Patents by Inventor Minoru Ohtsuka
Minoru Ohtsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20010042919Abstract: The invention relates to a method for forming connection holes reliably by making contact resistance low and uniform in semiconductor devices. Insulating layer 3, that includes SOG layer 7, is plasma etched using an etching gas with a small quantity of a gas with a low C/F ratio, such as CHF3, mixed with a gas with a high C/F ratio, such as C4F8/Ar/O2 at a ratio of 1:3.Type: ApplicationFiled: September 1, 1999Publication date: November 22, 2001Inventors: Manabu Tomita, Takashi Hayakawa, Masayuki Yasuda, Michio Nishimura, Minoru Ohtsuka, Masayuki Kojima, Kazuo Yamazaki
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Patent number: 6060352Abstract: A method for fabricating DRAMs each having a COB structure, and the semiconductor device formed by this method, are provided. In one embodiment, the word line and/or bit line is covered with an insulating film having a comparatively small etching rate. Contact holes are formed while being defined by those insulating films in self-alignment.Type: GrantFiled: January 28, 1998Date of Patent: May 9, 2000Assignee: Hitachi, Ltd.Inventors: Toshihiro Sekiguchi, Hideo Aoki, Yoshitaka Tadaki, Keizo Kawakita, Jun Murata, Katsuo Yuhara, Michio Nishimura, Kazuhiko Saitoh, Minoru Ohtsuka, Masayuki Yasuda, Toshiyuki Kaeriyama, Songsu Cho
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Patent number: 5933726Abstract: A semiconductor device, such as a dynamic RAM, and method of making it. A number of stacked cell capacitors are placed at a prescribed spacing in an alignment direction on top of a p.sup.- -type silicon substrate (1). Each capacitor has a nearly perpendicular cylindrical lower electrode (cylindrical polysilicon layer (96)), a dielectric film (silicon nitride film (77)), and upper electrode (plate electrode (78) made of polysilicon). The spacing in the alignment direction is smaller than the inner diameter of the lower electrode.Type: GrantFiled: August 27, 1996Date of Patent: August 3, 1999Assignee: Texas Instruments IncorporatedInventors: Michio Nishimura, Kazuhiko Saitoh, Masayuki Yasuda, Takashi Hayakawa, Michio Tanaka, Yuji Ezaki, Katsuo Yuhara, Minoru Ohtsuka, Toshikazu Kumai, Songsu Cho, Toshiyuki Kaeriyama, Keizo Kawakita, Toshihiro Sekiguchi, Yoshitaka Tadaki, Jun Murata, Hideo Aoki, Akihiko Konno, Kiyomi Katsuyama, Takafumi Tokunaga, Yoshimi Torii
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Patent number: 5804479Abstract: The etch-back amount of a silicon oxide film of a memory array which is a higher altitude portion is increased when etching back and flattening the silicon oxide film by arranging a first-layer wiring on a BPSG film covering an upper electrode of an information-storing capacitative element only in a peripheral circuit but not arranging it in the memory array.Thus, a DRAM having a stacked capacitor structure is obtained such that the level difference between the memory array and peripheral circuit is decreased, and the formation of wiring and connection holes are easy.Type: GrantFiled: August 9, 1996Date of Patent: September 8, 1998Assignees: Hitachi, Ltd., Texas Instruments Inc.Inventors: Hideo Aoki, Jun Murata, Yoshitaka Tadaki, Toshihiro Sekiguchi, Keizo Kawakita, Takashi Hayakawa, Katsutoshi Matsunaga, Kazuhiko Saitoh, Michio Nishimura, Minoru Ohtsuka, Katsuo Yuhara, Michio Tanaka, Yuji Ezaki, Toshiyuki Kaeriyama, SongSu Cho
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Patent number: 5661158Abstract: A lipids-lowering agent which comprises an angiotensin II antagonist as an active ingredient.Type: GrantFiled: March 23, 1995Date of Patent: August 26, 1997Assignee: Fujisawa Pharmaceutical Co., Ltd.Inventors: Minoru Ohtsuka, Shigeru Sakai
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Patent number: 5529119Abstract: The stacked heat exchanger in accordance with the present invention comprises flat tubes and corrugated fins which are alternately put together, the flat tube having a tank portion and a core portion, the tank portion on one side at the outermost portion having an inlet header, the tank portion on the other side at the outermost portion having an outlet header, and the core portion having a side plate as an external plate at both ends, wherein the upper end of the side plate abuts against the lower end of the inlet header and the lower end of the outlet header. Therefore, when a pressure is applied, a force in the spreading direction applied to the inlet/outlet tank portion is received by the abutting of side plate against said inlet and outlet headers. Thus, the deformation of the whole stacked heat exchanger can be prevented.Type: GrantFiled: September 30, 1994Date of Patent: June 25, 1996Assignee: Mitsubishi Jukogyo Kabushiki KaishaInventors: Masateru Hayashi, Kazuo Ishii, Shoji Fukami, Yoshifumi Moriguchi, Minoru Ohtsuka
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Patent number: 5447194Abstract: The stacked heat exchanger in accordance with the present invention comprises flat tubes and corrugated fins which are alternately put together, the flat tube having a tank portion and a core portion, the tank portion on one side at the outermost portion having an inlet header, the tank portion on the other side at the outermost portion having an outlet header, and the core portion having a side plate as an external plate at both ends, wherein the upper end of the side plate abuts against the lower end of the inlet header and the lower end of the outlet header. Therefore, when a pressure is applied, a force in the spreading direction applied to the inlet/outlet tank portion is received by the abutting of side plate against said inlet and outlet headers. Thus, the deformation of the whole stacked heat exchanger can be prevented.Type: GrantFiled: August 25, 1993Date of Patent: September 5, 1995Assignee: Mitsubishi Jukogyo Kabushiki KaishaInventors: Masateru Hayashi, Kazuo Ishii, Shoji Fukami, Yoshifumi Moriguchi, Minoru Ohtsuka
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Patent number: 5417280Abstract: The present invention discloses a stacked heat exchanger in which separate flow paths 54 and 55 which are formed by corrugated inner fins 52 and 53 are disposed in chambers 48 and 49 of a flat tube 41, and also separate U-shaped flow paths 56 are formed at the U-turn portion 50 to make the flow of refrigerant smooth, increase the area of flow paths, and eliminate the stagnation of refrigerant at the U-turn portion 50. The separation of refrigerant into two phases of gas and liquid due to centrifugal forces at the U-turn portion 50 is limited to the inside of each divided U-shaped flow path 56, thereby the distribution of the gas and liquid phases can be decreased. Also disclosed is a method of manufacturing a stacked heat exchanger, in which the reliability of flat tube 41 is improved, and the leakage of refrigerant is prevented.Type: GrantFiled: August 25, 1993Date of Patent: May 23, 1995Assignee: Mitsubishi Jukogyo Kabushiki KaishaInventors: Masateru Hayashi, Kazuo Ishii, Hiroshi Iokawa, Shigeo Sakai, Minoru Ohtsuka, Kenji Matsuda, Hidenao Kawai
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Patent number: 5244535Abstract: Method of making a semiconductor device, wherein an etchant gas is employed to etch a contact hole through an insulation layer overlying a conduction layer as disposed on a substrate of semiconductor material such that a surface portion of the conduction layer is selectively exposed by the formation of the contact hole through the overlying insulation layer. Normally, the etchant gas as so employed will have a tendency to react with the underlying conduction layer so as to form reaction products on the selectively exposed surface portion of the conduction layer increasing the contact resistance thereof. The method involves flooding the etched contact hole immediately following its formation with a gaseous medium covering the area of the selectively exposed surface portion of the conduction layer, wherein the gaseous medium is capable of inhibiting the formation of reaction products on the selectively exposed surface portion of the conduction layer from the original etchant gas.Type: GrantFiled: March 13, 1992Date of Patent: September 14, 1993Assignee: Texas Instruments IncorporatedInventors: Minoru Ohtsuka, Kazutoshi Taira
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Patent number: 5195074Abstract: In an optical head apparatus for recording or reproducing information onto or from an optical disc, a carriage is movable along a guide shaft extending in a direction parallel with the radial direction of the optical disc, and an armature is mounted on the carriage so that it can rotate about a pivotal axis perpendicular to the surface of the optical disc. An objective lens is fixed to the armature and positioned to traverse the tracks on the optical disc when the armature rotates. Guide yokes extend in parallel with the guide shaft. Tracking and carriage-servo coils are fixed to the armature and have a hollow through which the guide yokes loosely extend. A magnetic field means creates magnetic lines of force perpendicular to the longitudinal direction of the guide yokes and parallel with the surface of the optical disc.Type: GrantFiled: August 5, 1991Date of Patent: March 16, 1993Assignee: Oki Electric Industry Co., Ltd.Inventors: Katsushide Tanoshima, Minoru Ohtsuka, Shizuo Nagata, Masahiro Takahashi, Yasuo Shimizu
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Patent number: 5097456Abstract: An optical head for use in an optical disk device holds individually an objective lens, an optical path converting prism and first and second relay lenses that are movably only in the direction of tracking. The objective lens and other members can be moved for the purpose of correcting any possible displacement of a track position of a light beam due to any eccentric arrangement involved and of a focusing position of the light beam due to a change in a relative distance between the lenses and due to surface deflection of a disk. The optical head thus allows easy assembly and adjustment thereof with simplified structure, higher resonance frequency, and high speed response.Type: GrantFiled: April 16, 1990Date of Patent: March 17, 1992Assignee: Oki Electric Industry Co., Ltd.Inventors: Katsuhide Tanoshima, Yasuo Shimizu, Minoru Ohtsuka, Masahiro Takahashi, Shizuo Nagata
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Patent number: 4782070Abstract: The treatment of cerebral dysfunction with a dihydropyridine compounds the formula: ##STR1## R.sup.1 is nitrophenyl and R.sup.2, R.sup.3 and R.sup.4 are each lower alkyl or a pharmaceutically acceptable salt thereof.Type: GrantFiled: June 19, 1987Date of Patent: November 1, 1988Assignee: Fujisawa Pharmaceutical Co., Ltd.Inventors: Takaharu Ono, Toshiharu Kamitani, Minoru Ohtsuka
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Patent number: 3985444Abstract: A highly sensitive process for measuring fine deformation comprises a stage of illumination with beam to on a periodic structure having diffractive function as well as lacking in diffractive function, a stage of selecting wave of diffraction order having conjugate or nearly conjugate relation among diffracted wave fronts projected from the periodic structure by means of said illumination with beam so as to cause mutual interference, thus, the amount of deformation is measured by the interference fringe formed by said mutual interference when the basic period of periodic structure is displaced or periodic structure is deformed.Type: GrantFiled: September 19, 1974Date of Patent: October 12, 1976Assignee: Canon Kabushiki KaishaInventors: Matsuo Takashima, Minoru Ohtsuka, Kazuya Matsumoto