Patents by Inventor Minoru Yokoshima

Minoru Yokoshima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7361450
    Abstract: A photosensitive resin (A) consisting substantially of a product obtained by reacting a polyester (c) which is a reaction product of a polyol (a) with a tetrabasic acid dianhydride (b) with a compound (d) having an ethylenically unsaturated group and an epoxy group in the molecule; an alkali-soluble photosensitive resin (AA) obtained by reacting the photosensitive resin (A) with a di- or tri-basic acid mono-anhydride (e); photosensitive resin compositions prepared by incorporating the above photosensitive resin with a diluent (XX), a crosslinking agent (B) and/or a photopolymerization initiator (C); products of curing of the compositions; and articles equipped with these products. The resins and resin compositions give cured articles which are suitable for the formation of optical waveguides and excellent in processability, transparency, developability, close adhesion, resistance to soldering heat, and so on.
    Type: Grant
    Filed: February 25, 2003
    Date of Patent: April 22, 2008
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Hiroo Koyanagi, Koji Nakayama, Chie Umeyama, Yoshihiro Kawada, Minoru Yokoshima
  • Patent number: 7169829
    Abstract: The present invention provides (meth)acrylate compounds bearing a specific maleimide group and resin compositions containing said compounds that can be cured by irradiation of light in a practical dose even when a photoinitiator is not used or used in a smaller amount than that of the prior art, and cured articles of the resin compositions.
    Type: Grant
    Filed: December 26, 2002
    Date of Patent: January 30, 2007
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Toru Ozaki, Hiroo Koyanagi, Minoru Yokoshima
  • Patent number: 7033706
    Abstract: Polymer solid electrolytes with good film strength, high ionic conductivity and excellent processability are provided, comprising a resin composition for polymer solid electrolytes containing 0.5–5.0% by weight of a curable resin having a specific structure (A), a plasticizer and (B) an electrolyte (C).
    Type: Grant
    Filed: November 29, 2001
    Date of Patent: April 25, 2006
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Satoshi Mori, Minoru Yokoshima
  • Publication number: 20050153230
    Abstract: A photosensitive resin (A) consisting substantially of a product obtained by reacting a polyester (c) which is a reaction product of a polyol (a) with a tetrabasic acid dianhydride (b) with a compound (d) having an ethylenically unsaturated group and an epoxy group in the molecule; an alkali-soluble photosensitive resin (AA) obtained by reacting the photosensitive resin (A) with a di- or tri-basic acid mono-anhydride (e); photosensitive resin compositions prepared by incorporating the above photosensitive resin with a diluent (XX), a crosslinking agent (B) and/or a photopolymerization initiator (C); products of curing of the compositions; and articles equipped with these products. The resins and resin compositions give cured articles which are suitable for the formation of optical waveguides and excellent in processability, transparency, developability, close adhesion, resistance to soldering heat, and so on.
    Type: Application
    Filed: February 25, 2003
    Publication date: July 14, 2005
    Inventors: Hiroo Koyanagi, Koji Nakayama, Chie Umeyama, Yoshihiro Kawada, Minoru Yokoshima
  • Publication number: 20050009947
    Abstract: The present invention provides (meth)acrylate compounds bearing a specific maleimide group and resin compositions containing said compounds that can be cured by irradiation of light in a practical dose even when a photoinitiator is not used or used in a smaller amount than that of the prior art, and cured articles of the resin compositions.
    Type: Application
    Filed: December 26, 2002
    Publication date: January 13, 2005
    Inventors: Toru Ozaki, Hiroo Koyanagi, Minoru Yokoshima
  • Publication number: 20050004288
    Abstract: A resin composition which is excellent in photosensitively and developability, gives a cured article excellent in flexibility, soldering heat resistance, resistance to thermal deterioration, and resistance to electroless gold plating, and is suitable especially for use in forming solder resists and interlayer dielectrics. The resin composition is characterized by containing an oligomer (A) obtained by reacting the following ingredients (a) to (d): an epoxy resin having at least two epoxy groups per molecule, a compound having two hydroxy groups and one carboxy group per molecule, a carboxy group per molecule, a carboxylated rubbery polymer, and a monobasic acid having an unsatuated group.
