Patents by Inventor Minoru Yokoshima
Minoru Yokoshima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7361450Abstract: A photosensitive resin (A) consisting substantially of a product obtained by reacting a polyester (c) which is a reaction product of a polyol (a) with a tetrabasic acid dianhydride (b) with a compound (d) having an ethylenically unsaturated group and an epoxy group in the molecule; an alkali-soluble photosensitive resin (AA) obtained by reacting the photosensitive resin (A) with a di- or tri-basic acid mono-anhydride (e); photosensitive resin compositions prepared by incorporating the above photosensitive resin with a diluent (XX), a crosslinking agent (B) and/or a photopolymerization initiator (C); products of curing of the compositions; and articles equipped with these products. The resins and resin compositions give cured articles which are suitable for the formation of optical waveguides and excellent in processability, transparency, developability, close adhesion, resistance to soldering heat, and so on.Type: GrantFiled: February 25, 2003Date of Patent: April 22, 2008Assignee: Nippon Kayaku Kabushiki KaishaInventors: Hiroo Koyanagi, Koji Nakayama, Chie Umeyama, Yoshihiro Kawada, Minoru Yokoshima
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Patent number: 7169829Abstract: The present invention provides (meth)acrylate compounds bearing a specific maleimide group and resin compositions containing said compounds that can be cured by irradiation of light in a practical dose even when a photoinitiator is not used or used in a smaller amount than that of the prior art, and cured articles of the resin compositions.Type: GrantFiled: December 26, 2002Date of Patent: January 30, 2007Assignee: Nippon Kayaku Kabushiki KaishaInventors: Toru Ozaki, Hiroo Koyanagi, Minoru Yokoshima
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Patent number: 7033706Abstract: Polymer solid electrolytes with good film strength, high ionic conductivity and excellent processability are provided, comprising a resin composition for polymer solid electrolytes containing 0.5–5.0% by weight of a curable resin having a specific structure (A), a plasticizer and (B) an electrolyte (C).Type: GrantFiled: November 29, 2001Date of Patent: April 25, 2006Assignee: Nippon Kayaku Kabushiki KaishaInventors: Satoshi Mori, Minoru Yokoshima
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Publication number: 20050153230Abstract: A photosensitive resin (A) consisting substantially of a product obtained by reacting a polyester (c) which is a reaction product of a polyol (a) with a tetrabasic acid dianhydride (b) with a compound (d) having an ethylenically unsaturated group and an epoxy group in the molecule; an alkali-soluble photosensitive resin (AA) obtained by reacting the photosensitive resin (A) with a di- or tri-basic acid mono-anhydride (e); photosensitive resin compositions prepared by incorporating the above photosensitive resin with a diluent (XX), a crosslinking agent (B) and/or a photopolymerization initiator (C); products of curing of the compositions; and articles equipped with these products. The resins and resin compositions give cured articles which are suitable for the formation of optical waveguides and excellent in processability, transparency, developability, close adhesion, resistance to soldering heat, and so on.Type: ApplicationFiled: February 25, 2003Publication date: July 14, 2005Inventors: Hiroo Koyanagi, Koji Nakayama, Chie Umeyama, Yoshihiro Kawada, Minoru Yokoshima
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Publication number: 20050009947Abstract: The present invention provides (meth)acrylate compounds bearing a specific maleimide group and resin compositions containing said compounds that can be cured by irradiation of light in a practical dose even when a photoinitiator is not used or used in a smaller amount than that of the prior art, and cured articles of the resin compositions.Type: ApplicationFiled: December 26, 2002Publication date: January 13, 2005Inventors: Toru Ozaki, Hiroo Koyanagi, Minoru Yokoshima
