Patents by Inventor Minoru Umemoto

Minoru Umemoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8989339
    Abstract: Disclosed is a zirconium alloy material having high corrosion resistance regardless of thermal history during its manufacturing process. The zirconium alloy material is obtained by providing a zirconium alloy containing on the mass basis: 0.001% to 1.9% of Sn, 0.01% to 0.3% of Fe, 0.01% to 0.3% of Cr, 0.001% to 0.3% of Ni, 0.001% to 3.0% of Nb, 0.027% or less of C, 0.025% or less of N, 4.5% or less of Hf and 0.16% or less of O with the remainder being inevitable impurities and zirconium, being formed of a bulk alloy and a surface layer, in which the surface layer has a plastic strain of 3 or more or a Vickers hardness of 260 HV or more and an arithmetic mean surface roughness Ra of 0.2 ?m or less.
    Type: Grant
    Filed: November 8, 2011
    Date of Patent: March 24, 2015
    Assignee: Hitachi, Ltd.
    Inventors: Ryo Ishibashi, Masahisa Inagaki, Hideo Soneda, Naoya Okizaki, Tomomi Nakamura, Yoshikazu Todaka, Hiroaki Azuma, Nozomu Adachi, Minoru Umemoto
  • Patent number: 8382919
    Abstract: A process of forming an ultrafine crystal layer in a workpiece constituted by a metallic material. The process includes: performing a machining operation on a surface of the workpiece, so as to impart a large local strain to the machined surface of the workpiece, where the machining operation causes the machined surface of the workpiece to be subjected to a plastic working that causes to have large local strain in the form of a true strain of at least one, such that the ultrafine crystal layer is formed in a surface layer portion of the workpiece that defines the machined surface of the workpiece. Also disclosed are a nanocrystal layer forming process, a machine component having the ultrafine crystal layer or the nanocrystal layer, and a machine component producing process of producing the machine component.
    Type: Grant
    Filed: November 10, 2009
    Date of Patent: February 26, 2013
    Assignees: Toyohashi University of Technology, Univance Corporation
    Inventors: Minoru Umemoto, Yoshikazu Todaka, Tadashi Suzuki, Toshiichi Ota, Akihiro Yamashita, Shuji Tanaka
  • Publication number: 20120114091
    Abstract: Disclosed is a zirconium alloy material having high corrosion resistance regardless of thermal history during its manufacturing process. The zirconium alloy material is obtained by providing a zirconium alloy containing on the mass basis: 0.001% to 1.9% of Sn, 0.01% to 0.3% of Fe, 0.01% to 0.3% of Cr, 0.001% to 0.3% of Ni, 0.001% to 3.0% of Nb, 0.027% or less of C, 0.025% or less of N, 4.5% or less of Hf and 0.16% or less of O with the remainder being inevitable impurities and zirconium, being formed of a bulk alloy and a surface layer, in which the surface layer has a plastic strain of 3 or more or a Vickers hardness of 260 HV or more and an arithmetic mean surface roughness Ra of 0.2 ?m or less.
    Type: Application
    Filed: November 8, 2011
    Publication date: May 10, 2012
    Inventors: Ryo ISHIBASHI, Masahisa Inagaki, Hideo Soneda, Naoya Okizaki, Tomomi Nakamura, Yoshikazu Todaka, Hiroaki Azuma, Nozomu Adachi, Minoru Umemoto
  • Publication number: 20100151270
    Abstract: A process of forming an ultrafine crystal layer in a workpiece constituted by a metallic material. The process includes: performing a machining operation on a surface of the workpiece, so as to impart a large local strain to the machined surface of the workpiece, where the machining operation causes the machined surface of the workpiece to be subjected to a plastic working that causes to have large local strain in the form of a true strain of at least one, such that the ultrafine crystal layer is formed in a surface layer portion of the workpiece that defines the machined surface of the workpiece. Also disclosed are a nanocrystal layer forming process, a machine component having the ultrafine crystal layer or the nanocrystal layer, and a machine component producing process of producing the machine component.
    Type: Application
    Filed: November 10, 2009
    Publication date: June 17, 2010
    Inventors: Minoru Umemoto, Yoshikazu Todaka, Tadashi Suzuki, Toshiichi Ota, Akihiro Yamashita, Shuji Tanaka
  • Publication number: 20080286597
    Abstract: An ultrafine crystal layer forming process of forming an ultrafine crystal layer in a workpiece constituted by a metallic material. The process includes: performing a machining operation on a surface of the workpiece using a machining tool, so as to impart a large local strain to the machined surface of the workpiece, where the machining operation using the machining tool causes the machined surface of the workpiece to be subjected to a plastic working that causes to have large local strain in the form of a true strain of at least 1, such that the ultrafine crystal layer is formed in a surface layer portion of the workpiece that defines the machined surface of the workpiece. Also disclosed are a nanocrystal layer forming process, a machine component having the ultrafine crystal layer or the nanocrystal layer, and a machine component producing process of producing the machine component.
    Type: Application
    Filed: December 14, 2004
    Publication date: November 20, 2008
    Inventors: Minoru Umemoto, Yoshikazu Todaka, Tadashi Suzuki, Toshiichi Ota, Akihiro Yamashita, Shuji Tanaka
  • Publication number: 20060289090
    Abstract: This invention relates to a method for fining a surface of a metal product to form crystal grains having sizes less than 1 ? m at their surfaces and the metal product produced thereby. The method is comprised of a process for forming crystal grains having sizes less than 1 ? m at the surface of the metal product by projecting or peening shots or projectiles while a power per unit of area of the surface, which power is caused by projecting or peening shots or projectiles, is controlled at a predetermined value.
    Type: Application
    Filed: December 25, 2003
    Publication date: December 28, 2006
    Inventors: Minoru Umemoto, Kouichi Tsuchiya, Yoshikazu Todaka, Mitsugi Uemura, Hideaki Kaga, Junkou Kurosaki