Abstract: An imprint lithography method provides a negative image of a pattern formed in a fixed medium on a mechanically flexible imprint master. A substrate includes a deformable material formed over the substrate surface to be patterned. The fixed medium of the imprint master contacts with the substrate to cause the deformable material to deform and contour to the negative image of the pattern of the fixed medium. The imprint master is decoupled from the substrate after the pattern formed in the deformable material is solidified. With the solidified pattern formed on the substrate, the substrate is then patterned by etching or other means.

Abstract: A method and apparatus for forming a device in a substrate having grating structure, includes a substantially coherent and collimated light source, a mirror having a non-planar surface, and a substrate. The mirror, substrate, and stationary light source are disposed in fixed position with respect to one another. The components are arranged such that some light beams from the light source are projected directly onto the substrate surface and other light beams are reflected from the mirror surface onto the substrate surface. The respective beams converge at the substrate surface at different interference angles across the substrate surface. The different interference angles produce an interference pattern having a varying interference period which preferably uniformly increases or decreases across the substrate. The corresponding grating structure formed within the substrate using this interference pattern, therefore also includes the varying grating period. The device formed in the substrate may be a laser.

Abstract: Methods of nanometer pattern formation and transfer onto a selected substrate are provided wherein a selected block copolymer is coated onto the selected substrate and a component of the block copolymer is chemically modified or physically removed so that the dense periodic pattern of the block copolymer can be transferred onto the selected substrate. Substrates prepared by these methods are also provided.