Patents by Inventor Mirko RIBOW

Mirko RIBOW has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM
    Publication number: 20230126018
    Abstract: In a method for producing an optical element for an EUV projection exposure apparatus, a shaping layer (221) is applied onto a substrate (20) so as to have a surface roughness of at most 0.5 nm rms directly after the application of the shaping layer onto the substrate.
    Type: Application
    Filed: December 22, 2022
    Publication date: April 27, 2023
    Inventors: Hartmut ENKISCH, Sandro HOFFMANN, Joern WEBER, Sebastian STROBEL, Mirko RIBOW, Christoph NOTTBOHM, Matthias STURM, Michael KRAUSE