    Type: Application
    Filed: August 6, 2002
    Publication date: January 6, 2005
    Inventors: Hiroo Koyanagi, Toru Ozaki, Minoru Yokoshima
  • Publication number: 20040076886
    Abstract: Polymer solid electrolytes with good film strength, high ionic conductivity and excellent processability are provided, comprising a resin composition for polymer solid electrolytes containing 0.5-5.0% by weight of a curable resin having a specific structure (A), a plasticizer and (B) an electrolyte (C).
    Type: Application
    Filed: July 18, 2003
    Publication date: April 22, 2004
    Inventors: Satoshi Mori, Minoru Yokoshima
  • Patent number: 6716892
    Abstract: The present invention relates to a new urethane oligomer (A) and a resin composition comprising (A) and an unsaturated group containing polycarboxylic acid resin (B) that can be diluted with water and is excellent in providing a cured product and that is suitable for a solder resist and an interlayer dielectric layer because the cured product is excellent in flexibility, soldering-heat resistance or the like and allows a development with an organic solvent or a dilute alkali solution; a photosensitive resin composition suitable for an etching resist or a cover lay; and a photosensitive film obtained thereby.
    Type: Grant
    Filed: September 5, 2001
    Date of Patent: April 6, 2004
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Satoshi Mori, Minoru Yokoshima, Noriko Kiyoyanagi, Yuichiro Matsuo, Hiroo Koyanagi
  • Patent number: 6054501
    Abstract: This invention provides an energy ray curable composition which has excellent curability. The composition contains a cationic polymerizable substance, a photopolymerization initiator comprised of a specified onium salt and a pigment as occasion demands. The curable composition is excellent in curability, and cured paint films obtained therefrom shows excellent glossiness. This composition can be blended in white inks, printing inks, paints, resist inks, wood fillers and the like.
    Type: Grant
    Filed: March 9, 1998
    Date of Patent: April 25, 2000
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Nobuo Taniguchi, Minoru Yokoshima
  • Patent number: 6017603
    Abstract: An ultraviolet-curable adhesive composition which comprises (A) a bisphenol type epoxy (meth)acrylate having a molecular weight of 450 to 3,000, (B) a urethane (meth)acrylate having a molecular weight of 400 to 10,000, (E) a (meth)acrylate monomer other than (A) and (B), and (F) a photopolymerization initiator, and an article having a cured layer of the above adhesive composition.
    Type: Grant
    Filed: December 22, 1997
    Date of Patent: January 25, 2000
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Kiyohisa Tokuda, Kenji Yoshida, Kazuhiko Ishii, Minoru Yokoshima
  • Patent number: 5973034
    Abstract: There are provided a resin composition and hardened products thereof for use in resistors, phosphors, conductors, patterns and the like, which can be developed with water or a dilute alkaline aqueous solution, show good pattern accuracy, give small residual organic matter after baking and have excellent adhesiveness. The resin composition which comprises (A) an unsaturated group-containing resin which is an epoxy methacrylate resulting from the reaction of (a) an epoxy resin having at least two epoxy groups in its molecule with (b) a compound having one unsaturated double bond and one carboxyl group in one molecule and (c) a saturated monocarboxylic acid as an optional component, the reaction product epoxy (meth)acrylate being allowed to react with (d) a polybasic acid anhydride as occasion demands, (B) a diluent, (C) a photopolymerization initiator and (D) one or more substances selected from metal powders, metal oxides, metal sulfides or glass.
    Type: Grant
    Filed: September 30, 1996
    Date of Patent: October 26, 1999
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Satoshi Mori, Minoru Yokoshima
  • Patent number: 5702820
    Abstract: There is disclosed a photo-imaging resist ink containing (A) an unsaturated group-containing polycarboxylic acid resin which is a reaction product of (c) succinic anhydride with an additive reaction product of (a) an epoxy resin with (b) an unsaturated group-containing monocarboxylic acid, wherein (a) the epoxy resin is represented by the following formula (1): ##STR1## wherein M stands for ##STR2## n is at least 1 on the average; and m is 1 to n on the average. The resist ink is excellent in developability and photosensitivity, while the cured product thereof is excellent in flex resistance and folding resistance, and well satisfactory in adhesion, pencil hardness, solvent resistance, acid resistance, heat resistance, etc.
