Patents by Inventor Misumi Kadoi

Misumi Kadoi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Specimen Processing Holder and Specimen Processing Method
    Publication number: 20240021405
    Abstract: A holder includes a first sub holder configured to hold a primary specimen, and a second sub holder configured to hold a support member. The primary specimen is processed in a first state where the holder is disposed within a first specimen processing apparatus. Subsequently, in a second state where the holder is disposed within a second specimen processing apparatus, a secondary specimen is prepared from the primary specimen, the secondary specimen is moved onto the support member, and a thin film specimen is prepared from the secondary specimen.
    Type: Application
    Filed: July 14, 2023
    Publication date: January 18, 2024
    Inventors: Yoshikazu Sasaki, Tomohisa Fukuda, Tomohiro Mihira, Norimasa Sakuta, Misumi Kadoi, Tatsuhito Kimura
  • Deposition method and focused ion beam system
    Patent number: 9824856
    Abstract: A deposition method is implemented in a focused ion beam system that supplies a compound gas to a specimen, and applies an ion beam to the specimen to deposit a deposition film, the deposition method including: a first deposition film-depositing step that deposits a first deposition film on the specimen using the ion beam that is defocused with respect to the specimen; and a second deposition film-depositing step that deposits a second deposition film on the first deposition film using the ion beam that is smaller in defocus amount than that used in the first deposition film-depositing step.
    Type: Grant
    Filed: December 2, 2015
    Date of Patent: November 21, 2017
    Assignee: JEOL Ltd.
    Inventor: Misumi Kadoi
  • Deposition Method and Focused Ion Beam System
    Publication number: 20160163507
    Abstract: A deposition method is implemented in a focused ion beam system that supplies a compound gas to a specimen, and applies an ion beam to the specimen to deposit a deposition film, the deposition method including: a first deposition film-depositing step that deposits a first deposition film on the specimen using the ion beam that is defocused with respect to the specimen; and a second deposition film-depositing step that deposits a second deposition film on the first deposition film using the ion beam that is smaller in defocus amount than that used in the first deposition film-depositing step.
    Type: Application
    Filed: December 2, 2015
    Publication date: June 9, 2016
    Inventor: Misumi Kadoi