Patents by Inventor Minoru Sakamaki

Minoru Sakamaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12283452
    Abstract: Provided is a charged particle beam apparatus capable of realizing a highly reliable insulating structure. This charged particle beam apparatus emits a charged particle beam from a charged particle beam emission device onto a sample, detects charged particles generated from the sample, and creates a sample image or processes the sample. The charged particle beam emission device is provided with a charged particle source and a shield arranged in an interior of a metal housing that is filled with an insulating gas, and an acceleration electrode arranged below the charged particle source, power being supplied to the acceleration electrode via the shield.
    Type: Grant
    Filed: April 15, 2021
    Date of Patent: April 22, 2025
    Assignee: Hitachi High-Tech Corporation
    Inventors: Hiroshi Morita, Takashi Kubo, Minoru Sakamaki, Shuhei Ishikawa, Shunichi Watanabe
  • Publication number: 20250079112
    Abstract: Provided is a charged particle beam apparatus capable of realizing a highly reliable insulating structure. This charged particle beam apparatus emits a charged particle beam from a charged particle beam emission device onto a sample, detects charged particles generated from the sample, and creates a sample image or processes the sample. The charged particle beam emission device is provided with a charged particle source and a shield arranged in an interior of a metal housing that is filled with an insulating gas, and an acceleration electrode arranged below the charged particle source, power being supplied to the acceleration electrode via the shield.
    Type: Application
    Filed: April 15, 2021
    Publication date: March 6, 2025
    Inventors: Hiroshi MORITA, Takashi KUBO, Minoru SAKAMAKI, Shuhei ISHIKAWA, Shunichi WATANABE
  • Patent number: 7999652
    Abstract: In a flat plate type thick film resistor, an insulation performance is improved by excluding the nonuniformity of potential distribution on a wiring plane, which is generated when electric current flows in a resistance wire. Simultaneously, generation of noise depending on potential distribution and variation of stray capacitance around a resistor is suppressed. When the resistance wire having a constant thickness and uniform resistivity, which is formed on an insulating substrate, is connected to a pair electrode conductors that face to each other, in the way that the resistance wire is repetitively bent to the alternate side in zigzags, a potential gradient on the wiring plane, which is generated when electric current flows in the resistance wire, is constant by properly selecting the line width, the bending angle, and the spacing between bending vertexes of a resistance wire.
    Type: Grant
    Filed: December 18, 2008
    Date of Patent: August 16, 2011
    Assignees: Hitachi, Ltd., Hitachi High-Technologies Corporation
    Inventors: Ken Harada, Minoru Sakamaki, Isao Matsui
  • Publication number: 20090174523
    Abstract: In a flat plate type thick film resistor, an insulation performance is improved by excluding the nonuniformity of potential distribution on a wiring plane, which is generated when electric current flows in a resistance wire. Simultaneously, generation of noise depending on potential distribution and variation of stray capacitance around a resistor is suppressed. When the resistance wire having a constant thickness and uniform resistivity, which is formed on an insulating substrate, is connected to a pair electrode conductors that face to each other, in the way that the resistance wire is repetitively bent to the alternate side in zigzags, a potential gradient on the wiring plane, which is generated when electric current flows in the resistance wire, is constant by properly selecting the line width, the bending angle, and the spacing between bending vertexes of a resistance wire.
    Type: Application
    Filed: December 18, 2008
    Publication date: July 9, 2009
    Inventors: Ken HARADA, Minoru Sakamaki, Isao Matsui