Patents by Inventor Misaki Nakamura

Misaki Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11934102
    Abstract: There is provided a manufacturing method for a cured substance, which makes it possible to obtain a cured substance having excellent breaking elongation, a manufacturing method for a laminate, including the manufacturing method for a cured substance, a manufacturing method for a semiconductor device, including the manufacturing method for a cured substance or the manufacturing method for a laminate, and there is provided a treatment liquid that is used in the manufacturing method for a cured substance. The manufacturing method for a cured substance includes a film forming step of applying a resin composition containing a precursor of a cyclization resin onto a base material to form a film, a treatment step of bringing a treatment liquid into contact with the film, and a heating step of heating the film after the treatment step, in which the treatment liquid contains at least one compound selected from the group consisting of a basic compound having an amide group and a base generator having an amide group.
    Type: Grant
    Filed: June 20, 2023
    Date of Patent: March 19, 2024
    Assignee: FUJIFILM Corporation
    Inventors: Atsuyasu Nozaki, Misaki Takashima, Naoki Sato, Atsushi Nakamura
  • Patent number: 8685328
    Abstract: In order to remove a pathogenic effect of a microorganism in a room or a work space in a short period of time, an ion diffusing apparatus, which includes an ion generator (17, 18) for generating positive ions each including H+(H2O)m and negative ions each including O2?(H2O)n, where m and n are arbitrary integers, and a blower for delivering the positive ions and the negative ions, which are generated from the ion generator (17), from a blowout opening, is operated to widely distribute, with a high concentration, the positive ions and the negative ions in the room.
    Type: Grant
    Filed: May 21, 2009
    Date of Patent: April 1, 2014
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Hiroaki Okano, Kazuo Nishikawa, Hisaharu Yagi, Norihiro Matsuoka, Tomonori Akai, Misaki Nakamura, Yoshihiro Shimizu
  • Publication number: 20130184513
    Abstract: A skin care method using a closed-bottomed casing 2 having an open surface 2a and an ion generating unit 10 in which discharge is generated in the air by applying a high voltage to generate positive ions and negative ions in the casing 2 includes driving the ion generating unit 10 while the open surface 2a is closed by a skin surface to seal the inside of the casing 2, and bringing ions generated in the ion generating unit 10 into contact with the skin surface.
    Type: Application
    Filed: September 13, 2011
    Publication date: July 18, 2013
    Applicant: SHARP KABUSHIKI KAISHA
    Inventors: Emi Saito, Misaki Nakamura
  • Publication number: 20110150697
    Abstract: In order to remove a pathogenic effect of a microorganism in a room or a work space in a short period of time, an ion diffusing apparatus, which includes an ion generator (17, 18) for generating positive ions each including H+(H2O)m and negative ions each including O2?(H2O)n, where m and n are arbitrary integers, and a blower for delivering the positive ions and the negative ions, which are generated from the ion generator (17), from a blowout opening, is operated to widely distribute, with a high concentration, the positive ions and the negative ions in the room.
    Type: Application
    Filed: May 21, 2009
    Publication date: June 23, 2011
    Inventors: Hiroaki Okano, Kazuo Nishikawa, Hisaharu Yagi, Norihiro Matsuoka, Tomonori Akia, Misaki Nakamura, Yoshihiro Shimizu