Patents by Inventor Minoru Inada
Minoru Inada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9435913Abstract: An interlayer film for laminated glass that suppresses the transmittance of ultraviolet rays with a wave length of 400 nm to 1% or less, and has high light resistance. The interlayer film for laminated glass comprises a thermoplastic resin, an ultraviolet absorber having a structure of formula (1), and an ultraviolet absorber having a structure of formula (2), wherein the amount of the ultraviolet absorber of formula (1) is 0.001 to 0.05% by weight, and the amount of the ultraviolet absorber of formula (2) is 0.5 to 1.0% by weight; wherein R1 is a C1-3 alkyl group; R2 is hydrogen, a C1-10 alkyl group, or a C7-10 aralkyl group; R3 is hydrogen or a C1-8 alkyl group; and R4 is hydrogen or a C1-8 alkyl group.Type: GrantFiled: August 19, 2011Date of Patent: September 6, 2016Assignees: SEKISUI CHEMICAL CO., LTD., ASAHI GLASS COMPANY, LIMITEDInventors: Bungo Hatta, Kazuhiko Nakayama, Minoru Inada, Yuji Masaki, Jun Hikata
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Publication number: 20130194659Abstract: The present invention aims to provide an interlayer film for laminated glass which can suppress the transmittance of ultraviolet rays with a wave length of 400 nm to 1% or less, and has high light resistance; and laminated glass including the interlayer film for laminated glass. The present invention provides an interlayer film for laminated glass including a thermoplastic resin, an ultraviolet absorber having a structure represented by the following formula (1), and an ultraviolet absorber having a structure represented by the following formula (2), wherein the amount of the ultraviolet absorber having a structure represented by the following formula (1) is 0.001 to 0.05% by weight, and the amount of the ultraviolet absorber having a structure represented by the following formula (2) is 0.4 to 1.5% by weight. In the formula (1), R1 represents a C1 to C3 alkyl group, and R2 represents hydrogen, a C1 to C10 alkyl group, or a C7 to C10 aralkyl group.Type: ApplicationFiled: August 19, 2011Publication date: August 1, 2013Inventors: Bungo Hatta, Kazuhiko Nakayama, Minoru Inada, Yuji Masaki, Jun Hikata
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Patent number: 8361625Abstract: An interlayer film for a laminated glass which reduces transmittance of ultraviolet rays having wavelength of 380 to 400 nm and has an excellent durability to light exposure, while maintaining high visible light transmittance. The interlayer film for a laminated glass comprises a thermoplastic resin and an indole compound having a structure represented by the following chemical formula 1: Wherein R1 represents an alkyl group having 1-3 carbon atoms, and R2 represents hydrogen, an alkyl group having 1-10 carbon atoms, or an aralkyl group having 7-10 carbon atoms.Type: GrantFiled: January 22, 2009Date of Patent: January 29, 2013Assignees: Sekisui Chemical Co., Ltd., Orient Chemical Industries, Ltd., Asahi Glass Company, LimitedInventors: Bungo Hatta, Hirofumi Kitano, Minoru Inada, Jun Hikata
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Patent number: 8304082Abstract: The present invention has its object to provide an interlayer film for a laminated glass, which is excellent in penetration resistance, moisture resistance, and sound insulation. The present invention relates to an interlayer film for a laminated glass, which comprises: a polyvinyl acetal resin; and a plasticizer, the plasticizer being represented by formula (1): wherein R1 represents a phenyl group, R2 represents an alkylene group having 2 to 4 carbon atoms, and n represents 4 to 6.Type: GrantFiled: July 16, 2009Date of Patent: November 6, 2012Assignee: Sekisui Chemical Co., Ltd.Inventors: Bungo Hatta, Takahiro Futamura, Minoru Inada, Hirofumi Kitano
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Publication number: 20110151269Abstract: The present invention has its object to provide an interlayer film for a laminated glass, which is excellent in penetration resistance, moisture resistance, and sound insulation. The present invention relates to an interlayer film for a laminated glass, which comprises: a polyvinyl acetal resin; and a plasticizer, the plasticizer being represented by formula (1): wherein R1 represents a phenyl group, R2 represents an alkylene group having 2 to 4 carbon atoms, and n represents 4 to 6.Type: ApplicationFiled: July 16, 2009Publication date: June 23, 2011Inventors: Bungo Hatta, Takahiro Futamura, Minoru Inada, Hirofumi Kitano
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Publication number: 20100279150Abstract: It is an object of the present invention to provide an interlayer film for a laminated glass which can reduce transmittance of ultraviolet rays having wavelength of 380 to 400 nm and has excellent durability to light exposure while maintaining high visible light transmittance. The interlayer film for a laminated glass of the present invention is an interlayer film for a laminated glass, which comprises a thermoplastic resin and an indole compound having a structure represented by the following general Chemical Formula (1): wherein R1 represents an alkyl group having 1 to 3 of carbon atoms, and R2 represents hydrogen, an alkyl group having 1 to 10 of carbon atoms, or an aralkyl group having 7 to 10 of carbon atoms.Type: ApplicationFiled: January 22, 2009Publication date: November 4, 2010Applicants: Sekisui Chemical Co., Ltd., Orient Chemical Industries, Ltd.Inventors: Bungo Hatta, Hirofumi Kitano, Minoru Inada, Jun Hikata
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Patent number: 6694050Abstract: To reliably and simply prevent the output of specified image data, a unit to detect a pattern is installed in one of the devices in a system consisting of an image scanner 1, control device 2 (a personal computer) and printer 3 which are connected consecutively. This pattern detection unit contains a unit which detects a specified pattern from the mass of image data representing a document. Once this pattern has been found, either the subsequent image data are altered before being output or output of the image data is interrupted. When the system starts up, the control unit for each device checks whether that device, or one of the other devices in the system, has a pattern detection unit as described above. If it determines that no device has such a unit, it halts operation.Type: GrantFiled: March 22, 2001Date of Patent: February 17, 2004Assignee: Omron CorporationInventors: Junji Hiraishi, Tetsuya Miwa, Hitoshi Nakamura, Kiyoshi Imai, Kouichi Ohmae, Shinya Sonoda, Souichi Matsushita, Minoru Inada
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Patent number: 6384185Abstract: A process for purifying a polycarbonate resin solution which comprises passing a water-in-oil dispersion type (W/O) emulsion composed of a mixture of an organic solvent solution containing a polycarbonate resin with a aqueous solution and having water particles with an average diameter of 1 to 100 &mgr;m in an oil through a metallic filter having a filtering precision of 10 to 200 &mgr;m, and then, settling the mixture for 1 to 30 minutes to perform separation between the organic solvent solution containing a polycarbonate resin and the aqueous solution containing contaminations.Type: GrantFiled: January 5, 2000Date of Patent: May 7, 2002Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Minoru Inada, Tatsuhide Hosomi, Toshiaki Asoh, Makoto Mizutani
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Publication number: 20010009591Abstract: To reliably and simply prevent the output of specified image data, a unit to detect a pattern is installed in one of the devices in a system consisting of an image scanner 1, control device 2 (a personal computer) and printer 3 which are connected consecutively. This pattern detection unit contains a unit which detects a specified pattern from the mass of image data representing a document. Once this pattern has been found, either the subsequent image data are altered before being output or output of the image data is interrupted. When the system starts up, the control unit for each device checks whether that device, or one of the other devices in the system, has a pattern detection unit as described above. If it determines that no device has such a unit, it halts operation.Type: ApplicationFiled: March 22, 2001Publication date: July 26, 2001Inventors: Junji Hiraishi, Tetsuya Miwa, Hitoshi Nakamura, Kiyoshi Imai, Kouichi Ohmae, Shinya Sonoda, Souichi Matsushita, Minoru Inada
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Patent number: 6229914Abstract: To reliably and simply prevent the output of specified image data, a unit to detect a pattern is installed in one of the devices in a system consisting of an image scanner 1, control device 2 (a personal computer) and printer 3 which are connected consecutively. This pattern detection unit contains a unit which detects a specified pattern from the mass of image data representing a document. Once this pattern has been found, either the subsequent image data are altered before being output or output of the image data is interrupted. When the system starts up, the control unit for each device checks whether that device, or one of the other devices in the system, has a pattern detection unit as described above. If it determines that no device has such a unit, it halts operation.Type: GrantFiled: March 6, 2000Date of Patent: May 8, 2001Assignee: Omron CorporationInventors: Junji Hiraishi, Tetsuya Miwa, Hitoshi Nakamura, Kiyoshi Imai, Kouichi Ohmae, Shinya Sonoda, Souichi Matsushita, Minoru Inada
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Patent number: 6136766Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and l is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.Type: GrantFiled: June 7, 1995Date of Patent: October 24, 2000Assignee: Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
