Patents by Inventor Misao Date

Misao Date has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of operating substrate processing apparatus and substrate processing apparatus
    Patent number: 8550875
    Abstract: A method of operating a substrate processing apparatus, upon the occurrence of a nonfatal failure in the apparatus, makes it possible to continue part of the apparatus operations for substrates to clean and recover a substrate or to easily discharge a substrate from the apparatus, without stopping an entire apparatus, thereby reducing the risk of a substrate becoming unprocessable. The method of operating a substrate processing apparatus having a polishing section, a cleaning section and a transferring mechanism, includes: classifying substrates, upon detection of a malfunction in any of the polishing section, the cleaning section and the transferring mechanism, according to the site of the malfunction and to the positions of the substrates in the substrate processing apparatus; and carrying out an operation for each of the substrates after the detection of the malfunction, the operation varying depending on the classification of the substrate.
    Type: Grant
    Filed: May 18, 2012
    Date of Patent: October 8, 2013
    Assignee: Ebara Corporation
    Inventors: Hiroomi Torii, Hiroaki Nishida, Hiroyuki Kaneko, Misao Date, Takashi Mitsuya, Takamasa Nakamura
  • METHOD OF OPERATING SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS
    Publication number: 20120231703
    Abstract: A method of operating a substrate processing apparatus, upon the occurrence of a nonfatal failure in the apparatus, makes it possible to continue part of the apparatus operations for substrates to clean and recover a substrate or to easily discharge a substrate from the apparatus, without stopping an entire apparatus, thereby reducing the risk of a substrate becoming unprocessable. The method of operating a substrate processing apparatus having a polishing section, a cleaning section and a transferring mechanism, includes: classifying substrates, upon detection of a malfunction in any of the polishing section, the cleaning section and the transferring mechanism, according to the site of the malfunction and to the positions of the substrates in the substrate processing apparatus; and carrying out an operation for each of the substrates after the detection of the malfunction, the operation varying depending on the classification of the substrate.
    Type: Application
    Filed: May 18, 2012
    Publication date: September 13, 2012
    Inventors: Hiroomi Torii, Hiroaki Nishida, Hiroyuki Kaneko, Misao Date, Takashi Mitsuya, Takamasa Nakamura
  • Method of operating substrate processing apparatus and substrate processing apparatus
    Patent number: 8202139
    Abstract: A method of operating a substrate processing apparatus, upon the occurrence of a nonfatal failure in the apparatus, makes it possible to continue part of the apparatus operations for substrates to clean and recover a substrate or to easily discharge a substrate from the apparatus, without stopping an entire apparatus, thereby reducing the risk of a substrate becoming unprocessable. The method of operating a substrate processing apparatus having a polishing section, a cleaning section and a transferring mechanism, includes: classifying substrates, upon detection of a malfunction in any of the polishing section, the cleaning section and the transferring mechanism, according to the site of the malfunction and to the positions of the substrates in the substrate processing apparatus; and carrying out an operation for each of the substrates after the detection of the malfunction, the operation varying depending on the classification of the substrate.
    Type: Grant
    Filed: January 22, 2009
    Date of Patent: June 19, 2012
    Assignee: Ebara Corporation
    Inventors: Hiroomi Torii, Hiroaki Nishida, Hiroyuki Kaneko, Misao Date, Takashi Mitsuya, Takamasa Nakamura
  • Method of operating substrate processing apparatus and substrate processing apparatus
    Publication number: 20090186557
    Abstract: A method of operating a substrate processing apparatus, upon the occurrence of a nonfatal failure in the apparatus, makes it possible to continue part of the apparatus operations for substrates to clean and recover a substrate or to easily discharge a substrate from the apparatus, without stopping an entire apparatus, thereby reducing the risk of a substrate becoming unprocessable. The method of operating a substrate processing apparatus having a polishing section, a cleaning section and a transferring mechanism, includes: classifying substrates, upon detection of a malfunction in any of the polishing section, the cleaning section and the transferring mechanism, according to the site of the malfunction and to the positions of the substrates in the substrate processing apparatus; and carrying out an operation for each of the substrates after the detection of the malfunction, the operation varying depending on the classification of the substrate.
    Type: Application
    Filed: January 22, 2009
    Publication date: July 23, 2009
    Inventors: Hiroomi Torii, Hiroaki Nishida, Hiroyuki Kaneko, Misao Date, Takashi Mitsuya, Takamasa Nakamura