Abstract: [Problem] A compound useful as an active ingredient of a pharmaceutical composition for treating pancreatic cancer is provided. [Solution] The present inventors have studied about a compound that is useful as an active ingredient of a pharmaceutical composition for treating pancreatic cancer and have found that a 4-aminoquinazoline compound has an excellent G12D mutant KRAS inhibition activity and can be used as a therapeutic agent for pancreatic cancer, thus completing the present invention. The 4-aminoquinazoline compound of the present invention or a salt thereof can be used as a therapeutic agent for pancreatic cancer.

Abstract: A substrate processing apparatus that includes a chamber, a substrate support disposed in the chamber, and a connection is provided. The chamber is provided with a bottom including a first flow path, and the substrate support includes a second flow path. The connection connects the first flow path to the second flow path, and the connection includes a sleeve through which the first flow path is in fluid communication with the second flow path, and a core including a first rod segment and a first elastic foam segment. The core is disposed in the sleeve, and a gap is defined between an inner surface of the sleeve and a side surface of the first rod segment.

Abstract: A placing table includes an edge ring disposed to surround a substrate, the edge ring having a first recess portion at a lower portion thereof; an electrostatic chuck having a first placing surface on which the substrate is placed, a second placing surface on which the edge ring is placed, and an electrode embedded therein to face the second placing surface; an annular member disposed to surround the electrostatic chuck, the annular member having a second recess portion; and an elastic member disposed in a space surrounded by the first recess portion, the electrostatic chuck and the second recess portion.

Abstract: An edge ring disposed around a processing target substrate includes a first member of an annular shape, which is made of a first material and has a first inclined portion at a lower portion of an inner peripheral side surface thereof; and a second member of an annular shape, which is made of a second material different from the first material and has a second inclined portion facing the first inclined portion, the second member being provided under the first member.

Abstract: A substrate processing apparatus that includes a chamber, a substrate support disposed in the chamber, and a connection is provided. The chamber is provided with a bottom including a first flow path, and the substrate support includes a second flow path. The connection connects the first flow path to the second flow path, and the connection includes a sleeve through which the first flow path is in fluid communication with the second flow path, and a core including a first rod segment and a first elastic foam segment. The core is disposed in the sleeve, and a gap is defined between an inner surface of the sleeve and a side surface of the first rod segment.

Abstract: Provided is an edge ring to reduce the frequency of replacement of an edge ring used for plasma processing and to suppress the leakage of a heat transfer gas. The edge ring has an annular first member and an annular second member, the first member has a recess on the lower surface and is made of a first material having plasma resistance, and the second member is arranged in the recess of the first member and is made of a second material having a rigidity lower than that of the first material.

Abstract: A placing table includes an edge ring disposed to surround a substrate; an electrostatic chuck having a first placing surface on which the substrate is placed and a second placing surface on which the edge ring is placed; and an elastic member placed at a position lower than the first placing surface within a gap between an inner circumferential surface of the edge ring and a side surface of the electrostatic chuck between the first placing surface and the second placing surface.

Abstract: A placing table includes an edge ring disposed to surround a substrate, the edge ring having a first recess portion at a lower portion thereof; an electrostatic chuck having a first placing surface on which the substrate is placed, a second placing surface on which the edge ring is placed, and an electrode embedded therein to face the second placing surface; an annular member disposed to surround the electrostatic chuck, the annular member having a second recess portion; and an elastic member disposed in a space surrounded by the first recess portion, the electrostatic chuck and the second recess portion.

Abstract: A sintered Al-alloy, which has a composition of 0.2 to 2.0% of Mg, 10.0 to 35.0% of Si, from 0.2 to 4.0% of Cu, and Al and unavoidable impurities in balance, is produced by using a mixture of the main powder (10.0-35.0% of Si, 0.2-2.0% of Cu, and Al and unavoidable impurities in balance) and at least one metal or mother-alloy powder selected from (a)-(i): (a) Mg powder; (b) Al--Mg powder; (c) Al--Cu powder; (d) Al--Mg--Si powder; (e) Al--Cu--Si powder; (f) Al--Mg--Cu powder; (g) Al--Mg--Cu--Si powder; (h) Mg--Cu powder; and, (i) Mg--Cu--Si powder.

Abstract: An aluminum-alloy main-starting powder for producing a sintered aluminum-alloy consists of from 0.1 to 3.0% of Cu, the balance being Al and unavoidable impurities. Mother alloy powder consists of from 4 to 20% of Mg, from 12 to 30% of Si, and Al and unavoidable impurities in balance.

Abstract: A sintered aluminum-alloy consisting essentially in weight of 0.1-2.0% Mg, 0.1-2.0% Si, 0.2-6.0% Cu and Al and unavoidable impurities in balance is produced by sintering a mixture of a first aluminum-alloy starting powder and at least one second aluminum-alloy starting powder. The first aluminum-alloy powder consists of 0.1-3.0% Cu and Al and unavoidable impurities in balance and the second aluminum-alloy is selected from (1) an aluminum alloy starting powder consisting of 4-20% Mg, 12-30% Si and Al and unavoidable impurities in balance and (2) an aluminum-alloy starting powder consisting of from 0.1-20.0% Mg, 1-20% Si, 30-50% Cu and Al and unavoidable impurities in balance.

Abstract: An aluminum-alloy main-starting powder for producing a sintered aluminum-alloy consists of from 0.1 to 3.0% of Cu, the balance being Al and unavoidable impurities. Mother alloy powder consists of from 4 to 20% of Mg, from 12 to 30% of Si, and Al and unavoidable impurities in balance. A mixture of the two powders may also be produced. Further, from 0.2 to 2.0% of a lubricant may be added to the mixture.