Patents by Inventor Mitsugu Sato

Mitsugu Sato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11966718
    Abstract: Placement of bridges connecting CAE tools and virtual ECU simulation tools is facilitated. A virtual developmental environment apparatus includes a processing execution unit and a memory for storing a MILS model including a controller block and a plant block, first setting information, a program for realizing a function in the controller block used in executing simulation of the virtual ECU, and second setting information. The processing execution unit identifies a controller block in the MILS model based on the first setting information, arranges a bridge for connecting the input port and the output port and the I/O port of the virtual ECU to the input port and the output port of the identified controller block, and connects the bridge and the I/O port of the virtual ECU based on the second setting information.
    Type: Grant
    Filed: June 8, 2022
    Date of Patent: April 23, 2024
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Mitsugu Inoue, Koichi Sato
  • Publication number: 20210199357
    Abstract: A cooling device comprises a storehouse having an opening, a door to open and close the opening, and a cooling unit to cool the interior of the storehouse. The cooling unit has a compressor, a condenser, a blower device to blow air to the condenser and the compressor, and a frame pipe. The frame pipe is disposed near the opening and refrigerant, that has been discharged from the compressor but has not reached the condenser, flows therein. The amount of air flow from the blower device is reduced as the interior temperature, which is the temperature inside the storehouse, gets lower or as the elapsed time, which is the time from when the compressor starts operation, becomes longer. The reduction of air flow from the blower device includes stopping the air flow from the blower device.
    Type: Application
    Filed: March 11, 2021
    Publication date: July 1, 2021
    Inventors: Takumi NISHIMURA, Mitsugu SATO, Mitsuyuki SHIRATA
  • Patent number: 10241062
    Abstract: The purpose of the present invention is to eliminate the effort in placement and extraction of samples in observations using transmitted charged particles. A charged particle beam device (601) is characterized by having: a charged particle optical lens tube that irradiates a sample (6) with a primary charged particle beam; a sample stage on which a light emitting member (500) that emits light because of charged particles that have come by transmission internally in the sample (6) or scattering therefrom or a sample platform (600) having the light emitting member (500) is attachably and detachably disposed; and a detector (503) that detects the light emitted by the light emitting member.
    Type: Grant
    Filed: January 22, 2014
    Date of Patent: March 26, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yusuke Ominami, Mitsugu Sato, Kenko Uchida, Sadamitsu Aso, Taku Sakazume, Hideo Morishita, Sukehiro Ito, Takashi Ohshima
  • Patent number: 10176968
    Abstract: The present invention relates to enabling a versatile charged particle beam device, which is used for a wide range of kinds of samples to be observed and has parameters of emission conditions of a primary charged particle beam that is difficult to be registered in advance, to be operated easily and accurately even by a less-experienced operator and to obtain high-resolution images.
    Type: Grant
    Filed: April 4, 2014
    Date of Patent: January 8, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kunji Shigeto, Mitsugu Sato, Tsutomu Saito, Kohtaro Hosoya, Yoshihiro Takahoko, Tohru Ando
  • Patent number: 10020163
    Abstract: For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation screen display observation target setting buttons for changing an observation condition for a specimen including a combination of parameter setting values of a charged particle beam apparatus. The processing unit has the operation screen display a radar chart including a characteristic, indicated by three or more incompatible items, of an observation condition for each of the observation target setting buttons. The radar chart indicates at least items of high resolution, emphasis on surface structure and emphasis on material difference.
    Type: Grant
    Filed: August 2, 2016
    Date of Patent: July 10, 2018
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yayoi Konishi, Mitsugu Sato, Masaki Takano, Shotaro Tamayama, Masako Nishimura, Shunya Watanabe, Mami Konomi
  • Patent number: 9792832
    Abstract: An image display device displays operation items of an electron microscope on an operation screen, and a storage device stores information of assist buttons which display image state information acquired via a detector of the electron microscope. The information of the assist buttons corresponds to image quality of an acquired image via the detector as well as to observation conditions composed of a combination of parameter setting values of the electron microscope, an operation program which analyzes the image quality of the acquired image. The information of the assist buttons is acquired based on analytical results of the image quality as well as current observation conditions, and the assist buttons are displayed on a predetermined part of the operation screen. Accordingly, the skills of a novice user operating a charged particle beam apparatus can be improved.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: October 17, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yayoi Konishi, Hiroyuki Noda, Takahiro Inada, Kunji Shigeto, Tohru Ando, Noriko Iizumi, Ryuichiro Tamochi, Mitsugu Sato
  • Publication number: 20160343542
    Abstract: For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation screen display observation target setting buttons for changing an observation condition for a specimen including a combination of parameter setting values of a charged particle beam apparatus. The processing unit has the operation screen display a radar chart including a characteristic, indicated by three or more incompatible items, of an observation condition for each of the observation target setting buttons. The radar chart indicates at least items of high resolution, emphasis on surface structure and emphasis on material difference.
    Type: Application
    Filed: August 2, 2016
    Publication date: November 24, 2016
    Inventors: Yayoi KONISHI, Mitsugu SATO, Masaki TAKANO, Shotaro TAMAYAMA, Masako NISHIMURA, Shunya WATANABE, Mami KONOMI
  • Patent number: 9443694
    Abstract: For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation screen display observation target setting buttons for changing an observation condition for a specimen including a combination of parameter setting values of a charged particle beam apparatus. The processing unit has the operation screen display a radar chart including a characteristic, indicated by three or more incompatible items, of an observation condition for each of the observation target setting buttons. The radar chart indicates at least items of high resolution, emphasis on surface structure and emphasis on material difference.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: September 13, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yayoi Konishi, Mitsugu Sato, Masaki Takano, Shotaro Tamayama, Masako Nishimura, Shunya Watanabe, Mami Konomi
  • Publication number: 20160118218
    Abstract: The present invention relates to enabling a versatile charged particle beam device, which is used for a wide range of kinds of samples to be observed and has parameters of emission conditions of a primary charged particle beam that is difficult to be registered in advance, to be operated easily and accurately even by a less-experienced operator and to obtain high-resolution images.
