Patents by Inventor Miow Chin Tan

Miow Chin Tan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reduced metal pipe formation in metal silicide contacts
    Patent number: 7935632
    Abstract: Formation of metal pipes resulting from formation of metal silicide contacts are reduced or avoided. To reduce formation of metal pipes, an epitaxial layer is formed over the diffusion region on which the metal silicide contact is formed. The epitaxial layer reduces defects which enhances diffusion of metal atoms or molecules.
    Type: Grant
    Filed: November 6, 2007
    Date of Patent: May 3, 2011
    Assignee: Chartered Semiconductor Manufacturing, Ltd.
    Inventors: Wei Hua Tong, Lap Chan, K. Suresh Kumar, Miow Chin Tan
  • REDUCED METAL PIPE FORMATION IN METAL SILICIDE CONTACTS
    Publication number: 20090114997
    Abstract: Formation of metal pipes resulting from formation of metal silicide contacts are reduced or avoided. To reduce formation of metal pipes, an epitaxial layer is formed over the diffusion region on which the metal silicide contact is formed. The epitaxial layer reduces defects which enhances diffusion of metal atoms or molecules.
    Type: Application
    Filed: November 6, 2007
    Publication date: May 7, 2009
    Applicant: CHARTERED SEMICONDUCTOR MANUFACTURING, LTD.
    Inventors: Wei Hua TONG, Lap CHAN, K. Suresh KUMAR, Miow Chin TAN