Patents by Inventor Minoru Mitsui
Minoru Mitsui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240128511Abstract: A nonaqueous electrolyte solution including at least an electrolyte, and a nonaqueous solvent, wherein the nonaqueous electrolyte solution contains a compound represented by the following general formula (A): wherein R1 to R3 represent optionally substituted organic groups having 1 to 20 carbon atoms, and a cyclic carbonate compound having a fluorine atom in an amount of 0.01% by mass to 50.Type: ApplicationFiled: December 27, 2023Publication date: April 18, 2024Applicants: Mitsubishi Chemical Corporation, MU IONIC SOLUTIONS CORPORATIONInventors: Eiji NAKAZAWA, Yoichi OOHASHI, Minoru KOTATO, Takamichi MITSUI, Takayuki AOSHIMA, Takeshi NAKAMURA
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Patent number: 11942601Abstract: A nonaqueous electrolyte solution, which contains a compound represented by the following general formula (A), and (1) at least one compound selected from the group consisting of a nitrile compound, an isocyanate compound, a difluorophosphate, a fluorosulfonate, a lithium bis(fluorosulfonyl)imide and a compound represented by the following general formula (B), or (2) a cyclic carbonate compound having a fluorine atom in an amount of 0.01% by mass to 50.0% by mass based on the total amount of the nonaqueous electrolyte solution. (In formula (A), R1 to R3 may be mutually the same or different and represent optionally substituted organic groups having 1 to 20 carbon atoms.) (In formula (B), R4, R5 and R6 respectively and independently represent an alkyl group, alkenyl group or alkynyl group having 1 to 12 carbon atoms that may be substituted with a halogen atom, and n represents an integer of 0 to 6.Type: GrantFiled: June 14, 2022Date of Patent: March 26, 2024Assignees: Mitsubishi Chemical Corporation, MU IONIC SOLUTIONS CORPORATIONInventors: Eiji Nakazawa, Yoichi Oohashi, Minoru Kotato, Takamichi Mitsui, Takayuki Aoshima, Takeshi Nakamura
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Patent number: 11064941Abstract: An information processing apparatus includes a calculation unit, a designing unit, and a presentation unit. The calculation unit calculates autonomic activity of a participant, using biometric information measured by a measuring device that measures biometric information of the participant belonging to a group place. The designing unit designs a progress plan of communication at the group place in a design aspect corresponding to the calculated activity. The presentation unit presents the designed progress plan.Type: GrantFiled: June 4, 2018Date of Patent: July 20, 2021Assignee: FUJIFILM Business Innovation Corp.Inventors: Akinori Komura, Katsunori Kawano, Minoru Mitsui
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Patent number: 10735534Abstract: An information processing apparatus includes a specifying unit that specifies an activity degree of each of a plural participants based on biometric information obtained from a living body of each of the plural participants participating in a gathering, an evaluation unit that evaluates each of the plural participants based on the specified activity degree, a selection unit that selects one or more of the plural participants based on an evaluation of the evaluation unit, and a requesting unit that requires an opinion on the gathering from the selected participant.Type: GrantFiled: May 31, 2018Date of Patent: August 4, 2020Assignee: FUJI XEROX CO., LTD.Inventors: Ryoji Horita, Katsunori Kawano, Akinori Komura, Minoru Mitsui
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Publication number: 20190173683Abstract: An information processing apparatus includes a determining unit that determines an activity level of an attendee attending a meeting in accordance with an analysis based on biological information acquired from a body of the attendee, an instructing unit that provides instructions on a mode in which the attendee is to be represented in accordance with the activity level, a generating unit that generates information concerning the attendee represented in the mode, and a transmitter that transmits the generated information concerning the attendee.Type: ApplicationFiled: September 10, 2018Publication date: June 6, 2019Applicant: FUJI XEROX CO., LTD.Inventors: Minoru MITSUI, Katsunori KAWANO, Akinori KOMURA, Ryoji HORITA
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Publication number: 20190173967Abstract: An information processing apparatus includes a specifying unit that specifies an activity degree of each of a plural participants based on biometric information obtained from a living body of each of the plural participants participating in a gathering, an evaluation unit that evaluates each of the plural participants based on the specified activity degree, a selection unit that selects one or more of the plural participants based on an evaluation of the evaluation unit, and a requesting unit that requires an opinion on the gathering from the selected participant.Type: ApplicationFiled: May 31, 2018Publication date: June 6, 2019Applicant: FUJI XEROX CO., LTD.Inventors: Ryoji HORITA, Katsunori KAWANO, Akinori KOMURA, Minoru MITSUI
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Publication number: 20190167185Abstract: An information processing apparatus includes a calculation unit, a designing unit, and a presentation unit. The calculation unit calculates autonomic activity of a participant, using biometric information measured by a measuring device that measures biometric information of the participant belonging to a group place. The designing unit designs a progress plan of communication at the group place in a design aspect corresponding to the calculated activity. The presentation unit presents the designed progress plan.Type: ApplicationFiled: June 4, 2018Publication date: June 6, 2019Applicant: FUJI XEROX CO.,LTD.Inventors: Akinori KOMURA, Katsunori KAWANO, Minoru MITSUI
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Patent number: 9459103Abstract: A non-transitory computer readable medium stores a movement situation determining program for causing a computer to function as a two-axial direction correlation value calculating portion that calculates a correlation value indicating a relationship between motions in two axial directions of a plurality of axial directions on the basis of information obtained by detecting motions of a moving target in the plurality of axial directions, and a movement situation determining portion that determines a movement situation of the moving target on the basis of the correlation value.Type: GrantFiled: July 3, 2012Date of Patent: October 4, 2016Assignee: FUJI XEROX CO., LTD.Inventors: Masahiro Sato, Takayuki Takeuchi, Kyotaro Tomoda, Minoru Mitsui, Tsutomu Ishii, Shigehiko Sasaki, Akira Ichiboshi, Takao Naito
