Patents by Inventor Minoru Inoue

Minoru Inoue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10775324
    Abstract: Provided is a sample holder for an X-ray fluorescence spectrometer, which enables measurement of a liquid sample that is in a small amount and cannot be dropped and dried, when the measurement is performed with a tube-above optics X-ray fluorescence spectrometer. The sample holder for an X-ray fluorescence spectrometer includes: a first substrate including: a support substrate having a hole in which a liquid sample is placed; a first polymer film, which is bonded to a surface of the support substrate on an X-ray incident side so as to cover the hole; and an adhesive layer, which is provided on a back surface of the surface of the support substrate to which the first polymer film is bonded; and a second substrate including: a fixed substrate having a hole at a position corresponding to the hole of the support substrate; and a second polymer film, which is bonded to a surface of the fixed substrate on the X-ray incident side, the second substrate being bonded to the first substrate with the adhesive layer.
    Type: Grant
    Filed: March 9, 2018
    Date of Patent: September 15, 2020
    Assignee: RIGAKU CORPORATION
    Inventors: Wataru Matsuda, Minoru Inoue
  • Publication number: 20200165497
    Abstract: Provided is a double-sided adhesive tape or sheet which is light-weight and has excellent strength and insulating properties even when the thickness of the tape or sheet is small. This double-sided adhesive tape or sheet comprises a laminate including a support and two adhesive agent layers formed on opposite surfaces of the support, wherein the support contains a polypropylene resin, the adhesive agent layers contain an acrylic polymer, the laminate has a total thickness (Ds) of 4-15 ?m, the value of the ratio Dp/Ds of the thickness (Dp) of the support to the total thickness (Ds) of the laminate is 0.15-0.6, and the laminate has a density of 0.90-1.10 g/cm3.
    Type: Application
    Filed: July 13, 2018
    Publication date: May 28, 2020
    Inventors: Kazuo IKEDA, Masahiro NAKATA, Minoru INOUE, Takamichi YAMAGUCHI, Tohru MURAI, Kenji YANAGISAWA
  • Publication number: 20190346384
    Abstract: Provided is a sample holder for an X-ray fluorescence spectrometer, which enables measurement of a liquid sample that is in a small amount and cannot be dropped and dried, when the measurement is performed with a tube-above optics X-ray fluorescence spectrometer. The sample holder for an X-ray fluorescence spectrometer includes: a first substrate including: a support substrate having a hole in which a liquid sample is placed; a first polymer film, which is bonded to a surface of the support substrate on an X-ray incident side so as to cover the hole; and an adhesive layer, which is provided on a back surface of the surface of the support substrate to which the first polymer film is bonded; and a second substrate including: a fixed substrate having a hole at a position corresponding to the hole of the support substrate; and a second polymer film, which is bonded to a surface of the fixed substrate on the X-ray incident side, the second substrate being bonded to the first substrate with the adhesive layer.
    Type: Application
    Filed: March 9, 2018
    Publication date: November 14, 2019
    Inventors: Wataru Matsuda, Minoru Inoue
  • Patent number: 9963787
    Abstract: The pretreatment agent for use before forming a coat by paint application of the present invention contains (A) one or more metal elements selected from a group consisting of zirconium, titanium and hafnium, (B) fluorine, (C) one or more coupling agents selected from an amino group-containing silane coupling agent, its hydrolyzate, and its polymer, and (D) a component of at least one of an allylamine and a polyallylamine, in which the ratio by mass of the coupling agent (C) to the component (D), (C/D) is 1 or more. The coating method by paint application of the present invention includes a chemical conversion treatment step of chemically treating a metal substrate with the pretreatment agent, and a step of forming a coat by paint application on the chemically-treated metal substrate.
    Type: Grant
    Filed: October 12, 2012
    Date of Patent: May 8, 2018
    Assignee: Chemetall GmbH
    Inventors: Teruzo Toi, Minoru Inoue
  • Patent number: 9906331
    Abstract: A communication method executed by an information processing apparatus capable of transmitting data of a plurality of sessions to another information processing apparatus, the method includes: acquiring from the another information processing apparatus processing time information according to a time taken for processing a first data received by the another information processing apparatus; calculating an upper limit value of an amount of data per unit time permitted to each of the plurality of sessions for transmission using the processing time information; and limiting the amount of data for each of the plurality of sessions based on the upper limit value calculated at the calculating upon transmitting a second data including data of one or more sessions to the another information processing apparatus.
