Patents by Inventor Minoru Tomozawa

Minoru Tomozawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8304081
    Abstract: The invention relates to a process for making a SiO2—RExOy—Al2O3 glass comprising preparing a glass according to a conventional process wherein the conventional process comprises a step of heat treating a mixture of SiO2, RExOy, and Al2O3 at a temperature greater than the spinodal temperature for 0.1 to 10 hours wherein RExOy is a rare earth oxide and RE is a rare earth element chosen from Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, and combinations thereof. The invention also relates to glasses prepared by the process and glass lasers, optical amplifiers and laminated glass that comprise the glass prepared by the process.
    Type: Grant
    Filed: October 16, 2007
    Date of Patent: November 6, 2012
    Assignees: Rensselaer Polytechnic Institute, Sekisui Chemical Co., Ltd.
    Inventors: Minoru Tomozawa, Bungo Hatta
  • Publication number: 20100323204
    Abstract: The invention relates to a process for making a SiO2—RExOy—Al2O3 glass comprising preparing a glass according to a conventional process wherein the conventional process comprises a step of heat treating a mixture of SiO2, RExOy, and Al2O3 at a temperature greater than the spinodal temperature for 0.1 to 10 hours wherein RExOy is a rare earth oxide and RE is a rare earth element chosen from Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, and combinations thereof. The invention also relates to glasses prepared by the process and glass lasers, optical amplifiers and laminated glass that comprise the glass prepared by the process.
    Type: Application
    Filed: October 16, 2007
    Publication date: December 23, 2010
    Applicant: RENSSELAER POLYTECHNIC INSTITUTE
    Inventors: Minoru Tomozawa, Bungo Hatta
  • Publication number: 20040089024
    Abstract: A process for the preparation of crystalline silica powder from amorphous silica powder is disclosed. The water and hydroxyl content in the crystalline powder is much lower than that in the amorphous silica powder. The process involves heating the amorphous silica powder in the presence of a noble metal without the need for adding an impurity, such as an alkali crystallization promoter. Preferably, the amorphous silica powder is sol-gel derived, and a high purity silica glass product can therefore be made having a water content of less than 0.1 ppm.
    Type: Application
    Filed: November 8, 2002
    Publication date: May 13, 2004
    Applicant: Rensselaer Polytechnic Institute
    Inventors: Minoru Tomozawa, Victor Lou
  • Patent number: 4620863
    Abstract: A radiation coloration resistant glass is disclosed which is used in a radiation environment sufficient to cause coloration in most forms of glass. The coloration resistant glass includes higher proportions by weight of water and has been found to be extremely resistant to color change when exposed to such radiation levels. The coloration resistant glass is free of cerium oxide and has more than about 0.5% by weight water content. Even when exposed to gamma radiation of more than 10.sup.7 rad, the coloration resistant glass does not lose transparency.
    Type: Grant
    Filed: October 14, 1983
    Date of Patent: November 4, 1986
    Assignee: Rensselaer Polytechnic Institute
    Inventors: Minoru Tomozawa, E. Bruce Watson, John Acocella