Patents by Inventor Minoru Inada

Minoru Inada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9435913
    Abstract: An interlayer film for laminated glass that suppresses the transmittance of ultraviolet rays with a wave length of 400 nm to 1% or less, and has high light resistance. The interlayer film for laminated glass comprises a thermoplastic resin, an ultraviolet absorber having a structure of formula (1), and an ultraviolet absorber having a structure of formula (2), wherein the amount of the ultraviolet absorber of formula (1) is 0.001 to 0.05% by weight, and the amount of the ultraviolet absorber of formula (2) is 0.5 to 1.0% by weight; wherein R1 is a C1-3 alkyl group; R2 is hydrogen, a C1-10 alkyl group, or a C7-10 aralkyl group; R3 is hydrogen or a C1-8 alkyl group; and R4 is hydrogen or a C1-8 alkyl group.
    Type: Grant
    Filed: August 19, 2011
    Date of Patent: September 6, 2016
    Assignees: SEKISUI CHEMICAL CO., LTD., ASAHI GLASS COMPANY, LIMITED
    Inventors: Bungo Hatta, Kazuhiko Nakayama, Minoru Inada, Yuji Masaki, Jun Hikata
  • Publication number: 20130194659
    Abstract: The present invention aims to provide an interlayer film for laminated glass which can suppress the transmittance of ultraviolet rays with a wave length of 400 nm to 1% or less, and has high light resistance; and laminated glass including the interlayer film for laminated glass. The present invention provides an interlayer film for laminated glass including a thermoplastic resin, an ultraviolet absorber having a structure represented by the following formula (1), and an ultraviolet absorber having a structure represented by the following formula (2), wherein the amount of the ultraviolet absorber having a structure represented by the following formula (1) is 0.001 to 0.05% by weight, and the amount of the ultraviolet absorber having a structure represented by the following formula (2) is 0.4 to 1.5% by weight. In the formula (1), R1 represents a C1 to C3 alkyl group, and R2 represents hydrogen, a C1 to C10 alkyl group, or a C7 to C10 aralkyl group.
    Type: Application
    Filed: August 19, 2011
    Publication date: August 1, 2013
    Inventors: Bungo Hatta, Kazuhiko Nakayama, Minoru Inada, Yuji Masaki, Jun Hikata
  • Patent number: 8361625
    Abstract: An interlayer film for a laminated glass which reduces transmittance of ultraviolet rays having wavelength of 380 to 400 nm and has an excellent durability to light exposure, while maintaining high visible light transmittance. The interlayer film for a laminated glass comprises a thermoplastic resin and an indole compound having a structure represented by the following chemical formula 1: Wherein R1 represents an alkyl group having 1-3 carbon atoms, and R2 represents hydrogen, an alkyl group having 1-10 carbon atoms, or an aralkyl group having 7-10 carbon atoms.
    Type: Grant
    Filed: January 22, 2009
    Date of Patent: January 29, 2013
    Assignees: Sekisui Chemical Co., Ltd., Orient Chemical Industries, Ltd., Asahi Glass Company, Limited
    Inventors: Bungo Hatta, Hirofumi Kitano, Minoru Inada, Jun Hikata
  • Patent number: 8304082
    Abstract: The present invention has its object to provide an interlayer film for a laminated glass, which is excellent in penetration resistance, moisture resistance, and sound insulation. The present invention relates to an interlayer film for a laminated glass, which comprises: a polyvinyl acetal resin; and a plasticizer, the plasticizer being represented by formula (1): wherein R1 represents a phenyl group, R2 represents an alkylene group having 2 to 4 carbon atoms, and n represents 4 to 6.
    Type: Grant
    Filed: July 16, 2009
    Date of Patent: November 6, 2012
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Bungo Hatta, Takahiro Futamura, Minoru Inada, Hirofumi Kitano
  • Publication number: 20110151269
    Abstract: The present invention has its object to provide an interlayer film for a laminated glass, which is excellent in penetration resistance, moisture resistance, and sound insulation. The present invention relates to an interlayer film for a laminated glass, which comprises: a polyvinyl acetal resin; and a plasticizer, the plasticizer being represented by formula (1): wherein R1 represents a phenyl group, R2 represents an alkylene group having 2 to 4 carbon atoms, and n represents 4 to 6.