    Type: Grant
    Filed: December 23, 2013
    Date of Patent: February 27, 2018
    Assignee: FUJITSU LIMITED
    Inventors: Takahiro Takenaka, Minoru Inoue, Daisuke Fujita
  • Patent number: 9401775
    Abstract: A communication method executed by an information processing apparatus capable of transmitting data to another information processing apparatus, the method includes: setting a first threshold as an amount of data capable of being transmitted without waiting for a reply from the another information processing apparatus; transmitting a first data having a data amount less than or equal to the first threshold to the another information processing apparatus; acquiring from the another information processing apparatus processing time information taken to process the first data by the another information processing apparatus; and changing the first threshold concerning the data amount into a second threshold based on the processing time information.
    Type: Grant
    Filed: December 13, 2013
    Date of Patent: July 26, 2016
    Assignee: FUJITSU LIMITED
    Inventors: Minoru Inoue, Takahiro Takenaka, Daisuke Fujita
  • Patent number: 9307005
    Abstract: A communication control system includes a first computer and a second computer, wherein the first computer includes a communication interface device and a first processor configured to control the communication interface device to transmit first data and first feature information indicating a feature of the first data to the second computer, and the second computer includes a memory that has a storage area allocated to store second data received from the first computer, and a second processor configured to determine whether the first feature information received from the first computer matches second feature information, indicating a feature of and calculated based on the second data stored in the storage area, and control the memory to release the storage area when the second feature information does not match the received first feature information.
    Type: Grant
    Filed: March 22, 2013
    Date of Patent: April 5, 2016
    Assignee: FUJITSU LIMITED
    Inventors: Daisuke Fujita, Minoru Inoue, Kazuhiko Horiuchi, Takahiro Takenaka, Masayuki Kawashima, Naoyuki Kodama
  • Publication number: 20150176136
    Abstract: The pretreatment agent for use before forming a coat by paint application of the present invention contains (A) one or more metal elements selected from a group consisting of zirconium, titanium and hafnium, (B) fluorine, (C) one or more coupling agents selected from an amino group-containing silane coupling agent, its hydrolyzate, and its polymer, and (D) a component of at least one of an allylamine and a polyallylamine, in which the ratio by mass of the coupling agent (C) to the component (D), (C/D) is 1 or more. The coating method by paint application of the present invention includes a chemical conversion treatment step of chemically treating a metal substrate with the pretreatment agent, and a step of forming a coat by paint application on the chemically-treated metal substrate.
    Type: Application
    Filed: October 12, 2012
    Publication date: June 25, 2015
    Applicant: CHEMETALL GMBH
    Inventors: Teruzo Toi, Minoru Inoue
  • Patent number: 8775873
    Abstract: In a data processing apparatus, when an instruction for starting validation is provided, or when definition information is updated, data input from a data source is collected, and a process for narrowing down of the collected data is executed. In the data narrowing process, by extracting records and items as process targets according to the definition information that defines the operation of the apparatus, the number of data items used for validation is reduced. Then, the operation is validated using the narrowed data. In the operation validation process, a virtual transfer destination of output of data is provided within the apparatus, and the data is output to the virtual transfer destination, for comparison with the output data, whereby the validation of the operation is performed.
    Type: Grant
    Filed: January 5, 2012
    Date of Patent: July 8, 2014
    Assignee: Fujitsu Limited
    Inventors: Masao Tomofuji, Shigeo Yoshikawa, Minoru Inoue
  • Publication number: 20140189105
    Abstract: A communication method executed by an information processing apparatus capable of transmitting data of a plurality of sessions to another information processing apparatus, the method includes: acquiring from the another information processing apparatus processing time information according to a time taken for processing a first data received by the another information processing apparatus; calculating an upper limit value of an amount of data per unit time permitted to each of the plurality of sessions for transmission using the processing time information; and limiting the amount of data for each of the plurality of sessions based on the upper limit value calculated at the calculating upon transmitting a second data including data of one or more sessions to the another information processing apparatus.