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Publication number: 20050004288Abstract: A resin composition which is excellent in photosensitively and developability, gives a cured article excellent in flexibility, soldering heat resistance, resistance to thermal deterioration, and resistance to electroless gold plating, and is suitable especially for use in forming solder resists and interlayer dielectrics. The resin composition is characterized by containing an oligomer (A) obtained by reacting the following ingredients (a) to (d): an epoxy resin having at least two epoxy groups per molecule, a compound having two hydroxy groups and one carboxy group per molecule, a carboxy group per molecule, a carboxylated rubbery polymer, and a monobasic acid having an unsatuated group.Type: ApplicationFiled: August 6, 2002Publication date: January 6, 2005Inventors: Hiroo Koyanagi, Toru Ozaki, Minoru Yokoshima
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Publication number: 20040076886Abstract: Polymer solid electrolytes with good film strength, high ionic conductivity and excellent processability are provided, comprising a resin composition for polymer solid electrolytes containing 0.5-5.0% by weight of a curable resin having a specific structure (A), a plasticizer and (B) an electrolyte (C).Type: ApplicationFiled: July 18, 2003Publication date: April 22, 2004Inventors: Satoshi Mori, Minoru Yokoshima
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Patent number: 6716892Abstract: The present invention relates to a new urethane oligomer (A) and a resin composition comprising (A) and an unsaturated group containing polycarboxylic acid resin (B) that can be diluted with water and is excellent in providing a cured product and that is suitable for a solder resist and an interlayer dielectric layer because the cured product is excellent in flexibility, soldering-heat resistance or the like and allows a development with an organic solvent or a dilute alkali solution; a photosensitive resin composition suitable for an etching resist or a cover lay; and a photosensitive film obtained thereby.Type: GrantFiled: September 5, 2001Date of Patent: April 6, 2004Assignee: Nippon Kayaku Kabushiki KaishaInventors: Satoshi Mori, Minoru Yokoshima, Noriko Kiyoyanagi, Yuichiro Matsuo, Hiroo Koyanagi
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Patent number: 6054501Abstract: This invention provides an energy ray curable composition which has excellent curability. The composition contains a cationic polymerizable substance, a photopolymerization initiator comprised of a specified onium salt and a pigment as occasion demands. The curable composition is excellent in curability, and cured paint films obtained therefrom shows excellent glossiness. This composition can be blended in white inks, printing inks, paints, resist inks, wood fillers and the like.Type: GrantFiled: March 9, 1998Date of Patent: April 25, 2000Assignee: Nippon Kayaku Kabushiki KaishaInventors: Nobuo Taniguchi, Minoru Yokoshima
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Patent number: 6017603Abstract: An ultraviolet-curable adhesive composition which comprises (A) a bisphenol type epoxy (meth)acrylate having a molecular weight of 450 to 3,000, (B) a urethane (meth)acrylate having a molecular weight of 400 to 10,000, (E) a (meth)acrylate monomer other than (A) and (B), and (F) a photopolymerization initiator, and an article having a cured layer of the above adhesive composition.Type: GrantFiled: December 22, 1997Date of Patent: January 25, 2000Assignee: Nippon Kayaku Kabushiki KaishaInventors: Kiyohisa Tokuda, Kenji Yoshida, Kazuhiko Ishii, Minoru Yokoshima
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Patent number: 5973034Abstract: There are provided a resin composition and hardened products thereof for use in resistors, phosphors, conductors, patterns and the like, which can be developed with water or a dilute alkaline aqueous solution, show good pattern accuracy, give small residual organic matter after baking and have excellent adhesiveness. The resin composition which comprises (A) an unsaturated group-containing resin which is an epoxy methacrylate resulting from the reaction of (a) an epoxy resin having at least two epoxy groups in its molecule with (b) a compound having one unsaturated double bond and one carboxyl group in one molecule and (c) a saturated monocarboxylic acid as an optional component, the reaction product epoxy (meth)acrylate being allowed to react with (d) a polybasic acid anhydride as occasion demands, (B) a diluent, (C) a photopolymerization initiator and (D) one or more substances selected from metal powders, metal oxides, metal sulfides or glass.Type: GrantFiled: September 30, 1996Date of Patent: October 26, 1999Assignee: Nippon Kayaku Kabushiki KaishaInventors: Satoshi Mori, Minoru Yokoshima
