Patents by Inventor Misaki Tada

Misaki Tada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240117083
    Abstract: A chloroprene-based polymer, wherein: a 1H-NMR spectrum of the chloroprene-based polymer measured in a deuterochloroform solvent has a peak at 5.80 to 6.00 ppm; when an area of the peak at 5.80 to 6.00 ppm is A and an area of a peak at 4.05 to 6.00 ppm is B, A/B is 1.20/100 or less; the 1H-NMR spectrum of the chloroprene-based polymer measured in a deuterochloroform solvent has a peak at 5.40 to 5.60 ppm; when an area of the peak at 5.40 to 5.60 ppm is D and the area of the peak at 4.05 to 6.00 ppm is B, D/B is 97.20/100 or less, is provided.
    Type: Application
    Filed: March 24, 2022
    Publication date: April 11, 2024
    Applicant: DENKA COMPANY LIMITED
    Inventors: Seiya TOMIZAWA, Wataru NISHINO, Misaki TADA
  • Publication number: 20240117161
    Abstract: A chloroprene-based polymer latex including a chloroprene-based polymer, wherein: an amount of substance of alkali metal cation per unit mass in the chloroprene-based polymer latex is 0.05 to 0.12 mmol/g, when the chloroprene-based polymer latex is freeze-dried to obtain a solid content containing the chloroprene-based polymer, and an ethanol-toluene azeotropic mixture soluble content specified in JIS K 6229 is extracted by refluxing from the solid content to obtain an extract, and the obtained extract is acid treated with hydrochloric acid, an amount of rosin acid of in the solid content measured by gas chromatography is 1.4 to 4.2% by mass with respect to 100% by mass of the chloroprene-based polymer in the solid content, is provided.
    Type: Application
    Filed: March 24, 2022
    Publication date: April 11, 2024
    Applicant: DENKA COMPANY LIMITED
    Inventors: Seiya TOMIZAWA, Wataru NISHINO, Misaki TADA
  • Publication number: 20240034819
    Abstract: A rubber material containing a sulfur-modified chloroprene polymer, in which a content X (% by mass) of sulfur constituting the sulfur-modified chloroprene polymer and a total amount Y (% by mass) of a conjugate resin acid and a salt of a conjugate resin acid, on the basis of a total amount of the rubber material, satisfy Expression (A) below, and the total amount Y is 1.00% by mass or more. 13.90X?5.
    Type: Application
    Filed: September 3, 2021
    Publication date: February 1, 2024
    Applicant: Denka Company Limited
    Inventors: Yushi KUMAGAI, Hidehiro MATSUDA, Misaki TADA, Gaito KIYOFUJI
  • Patent number: 8436102
    Abstract: Provided are a polychloroprene latex composition giving immersion-molded articles superior in releasability from the mold during immersion molding and also superior in flexibility, a production method thereof and a molded article prepared by using the same. A polychloroprene latex composition containing an alkyldiphenyletherdisulfonic acid alkali-metal salt in an amount of 0.01 to 1.0 part by mass with respect to 100 parts by mass of a polychloroprene latex is prepared by emulsion polymerization of the monomer in the presence of a rosin acid alkali-metal salt and an alkyldiphenyletherdisulfonic acid alkali-metal salt each in an amount of 3 parts or less by mass with respect to 100 parts by mass of the monomer.
    Type: Grant
    Filed: July 6, 2010
    Date of Patent: May 7, 2013
    Assignee: Denki Kagaku Kogyo Kabushiki Kaisha
    Inventors: Ikuka Hashimoto, Misaki Tada, Kosuke Watanabe
  • Publication number: 20120108744
    Abstract: Provided are a polychloroprene latex composition giving immersion-molded articles superior in releasability from the mold during immersion molding and also superior in flexibility, a production method thereof and a molded article prepared by using the same. A polychloroprene latex composition containing an alkyldiphenyletherdisulfonic acid alkali-metal salt in an amount of 0.01 to 1.0 part by mass with respect to 100 parts by mass of a polychloroprene latex is prepared by emulsion polymerization of the monomer in the presence of a rosin acid alkali-metal salt and an alkyldiphenyletherdisulfonic acid alkali-metal salt each in an amount of 3 parts or less by mass with respect to 100 parts by mass of the monomer.
    Type: Application
    Filed: July 6, 2010
    Publication date: May 3, 2012
    Applicant: DENKI KAGAKU KOGYO KABUSHIKI KAISHA
    Inventors: Ikuka Hashimoto, Misaki Tada, Kosuke Watanabe
  • Patent number: 5300204
    Abstract: A method for hydrogen ion-selective electrodialysis, wherein from an aqueous solution containing hydrogen ions on an anode side, the hydrogen ions are selectively permitted to permeate through a membrane to a cathode side, wherein the membrane is a double layer ion exchange membrane comprising an anion exchanger layer on the anode side and a cation exchanger layer on the cathode side, and the anion exchanger layer has an ion exchange capacity of from 0.5 to 4 meq/g dry resin, a fixed ion concentration of from 1 to 10 meq/g H.sub.2 O, a thickness of from 0.1 to 150 .mu.m and an electrical resistance of at most 1 .OMEGA..multidot.cm.sup.2 as measured in a 0.5 mol/l sulfuric acid solution.
    Type: Grant
    Filed: February 17, 1993
    Date of Patent: April 5, 1994
    Assignee: Asahi Glass Company Ltd.
    Inventors: Yoshio Sugaya, Misaki Tada, Haruhisa Miyake