    Type: Grant
    Filed: June 10, 1996
    Date of Patent: December 30, 1997
    Assignees: Nippon Kayaku Kabushiki Kaisha, Nippon Polytech Corp.
    Inventors: Minoru Yokoshima, Tetsuo Ohkubo, Kazunori Sasahara, Yoneji Sato, Yoko Baba
  • Patent number: 5629445
    Abstract: This invention relates to (meth)acrylates represented by formula (1): ##STR1## wherein, R.sub.1 and R.sub.2 are each independently H or CH.sub.3 and average value of n is 1-5; resin composite comprising (A) an urethane (meth)-acrylate and/or epoxy (meth)acrylate, (B) a (meth)-acrylate represented by formula (1) above, (C) an ethylenically unsaturated compound other than component (A) or (B), and (D) a photopolymerization initiator; and cured products of said resin composites. The cured products of said resin composites of this invention have high refractive index and are superior in mold release property, shape reproducibility, restorability, and scratch resistance and suited in particular for transmission type screens.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: May 13, 1997
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Kenji Nakayama, Katsunori Shimura, Minoru Yokoshima, Nobuo Taniguchi
  • Patent number: 5578657
    Abstract: Disclosed herein are adhesive compositions for use in cathode ray tubes comprising a specified epoxy (meth)acrylate, hydroxyl-containing mono (meth)acrylate, a photopolymerization initiator and optionally an urethane (meth)acrylate, the cured products thereof as well as cathode ray tubes obtained by the use thereof. The adhesive compositions of the present invention are excellent in spreadability and the resulting cured products have a good adhesion to glass. Cathode ray tubes in which a sheet of film is bonded to panel-glass by using an adhesive of the present invention exhibit satisfactory screen states comparable to those exhibited by cathode ray tubes subjected to a polishing process.
    Type: Grant
    Filed: May 11, 1995
    Date of Patent: November 26, 1996
    Assignees: Sony Corporation, Nippon Kayaku Kabushiki Kaisha
    Inventors: Takuji Inoue, Tsunenari Saito, Kenji Nakayama, Hiroe Ito, Minoru Yokoshima
  • Patent number: 5538821
    Abstract: The present invention relates to a resist ink composition characterized by comprising a specific unsaturated polycarboxylic acid resin (A) or a specific unsaturated polycarboxylic acid/urethane resin (A'), a photopolymerization initiator (B), a diluent (C), and a curing component (D) and a cured article prepared therefrom.In the formation of a solder resist pattern via selective UV-exposure through a patterned film followed by development of the unexposed part, the composition of the present invention is excellent in developability even though at a small acid value (mg KOH/g) or over a prolonged drying time and shows a resistance of the exposed part against the developing solution. Further, a cured article prepared therefrom is excellent in electroless gold plating resistance and fully satisfactory in adhesion and soldering heat resistance.
    Type: Grant
    Filed: May 9, 1994
    Date of Patent: July 23, 1996
    Assignees: Nippon Kayaku Kabushiki Kaisha, Taiyo Ink Manufacturing Co., Ltd.