    Type: Application
    Filed: December 23, 2013
    Publication date: July 3, 2014
    Applicant: FUJITSU LIMITED
    Inventors: Takahiro Takenaka, Minoru Inoue, Daisuke Fujita
  • Publication number: 20140185444
    Abstract: A communication method executed by an information processing apparatus capable of transmitting data to another information processing apparatus, the method includes: setting a first threshold as an amount of data capable of being transmitted without waiting for a reply from the another information processing apparatus; transmitting a first data having a data amount less than or equal to the first threshold to the another information processing apparatus; acquiring from the another information processing apparatus processing time information taken to process the first data by the another information processing apparatus; and changing the first threshold concerning the data amount into a second threshold based on the processing time information.
    Type: Application
    Filed: December 13, 2013
    Publication date: July 3, 2014
    Applicant: FUJITSU LIMITED
    Inventors: Minoru INOUE, Takahiro Takenaka, Daisuke Fujita
  • Publication number: 20130282816
    Abstract: A communication control system includes a first computer and a second computer, wherein the first computer includes a communication interface device and a first processor configured to control the communication interface device to transmit first data and first feature information indicating a feature of the first data to the second computer, and the second computer includes a memory that has a storage area allocated to store second data received from the first computer, and a second processor configured to determine whether the first feature information received from the first computer matches second feature information, indicating a feature of and calculated based on the second data stored in the storage area, and control the memory to release the storage area when the second feature information does not match the received first feature information.
    Type: Application
    Filed: March 22, 2013
    Publication date: October 24, 2013
    Applicant: Fujitsu Limited
    Inventors: Daisuke FUJITA, Minoru Inoue, Kazuhiko Horiuchi, Takahiro Takenaka, Masayuki Kawashima, Naoyuki Kodama
  • Patent number: 8497391
    Abstract: An insulating film material for plasma CVD represented by a chemical formula (1) shown below, a method of film formation using the insulating film material, and an insulating film. According to the present invention, an insulating film having a low dielectric constant and a superior copper diffusion barrier property suitable for an interlayer insulating film or the like of a semiconductor device can be obtained. In the chemical formula (1), n represents an integer of 3 to 6, and each of R1 and R2 independently represents one of C2H, C2H3, C3H3, C3H5, C3H7, C4H5, C4H7, C4H9, C5H7, C5H9 and C5H11.
    Type: Grant
    Filed: January 20, 2009
    Date of Patent: July 30, 2013
    Assignees: National Institute for Materials Science, Taiyo Nippon Sanso Corporation
    Inventors: Takahisa Ohno, Nobuo Tajima, Satoshi Hasaka, Minoru Inoue, Kaoru Sakoda, Yoshiaki Inaishi, Manabu Shinriki, Kazuhiro Miyazawa
  • Patent number: 8481434
    Abstract: To remove the deposit including a high dielectric constant film deposited on an inside of a processing chamber, by using a cleaning gas activated only by heat. The method includes the steps of: loading a substrate or a plurality of substrates into the processing chamber; performing processing to deposit the high dielectric constant film on the substrate by supplying processing gas into the processing chamber; unloading the processed substrate from the inside of the processing chamber; and cleaning the inside of the processing chamber by supplying a halide gas and an oxygen based gas into the processing chamber, and removing the deposit including the high dielectric constant film deposited on the inside of the processing chamber, and in the step of cleaning the inside of the processing chamber, the concentration of the oxygen based gas in the halide gas and the oxygen based gas is set to be less than 7%.
    Type: Grant
    Filed: July 8, 2008
    Date of Patent: July 9, 2013
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Hironobu Miya, Eisuke Nishitani, Yuji Takebayashi, Masanori Sakai, Hirohisa Yamazaki, Toshinori Shibata, Minoru Inoue
  • Publication number: 20120192011
    Abstract: In a data processing apparatus, when an instruction for starting validation is provided, or when definition information is updated, data input from a data source is collected, and a process for narrowing down of the collected data is executed. In the data narrowing process, by extracting records and items as process targets according to the definition information that defines the operation of the apparatus, the number of data items used for validation is reduced. Then, the operation is validated using the narrowed data. In the operation validation process, a virtual transfer destination of output of data is provided within the apparatus, and the data is output to the virtual transfer destination, for comparison with the output data, whereby the validation of the operation is performed.
