Abstract: An exposing apparatus provided with a first alignment stage B, a first exposing stage C, a reverse stage D, a second alignmen stage E and a second exposing stage F in which the first alignment stage B, the reverse stage D and the second alignment stage E being provided in a straight line and each of the first alignment stage B and the second alignment stage E being provided in perpendicular dirction to the straight line the first exposing stage C and the second exposing stage F, respectively, and the ultraviolet rays irradiation stage H being located between the first exposing stage C and the second exposing stage F, offers an improved exposing apparatus of smaller installation space, the upper printing frame being replaced very easily when deteriorated after long time use, the lower printing frame properly absorb and displace the work from the lower printing frame, smaller consumption of the electricity, and forming of the vacuum frame and locating of the work are performed efficiently and accurately.

Abstract: An appropriate photochemical reaction is produced in electrodeposited photoresist applied to the surface of a board and to the inner wall surfaces of holes extending through the board, for improving the efficiency of the operation of image formation. Upper and lower ultraviolet illumination devices and upper and lower light condensers 34a, 34b are provided. Each ultraviolet illumination device has a discharge lamp 32 and a reflecting mirror 33. Each light condenser consists of a horizontal array of a multiplicity of lenses 35 placed close to each other. The upper and lower ultraviolet illumination devices are disposed respectively above and below the board 31 in a symmetrical relation with respect to the board. The upper light condenser 34a is disposed between the upper discharge lamp 32 and the board 31, while the lower light condenser 34b is located between the lower discharge lamp 32 and the board 31. These light condenser which are spaced from each other can be moved horizontally.

Abstract: An exposure apparatus having upper and lower ultraviolet rays irradiating devices which are vertically symmetrically disposed above and below a pattern-forming board having through holes therein, and upper and lower light-transmissible plates which are disposed spacedly from each other in a light path of the ultraviolet rays irradiated to the board so as to be vertically symmetrically disposed with respect to the board and horizontally movable, each of the ultraviolet rays irradiating devices having an electric discharge lamp and a reflection mirror and each of the light-transmissible plates having an uneven surface of a sawtooth section. With this arrangement, a proper photochemical reaction can be induced to the photoresist on the surface of the board and the inner wall surfaces of the through holes to thereby improve a working efficiency of a pattern forming process.

Abstract: A light permeating apparatus preferably employable for an exposing equipment, a drying equipment, a printing equipment for forming a pattern on a printed circuit board is disclosed. The apparatus includes an opposing pair of light permeable plates, a casing fixedly secured to the light permeable plates, a filter disposed in the inclined state in the flat space defined between the light permeable plates to divide the interior of the flat space into two parts, a liquid supply tube attached to the fore end of the casing and liquid discharge tubes attached to the rear end of the casing. The opposite sides and the rear side of the casing are designed in the flow passage-shaped configuration, and a plurality of holes are formed on the inner wall of each of the flow passages on the opposite sides and the rear side of the casing.

Abstract: A reflective mirror having a cooling unit attached thereto is provided with a layer of material deposited on the surface of a glass plate. This material has such properties that most of ultraviolet rays in a light beam emitted from a light source are reflected from the reflective surface of the reflective mirror (cold mirror) but infrared rays permit to permeate through the reflective mirror or are absorbed in the substrate of the reflective mirror. The cooling unit is disposed on the opposite side to the reflective surface of the reflective mirror to absorptively remove infrared rays emitted from the light source. The reflective mirror is preferably employable for an exposing equipment in which the reflective mirror of the present invention and a plurality of conventional reflective mirrors each made of an ordinary metallic material are arranged as essential components with a lower working temperature.

Abstract: In a cooling liquid recirculation system, walls of transparent jacket tubes for cooling a mercury-vapor lamp, which jacket tubes are provided separately from the mercury-vapor in accordance with the prior art are formed in optical filters to thereby decrease the temperature of an object to be illuminated. A recirculation unit of cooling liquid for recirculation of the jacket tubes is connected through an elastic duct to a light source unit such as a mercury-vapor lamp. These components are movable for practical use.

Abstract: A photoresist exposure apparatus in which a photoresist is coated by electrodeposition on the surface of a printed circuit board. The apparatus operates to expose the printed circuit board, which has been subjected to through-hole plating, to light through a film. The apparatus includes a device for horizontally disposing the printed circuit board and a light source positioned adjacent to the printed circuit board which can be rotated horizontally along the printed circuit board surface and which can be lifted and lowered with respect to the surface of the printed circuit board.

Abstract: A photoresist exposure method in which a photoresist that is coated by electrodeposition on the surface of a printed circuit board having been subjected to through-hole plating and on the inner wall surfaces of through-holes therein is exposed to light through a film, comprises the first step of exposing the resist electro-deposited on the inner wall surfaces of the through-hole with a light source positioned adjacent to the board and rotated horizontally along the board surface, and the second step of exposing the resist on the board through a film for forming a precise pattern with a light source positioned remote from the board surface.

Abstract: A variable incident angle exposure apparatus wherein the incident angle of exposure light can be set as desired.