    Type: Application
    Filed: July 16, 2009
    Publication date: June 23, 2011
    Inventors: Bungo Hatta, Takahiro Futamura, Minoru Inada, Hirofumi Kitano
  • Publication number: 20100279150
    Abstract: It is an object of the present invention to provide an interlayer film for a laminated glass which can reduce transmittance of ultraviolet rays having wavelength of 380 to 400 nm and has excellent durability to light exposure while maintaining high visible light transmittance. The interlayer film for a laminated glass of the present invention is an interlayer film for a laminated glass, which comprises a thermoplastic resin and an indole compound having a structure represented by the following general Chemical Formula (1): wherein R1 represents an alkyl group having 1 to 3 of carbon atoms, and R2 represents hydrogen, an alkyl group having 1 to 10 of carbon atoms, or an aralkyl group having 7 to 10 of carbon atoms.
    Type: Application
    Filed: January 22, 2009
    Publication date: November 4, 2010
    Applicants: Sekisui Chemical Co., Ltd., Orient Chemical Industries, Ltd.
    Inventors: Bungo Hatta, Hirofumi Kitano, Minoru Inada, Jun Hikata
  • Patent number: 6694050
    Abstract: To reliably and simply prevent the output of specified image data, a unit to detect a pattern is installed in one of the devices in a system consisting of an image scanner 1, control device 2 (a personal computer) and printer 3 which are connected consecutively. This pattern detection unit contains a unit which detects a specified pattern from the mass of image data representing a document. Once this pattern has been found, either the subsequent image data are altered before being output or output of the image data is interrupted. When the system starts up, the control unit for each device checks whether that device, or one of the other devices in the system, has a pattern detection unit as described above. If it determines that no device has such a unit, it halts operation.
    Type: Grant
    Filed: March 22, 2001
    Date of Patent: February 17, 2004
    Assignee: Omron Corporation
    Inventors: Junji Hiraishi, Tetsuya Miwa, Hitoshi Nakamura, Kiyoshi Imai, Kouichi Ohmae, Shinya Sonoda, Souichi Matsushita, Minoru Inada
  • Patent number: 6384185
    Abstract: A process for purifying a polycarbonate resin solution which comprises passing a water-in-oil dispersion type (W/O) emulsion composed of a mixture of an organic solvent solution containing a polycarbonate resin with a aqueous solution and having water particles with an average diameter of 1 to 100 &mgr;m in an oil through a metallic filter having a filtering precision of 10 to 200 &mgr;m, and then, settling the mixture for 1 to 30 minutes to perform separation between the organic solvent solution containing a polycarbonate resin and the aqueous solution containing contaminations.
    Type: Grant
    Filed: January 5, 2000
    Date of Patent: May 7, 2002
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Minoru Inada, Tatsuhide Hosomi, Toshiaki Asoh, Makoto Mizutani
  • Publication number: 20010009591
    Abstract: To reliably and simply prevent the output of specified image data, a unit to detect a pattern is installed in one of the devices in a system consisting of an image scanner 1, control device 2 (a personal computer) and printer 3 which are connected consecutively. This pattern detection unit contains a unit which detects a specified pattern from the mass of image data representing a document. Once this pattern has been found, either the subsequent image data are altered before being output or output of the image data is interrupted. When the system starts up, the control unit for each device checks whether that device, or one of the other devices in the system, has a pattern detection unit as described above. If it determines that no device has such a unit, it halts operation.
    Type: Application
    Filed: March 22, 2001
    Publication date: July 26, 2001
    Inventors: Junji Hiraishi, Tetsuya Miwa, Hitoshi Nakamura, Kiyoshi Imai, Kouichi Ohmae, Shinya Sonoda, Souichi Matsushita, Minoru Inada
  • Patent number: 6229914
    Abstract: To reliably and simply prevent the output of specified image data, a unit to detect a pattern is installed in one of the devices in a system consisting of an image scanner 1, control device 2 (a personal computer) and printer 3 which are connected consecutively. This pattern detection unit contains a unit which detects a specified pattern from the mass of image data representing a document. Once this pattern has been found, either the subsequent image data are altered before being output or output of the image data is interrupted. When the system starts up, the control unit for each device checks whether that device, or one of the other devices in the system, has a pattern detection unit as described above. If it determines that no device has such a unit, it halts operation.
    Type: Grant
    Filed: March 6, 2000
    Date of Patent: May 8, 2001
    Assignee: Omron Corporation
    Inventors: Junji Hiraishi, Tetsuya Miwa, Hitoshi Nakamura, Kiyoshi Imai, Kouichi Ohmae, Shinya Sonoda, Souichi Matsushita, Minoru Inada
  • Patent number: 6136766
    Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and l is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: October 24, 2000
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
  • Patent number: 6052479
    Abstract: To reliably and simply prevent the output of specified image data, a unit to detect a pattern is installed in one of the devices in a system consisting of an image scanner 1, control device 2 (a personal computer) and printer 3 which are connected consecutively. This pattern detection unit contains a unit which detects a specified pattern from the mass of image data representing a document. Once this pattern has been found, either the subsequent image data are altered before being output or output of the image data is interrupted. When the system starts up, the control unit for each device checks whether that device, or one of the other devices in the system, has a pattern detection unit as described above. If it determines that no device has such a unit, it halts operation.
    Type: Grant
    Filed: July 1, 1996
    Date of Patent: April 18, 2000
    Assignee: Omron Corporation
    Inventors: Junji Hiraishi, Tetsuya Miwa, Hitoshi Nakamura, Kiyoshi Imai, Kouichi Ohmae, Shinya Sonoda, Souichi Matsushita, Minoru Inada
  • Patent number: 5985810
    Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and l is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: November 16, 1999
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
  • Patent number: 5977040
    Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and 1 is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: November 2, 1999
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
  • Patent number: 5888312
    Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: March 30, 1999
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
  • Patent number: 5833761
    Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: November 10, 1998
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
  • Patent number: 5823210
    Abstract: A part subjected to cleaning is cleaned or rinsed with a cleaning agent or rinsing agent having a nonaqueous type solvent or a hydrophilic solvent as a main component thereof. Then the cleaning agent or rinsing agent adhering to the cleaned or rinsed part subjected to cleaning is removed with a cleaning agent having perfluorocarbon as a main component thereof or the vapor of the cleaning agent. The part is subsequently dried. Otherwise, after the part subjected to cleaning has been cleaned with an aqueous type solvent or wash with water, the part is cleaned and dried with a cleaning agent having perfluorocarbon as a main component thereof or the vapor of the cleaning agent. The cleaning agent having perfluorocarbon as a main component thereof or the vapor of the cleaning agent can be used for cleaning or rinsing the part subjected to cleaning.
    Type: Grant
    Filed: May 31, 1995
    Date of Patent: October 20, 1998
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Minoru Inada, Yasutaka Imajo, Masahide Uchino
  • Patent number: 5782983
    Abstract: A part still wet with water or an aqueous type detergent adhering to the surface thereof is drain washed in a washing tank using a hydrophobic dewatering cleaning agent. In this operation of dewatering cleaning, the hydrophobic dewatering cleaning agent stored in the washing tank is circulated between the washing tank and a reserve tank to deprive the hydrophobic dewatering cleaning agent of water entrained thereby by means of a concentration type filter inserted in a path laid for the circulation. A hydrophobic filter is mainly used as the concentration type filter. The dewatering cleaning is continued and meanwhile the consequently isolated hydrophobic dewatering cleaning agent is exclusively returned to the washing tank. As a result, the water concentration in the hydrophobic dewatering cleaning agent stored in the washing tank can be constantly kept below a prescribed level.
    Type: Grant
    Filed: April 19, 1994
    Date of Patent: July 21, 1998
    Assignees: Kabushiki Kaisha Toshiba, Toshiba Silicone Co., Ltd.
    Inventors: Minoru Inada, Yasutaka Imajo, Kimiaki Kabuki, Nobuhiro Saitoh
  • Patent number: 5772781
    Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: June 30, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
  • Patent number: 5769962
    Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: June 23, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh