or between Y13 and Y14; Y21 to Y25 are each independently a hydrogen atom or a hydrocarbon group of 1 to 4 carbon atoms; and n is an integer of 0 or 1); a composition containing the copolymer; and a thiol compound giving the copolymer. The copolymer of the present invention, when used in semiconductor lithography, is superior in lithography properties such as development contrast, DOF and the like.
    Type: Application
    Filed: June 1, 2006
    Publication date: December 21, 2006
    Inventors: Minoru Iijima, Takanori Yamagishi
  • Publication number: 20050215736
    Abstract: An olefin polymerization solid catalyst which comprises having a reaction product of (C) a transition metal compound of the following formula (1) or (2) and (D) an organoaluminum compound carried on a support having (A) silica treated with (B) an organoaluminum-oxy compound; (R1aCp)m(R2bCp)nM-(-X-Ar-Yc)4-(m+n)??(1) wherein M is titanium, zirconium or hafnium, Cp is a group having a cyclopentadienyl structure, R1 and R2 are a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, an alkylaryl group, an arylalkyl group or an alkylsilyl group, X is an oxygen atom or a sulfur atom, Ar is an aromatic ring, Y may be the same or different and is a hydrogen atom or a substituent selected from the group consisting of a hydrocarbon group, an alkylsilyl group, a halogen atom, a halogenated hydrocarbon group, a nitrogen-containing organic group, an oxygen-containing organic group or a sulfur-containing organic group, a and b are an integer of from 0 to 5, m and n are an integer of from 0 to 3, m+n is an integ
    Type: Application
    Filed: November 30, 2004
    Publication date: September 29, 2005
    Applicant: MARUZEN PETROCHEMICAL COMPANY, LIMITED
    Inventors: Toshifumi Takemori, Minoru Iijima, Yoshihisa Hayashida, Masashi Iida
  • Patent number: 6787616
    Abstract: A solid catalyst for olefin polymerization, which comprises a silica carrier (A) having a specific surface area of from 600 to 850 m2/g, a pore volume of from 0.1 to 0.8 ml/g and an average particle size of from 2 to 12 &mgr;m, and an organoaluminum-oxy compound (B) and a Group IVB transition metal compound (C) containing a ligand having a cyclopentadienyl skeleton, supported on the carrier (A).
    Type: Grant
    Filed: June 18, 2003
    Date of Patent: September 7, 2004
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Toshifumi Takemori, Masashi Iida, Minoru Iijima, Yoshihisa Hayashida, Masao Kawahara
  • Publication number: 20040010104
    Abstract: A solid catalyst for olefin polymerization, which comprises a silica carrier (A) having a specific surface area of from 600 to 850 m2/g, a pore volume of from 0.1 to 0.8 ml/g and an average particle size of from 2 to 12 &mgr;m, and an organoaluminum-oxy compound (B) and a Group IVB transition metal compound (C) containing a ligand having a cyclopentadienyl skeleton, supported on the carrier (A).
    Type: Application
    Filed: June 18, 2003
    Publication date: January 15, 2004
    Applicant: MARUZEN PETROCHEMICAL CO., LTD.
    Inventors: Toshifumi Takemori, Masashi Iida, Minoru Iijima, Yoshihisa Hayashida, Masao Kawahara
  • Patent number: 6455647
    Abstract: The present invention relates to a solid catalyst (D) for olefin polymerization comprising a magnesium-containing solid component (A) carrying thereon an organoaluminum-oxy compound (B) and a metallocene compound (C), the magnesium-containing compound (A) being obtained by heat treating a magnesium compound represented by the general formula: MgX2.nH2O where X represents a halogen atom and n is an integer of 1 to 12, and to a method of producing an olefinic polymer using the catalyst. In the case where the above solid catalyst for olefin polymerization is used, catalyst activity, particularly activity per solid catalyst, is high. Therefore, a deashing treatment step such as catalyst removal can be omitted. Further, the olefinic polymer produced has a narrow molecular weight distribution, and in the case of a copolymer, its monomer composition is uniform.
    Type: Grant
    Filed: June 8, 2000
    Date of Patent: September 24, 2002
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Sakae Kamiyama, Toshifumi Takemori, Minoru Iijima, Yukiko Hane, Shigeharu Yamamoto
  • Patent number: 6368995
    Abstract: A solid catalyst for olefin polymerization, obtained by reacting a least one of a hydropolysiloxane compound, having the formula R1aHbSiO(4−a−b)/2, a silane compound of formula R2cSi(OH)4−c, and condensates of the silane, with a compound of formula (MgR32)p.(R3MgX)q to form a reaction product. The reaction product is reacted with an alcohol, having 1 to 4 carbon atoms, to obtain an intermediate product. The intermediate product, is then reacted with water to obtain reaction product. An organoaluminum oxy compound and a metallocene compound are carried on the solid reaction product. The solid catalyst may be used for olefin polymerization. The catalyst requires no deashing treatment and produces a polymer having high bulk density and narrow particle size distribution. Thus the solid catalystenables control of particle size of the polymer in a simple easy manner, and shows no adhesion of polymer onto the inner wall of autoclave.
    Type: Grant
    Filed: June 8, 2000
    Date of Patent: April 9, 2002
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Sakae Kamiyama, Toshifumi Takemori, Minoru Iijima, Yukiko Hane, Shigeharu Yamamoto
  • Patent number: 5557189
    Abstract: A battery charging apparatus for charging the electricity from a current source to a cell includes a variable resistor in parallel with the cell, a cell voltage detection unit for detecting the current voltage value of the cell and a comparator for comparing the current voltage value to a pre-set voltage value. The resistance value of the variable resistor is controlled responsive to the results of comparison so that the current from the current source is caused to flow through both the cell and the variable resistor with progress in the charging of the cell. The current is prevented from flowing through the cell when the cell is fully charged, so that overcharging is eliminated. If plural cells are charged in series, the control operation of not causing the current to flow through the fully charged cell can be carried out for each of the cells, so that integrated charging may be continued until all of the cells are fully charged thus shortening the cell charging time.
    Type: Grant
    Filed: December 9, 1994
    Date of Patent: September 17, 1996
    Assignee: Sony Corporation
    Inventors: Mamoru Suzuki, Minoru Iijima, Yasuyuki Ishihama, Nobuhiro Fujiwara