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Patent number: 5702820Abstract: There is disclosed a photo-imaging resist ink containing (A) an unsaturated group-containing polycarboxylic acid resin which is a reaction product of (c) succinic anhydride with an additive reaction product of (a) an epoxy resin with (b) an unsaturated group-containing monocarboxylic acid, wherein (a) the epoxy resin is represented by the following formula (1): ##STR1## wherein M stands for ##STR2## n is at least 1 on the average; and m is 1 to n on the average. The resist ink is excellent in developability and photosensitivity, while the cured product thereof is excellent in flex resistance and folding resistance, and well satisfactory in adhesion, pencil hardness, solvent resistance, acid resistance, heat resistance, etc.Type: GrantFiled: June 10, 1996Date of Patent: December 30, 1997Assignees: Nippon Kayaku Kabushiki Kaisha, Nippon Polytech Corp.Inventors: Minoru Yokoshima, Tetsuo Ohkubo, Kazunori Sasahara, Yoneji Sato, Yoko Baba
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Patent number: 5629445Abstract: This invention relates to (meth)acrylates represented by formula (1): ##STR1## wherein, R.sub.1 and R.sub.2 are each independently H or CH.sub.3 and average value of n is 1-5; resin composite comprising (A) an urethane (meth)-acrylate and/or epoxy (meth)acrylate, (B) a (meth)-acrylate represented by formula (1) above, (C) an ethylenically unsaturated compound other than component (A) or (B), and (D) a photopolymerization initiator; and cured products of said resin composites. The cured products of said resin composites of this invention have high refractive index and are superior in mold release property, shape reproducibility, restorability, and scratch resistance and suited in particular for transmission type screens.Type: GrantFiled: June 6, 1995Date of Patent: May 13, 1997Assignee: Nippon Kayaku Kabushiki KaishaInventors: Kenji Nakayama, Katsunori Shimura, Minoru Yokoshima, Nobuo Taniguchi
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Patent number: 5578657Abstract: Disclosed herein are adhesive compositions for use in cathode ray tubes comprising a specified epoxy (meth)acrylate, hydroxyl-containing mono (meth)acrylate, a photopolymerization initiator and optionally an urethane (meth)acrylate, the cured products thereof as well as cathode ray tubes obtained by the use thereof. The adhesive compositions of the present invention are excellent in spreadability and the resulting cured products have a good adhesion to glass. Cathode ray tubes in which a sheet of film is bonded to panel-glass by using an adhesive of the present invention exhibit satisfactory screen states comparable to those exhibited by cathode ray tubes subjected to a polishing process.Type: GrantFiled: May 11, 1995Date of Patent: November 26, 1996Assignees: Sony Corporation, Nippon Kayaku Kabushiki KaishaInventors: Takuji Inoue, Tsunenari Saito, Kenji Nakayama, Hiroe Ito, Minoru Yokoshima
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Patent number: 5538821Abstract: The present invention relates to a resist ink composition characterized by comprising a specific unsaturated polycarboxylic acid resin (A) or a specific unsaturated polycarboxylic acid/urethane resin (A'), a photopolymerization initiator (B), a diluent (C), and a curing component (D) and a cured article prepared therefrom.In the formation of a solder resist pattern via selective UV-exposure through a patterned film followed by development of the unexposed part, the composition of the present invention is excellent in developability even though at a small acid value (mg KOH/g) or over a prolonged drying time and shows a resistance of the exposed part against the developing solution. Further, a cured article prepared therefrom is excellent in electroless gold plating resistance and fully satisfactory in adhesion and soldering heat resistance.Type: GrantFiled: May 9, 1994Date of Patent: July 23, 1996Assignees: Nippon Kayaku Kabushiki Kaisha, Taiyo Ink Manufacturing Co., Ltd.Inventors: Masahisa Kakinuma, Shigeru Komori, Kazuhiro Yoshida, Minoru Yokoshima, Tetsuo Ohkubo, Kazunori Sasahara