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Patent number: 9092083Abstract: A contact detecting device includes a plurality of detecting elements, a generating unit, and a determining unit. The plurality of detecting elements are related to one another in a two-dimensional configuration on a predetermined contacted surface, and respectively detect a contact of an object with the contacted surface. The generating unit generates, on the basis of the result of detection by the plurality of detecting elements, feature information representing a feature of a trajectory drawn on the basis of a contact of an object with the contacted surface. The determining unit determines whether or not the feature information generated by the generating unit corresponds to previously registered specific contact feature information representing a feature of a trajectory drawn on the basis of a specific contact of an object with the contacted surface.Type: GrantFiled: April 27, 2012Date of Patent: July 28, 2015Assignee: FUJI XEROX CO., LTD.Inventors: Akira Ichiboshi, Tsutomu Ishii, Takayuki Takeuchi, Shigehiko Sasaki, Masahiro Sato, Kyotaro Tomoda, Takao Naito, Minoru Mitsui
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Patent number: 9018738Abstract: A silicon layer transfer substrate includes a silicon substrate of a first substrate, a sacrificial layer, and a transfer silicon layer transferred to a second substrate, wherein the sacrificial layer has a silicon compound layer containing a compound of silicon and at least one element selected from a group consisting of germanium and carbon, and is provided on the silicon substrate of the first substrate, the silicon compound layer having a thickness equal to or smaller than a critical film thickness, the transfer silicon layer transferred to the second substrate is provided on the sacrificial layer, and at least either the silicon substrate or the silicon layer has a groove or a hole connected to the sacrificial layer.Type: GrantFiled: February 3, 2012Date of Patent: April 28, 2015Assignee: Fuji Xerox Co., Ltd.Inventor: Minoru Mitsui
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Publication number: 20130253878Abstract: A non-transitory computer readable medium stores a movement situation determining program for causing a computer to function as a two-axial direction correlation value calculating portion that calculates a correlation value indicating a relationship between motions in two axial directions of a plurality of axial directions on the basis of information obtained by detecting motions of a moving target in the plurality of axial directions, and a movement situation determining portion that determines a movement situation of the moving target on the basis of the correlation value.Type: ApplicationFiled: July 3, 2012Publication date: September 26, 2013Applicant: FUJI XEROX CO., LTD.Inventors: Masahiro SATO, Takayuki TAKEUCHI, Kyotaro TOMODA, Minoru MITSUI, Tsutomu ISHII, Shigehiko SASAKI, Akira ICHIBOSHI, Takao NAITO
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Publication number: 20130093698Abstract: A contact detecting device includes a plurality of detecting elements, a generating unit, and a determining unit. The plurality of detecting elements are related to one another in a two-dimensional configuration on a predetermined contacted surface, and respectively detect a contact of an object with the contacted surface. The generating unit generates, on the basis of the result of detection by the plurality of detecting elements, feature information representing a feature of a trajectory drawn on the basis of a contact of an object with the contacted surface. The determining unit determines whether or not the feature information generated by the generating unit corresponds to previously registered specific contact feature information representing a feature of a trajectory drawn on the basis of a specific contact of an object with the contacted surface.Type: ApplicationFiled: April 27, 2012Publication date: April 18, 2013Applicant: FUJI XEROX CO., LTD.Inventors: Akira ICHIBOSHI, Tsutomu ISHII, Takayuki TAKEUCHI, Shigehiko SASAKI, Masahiro SATO, Kyotaro TOMODA, Takao NAITO, Minoru MITSUI
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Publication number: 20120238071Abstract: A silicon layer transfer substrate includes a silicon substrate of a first substrate, a sacrificial layer, and a transfer silicon layer transferred to a second substrate, wherein the sacrificial layer has a silicon compound layer containing a compound of silicon and at least one element selected from a group consisting of germanium and carbon, and is provided on the silicon substrate of the first substrate, the silicon compound layer having a thickness equal to or smaller than a critical film thickness, the transfer silicon layer transferred to the second substrate is provided on the sacrificial layer, and at least either the silicon substrate or the silicon layer has a groove or a hole connected to the sacrificial layer.Type: ApplicationFiled: February 3, 2012Publication date: September 20, 2012Applicant: FUJI XEROX CO., LTD.Inventor: Minoru MITSUI
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Publication number: 20080135890Abstract: Disclosed is a manufacturing method for forming a FET on a glass substrate at low temperatures. A polycrystalline silicon layer 2 is formed on a glass substrate 1, germanium layers 11, 12 are formed on the polycrystalline silicon layer in regions that are to become a source and a drain, ions serving as a dopant are implanted into at least the germanium layers, and annealing is subsequently applied to thereby cause the implanted dopant to diffuse into the polycrystalline. silicon layer, form a source region S and a drain region D and crystallize the germanium layers. Alternatively, the dopant is implanted also into the polycrystalline silicon layer at such a dosage that will not cause the polycrystalline silicon layer to become amorphous. Annealing for crystallizing the germanium is subsequently carried out. Annealing may be performed in the neighborhood of 500° C.Type: ApplicationFiled: May 31, 2005Publication date: June 12, 2008Applicant: YAMANASHI TLO CO., LTD.Inventors: Kiyokazu Nakagawa, Keisuke Arimoto, Minoru Mitsui