    Inventors: Masahisa Kakinuma, Shigeru Komori, Kazuhiro Yoshida, Minoru Yokoshima, Tetsuo Ohkubo, Kazunori Sasahara
  • Patent number: 5534557
    Abstract: The composition of the present invention is excellent in compatibility, transparency and curability and give a cured coat of excellent gloss and of less smell, and cured products of excellent properties can be obtained by curing the composition.The present invention relates to an onium salt represented by the following formula (1): ##STR1## wherein Ar is a mono- to tetra-valent aromatic group, X is a bisphenylsulfonio group which may have a substituent, a is 1-4, b is 0 or 1-3, a+b is 1-4, n is 1-4, and Z is a halide represented by the following formula (3): ##STR2## where M is a boron atom, a phosphorus atom, an arsenic atom or an antimony atom, Q is a halogen atom, m is 3-6, l is 0 or 1, and m+l is 4-6; a photopolymerization initiator containing the onium salt as an active ingredient; an energy ray-curable composition containing the initiator; and a cured product.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: July 9, 1996
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Tetsuya Abe, Kazuhiko Ishii, Minoru Yokoshima
  • Patent number: 5502083
    Abstract: The composition of the present invention is excellent in compatibility, transparency and curability and give a cured coat of excellent gloss and of less smell, and cured products of excellent properties can be obtained by curing the composition.The present invention relates to an onium salt represented by the following formula (1): ##STR1## wherein Ar is a mono- to tetra-valent aromatic group, X is a bisphenylsulfonio group which may have a substituent, a is 1-4, b is 0 or 1-3, a+b is 1-4, n is 1-4, and Z is a halide represented by the following formula (3):MQ.sub.m (OH).sub.l (3)where M is a boron atom, a phosphorus atom, an arsenic atom or an antimony atom, Q is a halogen atom, m is 3-6, l is 0 or 1, and m+l is 4-6; a photopolymerization initiator containing the onium salt as an active ingredient; an energy ray-curable composition containing the initiator; and a cured product.
    Type: Grant
    Filed: June 8, 1994
    Date of Patent: March 26, 1996
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Tetsuya Abe, Kazuhiko Ishii, Minoru Yokoshima
  • Patent number: 5453452
    Abstract: This invention relates to (meth)acrylates represented by formula (1): ##STR1## wherein, R.sub.1 and R.sub.2 are each independently H or CH.sub.3 and average value of n is 1-5; resin composite comprising (A) an urethane (meth)acrylate and/or epoxy (meth)acrylate, (B) a (meth)acrylate represented by formula (1) above, (C) an ethylenically unsaturated compound other than component (A) or (B), and (D) a photopolymerization initiator; and cured products of said resin composites. The cured products of said resin composites of this invention have high refractive index and are superior in mold release property, shape reproducibility, restorability, and scratch resistance and suited in particular for transmission type screens.
    Type: Grant
    Filed: December 16, 1993
    Date of Patent: September 26, 1995
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Kenji Nakayama, Katsunori Shimura, Minoru Yokoshima, Nobuo Taniguchi
  • Patent number: 5359017
    Abstract: The present invention provides a cationically polymerizable organic material composition comprising a composition which contains a cationic polymerization catalyst(s) and a cationically polymerizable organic material(s) as essencial ingredients, and one or more onium salts having a nucleophilic pair anion represented by halogenide, alkyl sulfate or p-toluenesulfonate ions, or one or more iron aromatic compound salts represented by the following formula (I): ##STR1## The composition of the present invention is a cationically polymerizable organic material composition capable of being cured by irradiation of a radiation or by heat, and it also has excellent storage stability at room temperature in the dark and a long pot life.
    Type: Grant
    Filed: August 18, 1993
    Date of Patent: October 25, 1994
    Assignees: Nippon Kayaku Kabushiki Kaisha, Sanshin Chemical Industry Co., Ltd.
    Inventors: Fumio Hamazu, Tatsuya Koizumi, Minoru Yokoshima, Masaki Fujimoto, Takeshi Endoh
  • Patent number: 5215863
    Abstract: Disclosed herein is a resin composition or a solder resist resin composition comprising an epoxy resin (A) and/or an epoxy acrylate (B) obtained by reacting one chemical equivalent of epoxy groups in an epoxy resin with 0.1 to 1.0 chemical equivalent of acrylic acid, a styrene-maleic anhydride copolymer (C), an unsaturated group-containing compound (D) other than (B), and a photopolymerization initiator (E).
    Type: Grant
    Filed: October 11, 1991
    Date of Patent: June 1, 1993
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Kazuyoshi Nawata, Tetsuo Ohkubo, Minoru Yokoshima