Patents by Inventor Misao Awata

Misao Awata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Heat-developable photosensitive material with antihalation layer
    Patent number: 4376162
    Abstract: A heat-developable photosensitive material is disclosed having a high image sharpness. The material is comprised of a heat-developable photosensitive layer which includes an organic silver salt, a photocatalyst, and a reducing agent. An antihalation layer is provided on the opposite face of the material with respect to the side intended for imagewise exposure. The antihalation layer contains a photosensitive halogen-containing compound which reduces the pH of the antihalation layer by photolysis and is colored with a dye which causes a change of color when the pH of the antihalation layer is reduced.
    Type: Grant
    Filed: October 19, 1981
    Date of Patent: March 8, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Ken Kawata, Isamu Itoh, Misao Awata, Takao Masuda