Abstract: The present invention provides a compound having a cholinergic muscarinic M1 receptor positive allosteric modulator activity and useful as an agent for the prophylaxis or treatment of Alzheimer's disease, schizophrenia, pain, sleep disorder, Parkinson's disease dementia, dementia with Lewy bodies, and the like. The present invention relates to a compound represented by the formula (I) or a salt thereof. wherein each symbol is as described in the specification, or a salt thereof.

Abstract: An automobile vehicle body and an automobile vehicle body manufacturing method is provided in which a metal joint is divided into an upper joint and a lower joint. The upper joint includes an upper wall which is fitted into a side member, a vehicle width direction inner wall and a vehicle width direction outer wall, and a lower joint includes a lower wall which is joined to a lower face and an outside face of a vehicle body floor, and the vehicle width direction outer wall, and therefore, the vehicle width direction outer wall of the upper joint is fastened to the vehicle width direction outer wall of the lower joint by a first bolt, and the vehicle width direction inner wall of the upper joint is fastened to an inside face of the side member by a second bolt.

Abstract: An automobile body and a method for manufacturing the same is provided in which a substantially rectangular windshield joining face is formed by a front roof arch, a front portion of roof side rails and a dash panel upper of a lower skeleton. Since the upper skeleton and the lower skeleton can be separated, there is the problem that a gap occurs between lower ends of the roof side rails of the upper skeleton and the vehicle width direction outer ends of the dash panel upper of the lower skeleton, and the windshield joining face is discontinuous. Extension parts are provided inward in the vehicle width direction from the lower ends of the roof side rails, and the vehicle width direction inner ends of the extension parts are connected to the vehicle width direction outer ends of the dash panel upper, thereby eliminating discontinuity of the windshield joining face.

Abstract: A metallic joint 18 having a substantially T-shaped cross section configured to join an inner surface in a vehicle width direction of a FRP side wall member 13 extending in a front-rear direction and an outer end in the vehicle width direction of a FRP standing wall member 14 extending in the vehicle width direction includes left-right joining surfaces 18b and 18c joined to an inner surface in the vehicle width direction of the side wall member 13, and a front-rear joining surface 18a which extends inward in the vehicle width direction from an intermediate portion in the front-rear direction of the left-right joining surfaces 18b and 18c and is joined to a front surface or a rear surface of the outer end in the vehicle width direction of the standing wall member 14.

Abstract: A metallic joint 18 having a substantially T-shaped cross section configured to join an inner surface in a vehicle width direction of a FRP side wall member 13 extending in a front-rear direction and an outer end in the vehicle width direction of a FRP standing wall member 14 extending in the vehicle width direction includes left-right joining surfaces 18b and 18c joined to an inner surface in the vehicle width direction of the side wall member 13, and a front-rear joining surface 18a which extends inward in the vehicle width direction from an intermediate portion in the front-rear direction of the left-right joining surfaces 18b and 18c and is joined to a front surface or a rear surface of the outer end in the vehicle width direction of the standing wall member 14.

Abstract: An automobile vehicle body and an automobile vehicle body manufacturing method is provided in which a metal joint is divided into an upper joint and a lower joint. The upper joint includes an upper wall which is fitted into a side member, a vehicle width direction inner wall and a vehicle width direction outer wall, and a lower joint includes a lower wall which is joined to a lower face and an outside face of a vehicle body floor, and the vehicle width direction outer wall, and therefore, the vehicle width direction outer wall of the upper joint is fastened to the vehicle width direction outer wall of the lower joint by a first bolt, and the vehicle width direction inner wall of the upper joint is fastened to an inside face of the side member by a second bolt.

Abstract: An automobile body and a method for manufacturing the same is provided in which a substantially rectangular windshield joining face is formed by a front roof arch, a front portion of roof side rails and a dash panel upper of a lower skeleton. Since the upper skeleton and the lower skeleton can be separated, there is the problem that a gap occurs between lower ends of the roof side rails of the upper skeleton and the vehicle width direction outer ends of the dash panel upper of the lower skeleton, and the windshield joining face is discontinuous. Extension parts are provided inward in the vehicle width direction from the lower ends of the roof side rails, and the vehicle width direction inner ends of the extension parts are connected to the vehicle width direction outer ends of the dash panel upper, thereby eliminating discontinuity of the windshield joining face.

Abstract: The object is to provide a thermal print head capable of improving printing quality on a medium. The Solution is to provide a base member 11 including a recess 113a, a heat storage region 2 formed in the recess 113a, a resistor layer 4 formed on the base member 11, and an electrode layer 3 formed on the base member 11 and electrically connected to the resistor layer 4. The resistor layer 4 includes a heating portion 41 spanned between two portions of the electrode layer 3 spaced from each other as viewed in a thickness direction Z of the base member 11. The heating portion 41 is located so as to overlap the recess 113a as viewed in the thickness direction Z. The base member 11 is made of a material having a thermal conductivity of 100 to 300 W/(m·K).

Abstract: The object is to provide a thermal print head capable of improving printing quality on a medium. The Solution is to provide a base member 11 including a recess 113a, a heat storage region 2 formed in the recess 113a, a resistor layer 4 formed on the base member 11, and an electrode layer 3 formed on the base member 11 and electrically connected to the resistor layer 4. The resistor layer 4 includes a heating portion 41 spanned between two portions of the electrode layer 3 spaced from each other as viewed in a thickness direction Z of the base member 11. The heating portion 41 is located so as to overlap the recess 113a as viewed in the thickness direction Z. The base member 11 is made of a material having a thermal conductivity of 100 to 300 W/(m·K).

Abstract: The object is to provide a thermal print head capable of improving printing quality on a medium. The Solution is to provide a base member 11 including a recess 113a, a heat storage region 2 formed in the recess 113a, a resistor layer 4 formed on the base member 11, and an electrode layer 3 formed on the base member 11 and electrically connected to the resistor layer 4. The resistor layer 4 includes a heating portion 41 spanned between two portions of the electrode layer 3 spaced from each other as viewed in a thickness direction Z of the base member 11. The heating portion 41 is located so as to overlap the recess 113a as viewed in the thickness direction Z. The base member 11 is made of a material having a thermal conductivity of 100 to 300 W/(m·K).

Abstract: The object is to provide a thermal print head capable of improving printing quality on a medium. The Solution is to provide a base member 11 including a recess 113a, a heat storage region 2 formed in the recess 113a, a resistor layer 4 formed on the base member 11, and an electrode layer 3 formed on the base member 11 and electrically connected to the resistor layer 4. The resistor layer 4 includes a heating portion 41 spanned between two portions of the electrode layer 3 spaced from each other as viewed in a thickness direction Z of the base member 11. The heating portion 41 is located so as to overlap the recess 113a as viewed in the thickness direction Z. The base member 11 is made of a material having a thermal conductivity of 100 to 300 W/(m·K). Selected Figure is FIG. 6.

Abstract: A high quality interface is formed at a low oxygen-carbon density between a substrate and a thin film while preventing heat damage on the substrate and increase of thermal budget. This method includes a step of loading a wafer into a reaction furnace, a step of pretreating the wafer in the reaction furnace, a step of performing a main processing of the pretreated wafer in the reaction furnace, and a step of unloading the wafer from the reaction furnace after the main processing. Hydrogen gas is continuously supplied to the reaction furnace in the period from the end of the pretreating step to the start of the main processing and at least during vacuum-exhausting an interior of the reaction furnace.

Abstract: A lithography mask blank used as a material for producing a lithography mask includes at least one thin film which is formed on a substrate and has a desired function. The blank has a nitrogen-containing thin film as the above-mentioned thin film and an ammonium ion production preventing layer for preventing production of ammonium ions, which is formed on the nitrogen-containing thin film or at least at a surface portion of the nitrogen-containing thin film and which is exposed on the surface of the lithography mask after the lithography mask is manufactured.

Abstract: A halftone type phase shift mask having a semitranslucent film pattern and a shielding film pattern provided on a transparent substrate in this order is constituted in such a manner that each of the reflectances of the transparent substrate, the semitranslucent film pattern and the shielding film pattern for an inspecting light represents a difference which can detect the semitranslucent film pattern and the shielding film pattern based on a reflected light generated when the inspecting light is irradiated on the mask.

Abstract: A high quality interface is formed at a low oxygen-carbon density between a substrate and a thin film while preventing heat damage on the substrate and increase of thermal budget. This method includes a step of loading a wafer into a reaction furnace, a step of pretreating the wafer in the reaction furnace, a step of performing a main processing of the pretreated wafer in the reaction furnace, and a step of unloading the wafer from the reaction furnace after the main processing. Hydrogen gas is continuously supplied to the reaction furnace in the period from the end of the pretreating step to the start of the main processing and at least during vacuum-exhausting an interior of the reaction furnace.

Abstract: By increasing the dry etching rate of a light shielding film, the dry etching time can be shortened so that loss of a resist film is reduced. As a result, a reduction in thickness (to 300 nm or less) of the resist film becomes possible so that pattern resolution and pattern accuracy (CD accuracy) can be improved. Further, by shortening the dry etching time, a photomask blank and a photomask manufacturing method are provided, which can form a pattern of the light shielding film having an excellent sectional shape. In a photomask blank having a light shielding film on an optically transparent substrate, the photomask blank being a mask blank for a dry etching process adapted for a photomask producing method of patterning the light shielding film by the dry etching process using as a mask a pattern of a resist formed on the light shielding film, the light shielding film is made of a material having a selectivity exceeding 1 with respect to the resist in the dry etching process.

Abstract: A halftone type phase shift mask having a semitranslucent film pattern and a shielding film pattern provided on a transparent substrate in this order is constituted in such a manner that each of the reflectances of the transparent substrate, the semitranslucent film pattern and the shielding film pattern for an inspecting light represents a difference which can detect the semitranslucent film pattern and the shielding film pattern based on a reflected light generated when the inspecting light is irradiated on the mask.

Abstract: A halftone type phase shift mask having a semitranslucent film pattern and a shielding film pattern provided on a transparent substrate in this order is constituted in such a manner that each of the reflectances of the transparent substrate, the semitranslucent film pattern and the shielding film pattern for an inspecting light represents a difference which can detect the semitranslucent film pattern and the shielding film pattern based on a reflected light generated when the inspecting light is irradiated on the mask.

Abstract: A lithography mask blank used as a material for producing a lithography mask includes at least one thin film which is formed on a substrate and has a desired function. The blank has a nitrogen-containing thin film as the above-mentioned thin film and an ammonium ion production preventing layer for preventing production of ammonium ions, which is formed on the nitrogen-containing thin film or at least at a surface portion of the nitrogen-containing thin film and which is exposed on the surface of the lithography mask after the lithography mask is manufactured.

Abstract: A halftone type phase shift mask having a semitranslucent film pattern and a shielding film pattern provided on a transparent substrate in this order is constituted in such a manner that each of the reflectances of the transparent substrate, the semitranslucent film pattern and the shielding film pattern for an inspecting light represents a difference which can detect the semitranslucent film pattern and the shielding film pattern based on a reflected light generated when the inspecting light is irradiated on the mask.