    Type: Application
    Filed: January 5, 2012
    Publication date: July 26, 2012
    Applicant: FUJITSU LIMITED
    Inventors: Masao TOMOFUJI, Shigeo YOSHIKAWA, Minoru INOUE
  • Patent number: 8088686
    Abstract: The present invention provides a method of remedying deterioration of an insulating film which, during the remedial treatment of an insulating film deteriorated by plasma treatment, does not leave residual remedial agent on the wiring material such as the copper wiring layer, can be conducted using a dry process, and exhibits excellent applicability to mass production. The insulating film that has been deteriorated by plasma treatment is brought into contact with a remedial agent composed of a compound with a molecular structure having at least one of a nitro group and a carbonyl group, and at least one of a hydrocarbon group and a hydrogen group.
    Type: Grant
    Filed: April 18, 2007
    Date of Patent: January 3, 2012
    Assignee: Taiyo Nippon Sanso Corporation
    Inventors: Shuji Nagano, Satoshi Hasaka, Minoru Inoue, Toshinori Shibata
  • Publication number: 20110130584
    Abstract: An insulating film material for plasma CVD represented by a chemical formula (1) shown below, a method of film formation using the insulating film material, and an insulating film. According to the present invention, an insulating film having a low dielectric constant and a superior copper diffusion barrier property suitable for an interlayer insulating film or the like of a semiconductor device can be obtained. In the chemical formula (1), n represents an integer of 3 to 6, and each of R1 and R2 independently represents one of C2H, C2H3, C3H3, C3H5, C3H7, C4H5, C4H7, C4H9, C5H7, C5H9 and C5H11.
    Type: Application
    Filed: January 20, 2009
    Publication date: June 2, 2011
    Inventors: Takahisa Ohno, Nobuo Tajima, Satoshi Hasaka, Minoru Inoue, Kaoru Sakoda, Yoshiaki Inaishi, Manabu Shinriki, Kazuhiro Miyazawa
  • Patent number: 7703805
    Abstract: A bridge-shaped frame member is disposed on a front side frame in front of a suspension tower so as to extend vertically and stride over a No. 4 mount. Accordingly, there can be provided a vehicle front body structure that can attain a proper energy absorption of the front side frame with its axial compression can be attained at a vehicle crash.
    Type: Grant
    Filed: February 22, 2007
    Date of Patent: April 27, 2010
    Assignee: Mazda Motor Corporation
    Inventors: Shin Sasaki, Minoru Inoue, Takahiro Aonuma, Hiroaki Fujii
  • Publication number: 20090130860
    Abstract: To remove the deposit including a high dielectric constant film deposited on an inside of a processing chamber, by using a cleaning gas activated only by heat. The method includes the steps of: loading a substrate or a plurality of substrates into the processing chamber; performing processing to deposit the high dielectric constant film on the substrate by supplying processing gas into the processing chamber; unloading the processed substrate from the inside of the processing chamber; and cleaning the inside of the processing chamber by supplying a halide gas and an oxygen based gas into the processing chamber, and removing the deposit including the high dielectric constant film deposited on the inside of the processing chamber, and in the step of cleaning the inside of the processing chamber, the concentration of the oxygen based gas in the halide gas and the oxygen based gas is set to be less than 7%.
    Type: Application
    Filed: July 8, 2008
    Publication date: May 21, 2009
    Applicants: HITACHI KOKUSAI ELECTRIC INC., TAIYO NIPPON SANSO CORPORATION
    Inventors: Hironobu Miya, Eisuke Nishitani, Yuji Takebayashi, Masanori Sakai, Hirohisa Yamazaki, Toshinori Shibata, Minoru Inoue
  • Publication number: 20090099384
    Abstract: The present invention provides a method of remedying deterioration of an insulating film which, during the remedial treatment of an insulating film deteriorated by plasma treatment, does not leave residual remedial agent on the wiring material such as the copper wiring layer, can be conducted using a dry process, and exhibits excellent applicability to mass production. The insulating film that has been deteriorated by plasma treatment is brought into contact with a remedial agent composed of a compound with a molecular structure having at least one of a nitro group and a carbonyl group, and at least one of a hydrocarbon group and a hydrogen group.
    Type: Application
    Filed: April 18, 2007
    Publication date: April 16, 2009
    Inventors: Shuji Nagano, Satoshi Hasaka, Minoru Inoue, Toshinori Shibata