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Patent number: 6052479Abstract: To reliably and simply prevent the output of specified image data, a unit to detect a pattern is installed in one of the devices in a system consisting of an image scanner 1, control device 2 (a personal computer) and printer 3 which are connected consecutively. This pattern detection unit contains a unit which detects a specified pattern from the mass of image data representing a document. Once this pattern has been found, either the subsequent image data are altered before being output or output of the image data is interrupted. When the system starts up, the control unit for each device checks whether that device, or one of the other devices in the system, has a pattern detection unit as described above. If it determines that no device has such a unit, it halts operation.Type: GrantFiled: July 1, 1996Date of Patent: April 18, 2000Assignee: Omron CorporationInventors: Junji Hiraishi, Tetsuya Miwa, Hitoshi Nakamura, Kiyoshi Imai, Kouichi Ohmae, Shinya Sonoda, Souichi Matsushita, Minoru Inada
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Patent number: 5985810Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and l is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.Type: GrantFiled: June 7, 1995Date of Patent: November 16, 1999Assignee: Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
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Patent number: 5977040Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and 1 is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.Type: GrantFiled: June 7, 1995Date of Patent: November 2, 1999Assignee: Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
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Patent number: 5888312Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.Type: GrantFiled: June 7, 1995Date of Patent: March 30, 1999Assignee: Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
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Patent number: 5833761Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.Type: GrantFiled: June 7, 1995Date of Patent: November 10, 1998Assignee: Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
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Patent number: 5823210Abstract: A part subjected to cleaning is cleaned or rinsed with a cleaning agent or rinsing agent having a nonaqueous type solvent or a hydrophilic solvent as a main component thereof. Then the cleaning agent or rinsing agent adhering to the cleaned or rinsed part subjected to cleaning is removed with a cleaning agent having perfluorocarbon as a main component thereof or the vapor of the cleaning agent. The part is subsequently dried. Otherwise, after the part subjected to cleaning has been cleaned with an aqueous type solvent or wash with water, the part is cleaned and dried with a cleaning agent having perfluorocarbon as a main component thereof or the vapor of the cleaning agent. The cleaning agent having perfluorocarbon as a main component thereof or the vapor of the cleaning agent can be used for cleaning or rinsing the part subjected to cleaning.Type: GrantFiled: May 31, 1995Date of Patent: October 20, 1998Assignee: Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Yasutaka Imajo, Masahide Uchino
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Patent number: 5782983Abstract: A part still wet with water or an aqueous type detergent adhering to the surface thereof is drain washed in a washing tank using a hydrophobic dewatering cleaning agent. In this operation of dewatering cleaning, the hydrophobic dewatering cleaning agent stored in the washing tank is circulated between the washing tank and a reserve tank to deprive the hydrophobic dewatering cleaning agent of water entrained thereby by means of a concentration type filter inserted in a path laid for the circulation. A hydrophobic filter is mainly used as the concentration type filter. The dewatering cleaning is continued and meanwhile the consequently isolated hydrophobic dewatering cleaning agent is exclusively returned to the washing tank. As a result, the water concentration in the hydrophobic dewatering cleaning agent stored in the washing tank can be constantly kept below a prescribed level.Type: GrantFiled: April 19, 1994Date of Patent: July 21, 1998Assignees: Kabushiki Kaisha Toshiba, Toshiba Silicone Co., Ltd.Inventors: Minoru Inada, Yasutaka Imajo, Kimiaki Kabuki, Nobuhiro Saitoh
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Patent number: 5772781Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.Type: GrantFiled: June 7, 1995Date of Patent: June 30, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
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Patent number: 5769962Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.Type: GrantFiled: June 7, 1995Date of Patent: June 23, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh