Abstract: The present invention provides a treating agent for a metal hydride-containing exhaust gas, wherein the treating agent is low in exothermic property and further high in performance in a treatment of harm-elimination for the metal hydride-containing exhaust gas, comprises at least one among metal hydroxide, metal carbonate, basic metal carbonate, and further supports at least one metal among group-VIII noble metals on periodic table and silver. Therefore, the performance of harm-elimination for the metal hydride-containing exhaust gas is prominently improved. The treating agent in the present invention is high in performance and further low in exothermic property, thereby that is useful in the treatment for the metal hydride-containing exhaust gas generated in semiconductor manufacturing industry and the like.

Abstract: An object of the present invention is to provide a treatment agent superior in harm-removing performance to metal hydride containing exhaust gas, and its production method as well as a treatment method. It is a mixture of either copper hydroxide or basic copper carbonate and silicon compound or a mixture, wherein parts of said copper compound and said silicon compound form a complex. A preparation of the treatment agent is made by a precipitation method, wherein a copper salts solution serves as a precipitation mother solution, and a mixture solution of either alkali hydroxide or alkali carbonate and alkali silicate serves as a precipitating agent. A treatment agent obtained as its result shows a high harm-removing performance to the metal hydride gas and a low heat generation, for which reason the agent is useful for treatment of the metal hydride containing exhaust gas generated in semiconductor manufacturing.

Abstract: The present invention provides a treating agent for a metal hydride-containing exhaust gas, wherein the treating agent is low in exothermic property and further high in performance in a treatment of harm-elimination for the metal hydride-containing exhaust gas, comprises at least one among metal hydroxide, metal carbonate, basic metal carbonate, and further supports at least one metal among group-VIII noble metals on periodic table and silver. Therefore, the performance of harm-elimination for the metal hydride-containing exhaust gas is prominently improved. The treating agent in the present invention is high in performance and further low in exothermic property, thereby that is useful in the treatment for the metal hydride-containing exhaust gas generated in semiconductor manufacturing industry and the like.

Abstract: An object of the present invention is to provide a treatment agent superior in harm-removing performance to metal hydride containing exhaust gas, and its production method as well as a treatment method. It is a mixture of either copper hydride or basic copper hydride and silicon compound or a mixture, wherein parts of said copper compound and said silicon compound form a complex. A preparation of the treatment agent is made by a precipitation method, wherein a copper salts solution serves as a precipitation mother solution, and a mixture solution of either alkali hydride or alkali carbonate and alkali silicate serves as a precipitating agent. A treatment agent obtained as its result shows a high harm-removing performance to the metal hydride gas and a low heat generation, for which reason the agent is useful for treatment of the metal hydride containing exhaust gas generated in semiconductor manufacturing.