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Patent number: 5534557Abstract: The composition of the present invention is excellent in compatibility, transparency and curability and give a cured coat of excellent gloss and of less smell, and cured products of excellent properties can be obtained by curing the composition.The present invention relates to an onium salt represented by the following formula (1): ##STR1## wherein Ar is a mono- to tetra-valent aromatic group, X is a bisphenylsulfonio group which may have a substituent, a is 1-4, b is 0 or 1-3, a+b is 1-4, n is 1-4, and Z is a halide represented by the following formula (3): ##STR2## where M is a boron atom, a phosphorus atom, an arsenic atom or an antimony atom, Q is a halogen atom, m is 3-6, l is 0 or 1, and m+l is 4-6; a photopolymerization initiator containing the onium salt as an active ingredient; an energy ray-curable composition containing the initiator; and a cured product.Type: GrantFiled: June 2, 1995Date of Patent: July 9, 1996Assignee: Nippon Kayaku Kabushiki KaishaInventors: Tetsuya Abe, Kazuhiko Ishii, Minoru Yokoshima
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Patent number: 5502083Abstract: The composition of the present invention is excellent in compatibility, transparency and curability and give a cured coat of excellent gloss and of less smell, and cured products of excellent properties can be obtained by curing the composition.The present invention relates to an onium salt represented by the following formula (1): ##STR1## wherein Ar is a mono- to tetra-valent aromatic group, X is a bisphenylsulfonio group which may have a substituent, a is 1-4, b is 0 or 1-3, a+b is 1-4, n is 1-4, and Z is a halide represented by the following formula (3):MQ.sub.m (OH).sub.l (3)where M is a boron atom, a phosphorus atom, an arsenic atom or an antimony atom, Q is a halogen atom, m is 3-6, l is 0 or 1, and m+l is 4-6; a photopolymerization initiator containing the onium salt as an active ingredient; an energy ray-curable composition containing the initiator; and a cured product.Type: GrantFiled: June 8, 1994Date of Patent: March 26, 1996Assignee: Nippon Kayaku Kabushiki KaishaInventors: Tetsuya Abe, Kazuhiko Ishii, Minoru Yokoshima
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Patent number: 5453452Abstract: This invention relates to (meth)acrylates represented by formula (1): ##STR1## wherein, R.sub.1 and R.sub.2 are each independently H or CH.sub.3 and average value of n is 1-5; resin composite comprising (A) an urethane (meth)acrylate and/or epoxy (meth)acrylate, (B) a (meth)acrylate represented by formula (1) above, (C) an ethylenically unsaturated compound other than component (A) or (B), and (D) a photopolymerization initiator; and cured products of said resin composites. The cured products of said resin composites of this invention have high refractive index and are superior in mold release property, shape reproducibility, restorability, and scratch resistance and suited in particular for transmission type screens.Type: GrantFiled: December 16, 1993Date of Patent: September 26, 1995Assignee: Nippon Kayaku Kabushiki KaishaInventors: Kenji Nakayama, Katsunori Shimura, Minoru Yokoshima, Nobuo Taniguchi
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Patent number: 5359017Abstract: The present invention provides a cationically polymerizable organic material composition comprising a composition which contains a cationic polymerization catalyst(s) and a cationically polymerizable organic material(s) as essencial ingredients, and one or more onium salts having a nucleophilic pair anion represented by halogenide, alkyl sulfate or p-toluenesulfonate ions, or one or more iron aromatic compound salts represented by the following formula (I): ##STR1## The composition of the present invention is a cationically polymerizable organic material composition capable of being cured by irradiation of a radiation or by heat, and it also has excellent storage stability at room temperature in the dark and a long pot life.Type: GrantFiled: August 18, 1993Date of Patent: October 25, 1994Assignees: Nippon Kayaku Kabushiki Kaisha, Sanshin Chemical Industry Co., Ltd.Inventors: Fumio Hamazu, Tatsuya Koizumi, Minoru Yokoshima, Masaki Fujimoto, Takeshi Endoh
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Patent number: 5215863Abstract: Disclosed herein is a resin composition or a solder resist resin composition comprising an epoxy resin (A) and/or an epoxy acrylate (B) obtained by reacting one chemical equivalent of epoxy groups in an epoxy resin with 0.1 to 1.0 chemical equivalent of acrylic acid, a styrene-maleic anhydride copolymer (C), an unsaturated group-containing compound (D) other than (B), and a photopolymerization initiator (E).Type: GrantFiled: October 11, 1991Date of Patent: June 1, 1993Assignee: Nippon Kayaku Kabushiki KaishaInventors: Kazuyoshi Nawata, Tetsuo Ohkubo, Minoru Yokoshima