Abstract: This disclosure describes systems, methods, and devices related to fault isolation via electron photoemission microscopy (FIVEPM). A system may attach a device under test (DUT) comprising a region of interest (ROI) for fault isolation to a tester device, wherein the DUT is an integrated circuit. The system may pulse an ultraviolet UV beam targeting the ROI on the DUT using a UV laser. The system may capture, using a detector, excited electrons as signals based on the UV beam targeting the ROI. The system may synchronize a time domain electrical signal analyzer to a reference frequency. The system may generate a rastered image associated with the fault isolation.

Abstract: This disclosure describes systems, methods, and devices related to electron beam and nanoprobing techniques with probe tips for fault isolation in integrated circuits. A method may include generating a signal at a circuit device under test while a probe tip electrically interacts with a transistor of the circuit device under test; detecting, based on the signal and the laser at the transistor, an electrical output of the circuit device under test; and identifying, based on the electrical output, a location of a fault at the circuit device under test.