    Type: Application
    Filed: April 4, 2014
    Publication date: April 28, 2016
    Inventors: Kunji SHIGETO, Mitsugu SATO, Tsutomu SAITO, Kohtaro HOSOYA, Yoshihiro TAKAHOKO, Tohru ANDO
  • Publication number: 20160025659
    Abstract: The purpose of the present invention is to eliminate the effort in placement and extraction of samples in observations using transmitted charged particles. A charged particle beam device (601) is characterized by having: a charged particle optical lens tube that irradiates a sample (6) with a primary charged particle beam; a sample stage on which a light emitting member (500) that emits light because of charged particles that have come by transmission internally in the sample (6) or scattering therefrom or a sample platform (600) having the light emitting member (500) is attachably and detachably disposed; and a detector (503) that detects the light emitted by the light emitting member.
    Type: Application
    Filed: January 22, 2014
    Publication date: January 28, 2016
    Inventors: Yusuke OMINAMI, Mitsugu SATO, Kenko UCHIDA, Sadamitsu ASO, Taku SAKAZUME, Hideo MORISHITA, Sukehiro ITO, Takashi OHSHIMA
  • Patent number: 9208995
    Abstract: Provided is a charged particle beam apparatus (111) to and from which a diaphragm (101) can be easily attached and detached, and in which a sample (6) can be arranged under vacuum and under high pressure. The charged particle beam apparatus includes: a lens barrel (3) holding a charged particle source (110) and an electron optical system (1,2,7); a first housing (4) connected to the lens barrel (3); a second housing (100) recessed to inside the first housing (4); a first diaphragm (10) separating the space inside the lens barrel (3) and the space inside the first housing (4), and through which the charged particle beam passes; a second diaphragm (101) separating the spaces inside and outside the recessed section (100a) in the second housing (100), and through which the charged particle beam passes; and a pipe (23) connected to a third housing (22) accommodating the charged particle source (110).
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: December 8, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yusuke Ominami, Takashi Ohshima, Hiroyuki Ito, Mitsugu Sato, Sukehiro Ito
  • Patent number: 9202667
    Abstract: Disclosed is a charged particle radiation device having a charged particle source which generates a charged particle as a probe, a charged particle optical system, a sample stage, a vacuum discharge system, an aperture which restricts a probe, a conductive film, and a charged particle detector, wherein the conductive film is provided at a position excluding the optical axis of the optical system between the sample stage and the aperture; and the distance between the sensing surface of the surface of the charged particle detector and the sample stage is larger than the distance between the sample stage and the conductive film, so that the surface of the conductive film and the sensing surface of the detector are inclined.
    Type: Grant
    Filed: August 11, 2010
    Date of Patent: December 1, 2015
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Michio Hatano, Tetsuya Sawahata, Yasuko Watanabe, Mitsugu Sato, Sukehiro Ito, Takashi Ohshima, Hiroyuki Honda
  • Patent number: 9123501
    Abstract: A diffraction aberration corrector formed by the multipole of the solenoid coil ring and having a function of adjusting the degree of orthogonality or axial shift of the vector potential with respect to the beam axis. In order to cause a phase difference, the diffraction aberration corrector that induces a vector potential, which is perpendicular to the beam axis and has a symmetrical distribution within the orthogonal plane with respect to the beam axis, is provided near the objective aperture and the objective lens. A diffracted wave traveling in a state of being inclined from the beam axis passes through the ring of the magnetic flux. Since the phase difference within the beam diameter is increased by the Aharonov-Bohm effect due to the vector potential, the intensity of the electron beam on the sample is suppressed.
    Type: Grant
    Filed: December 26, 2011
    Date of Patent: September 1, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Muneyuki Fukuda, Yoichi Ose, Mitsugu Sato, Hiroyuki Ito, Hiroshi Suzuki, Naomasa Suzuki
  • Patent number: 9058957
    Abstract: A charged particle beam apparatus is provided with a parameter adjustment practice function for allowing any user to easily learn manual focus adjustment and stigma adjustment. Control conditions of the focus arrangement of an objective lens, an X-stigmator and a Y-stigmator are set according to the user's operation. According to a group of the focus adjustment, an X-stigma adjustment and a Y-stigma adjustment which are set, a practice-purpose image corresponding to the control conditions is read out from a storage device and is displayed on a screen.
    Type: Grant
    Filed: May 28, 2012
    Date of Patent: June 16, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kunji Shigeto, Mitsugu Sato, Noriko Iizumi, Hiroyuki Noda, Masako Nishimura, Shunya Watanabe, Mami Konomi, Shinichi Tomita, Ryuichiro Tamochi
  • Patent number: 9040911
    Abstract: Conventionally, in a general-purpose scanning electron microscope, the maximum accelerating voltage which can be set is low, and hence thin crystal samples which can be observed under normal high-resolution observation conditions are limited to samples with large lattice spacing. For this reason, there has no means for accurately performing magnification calibration. As means for solving this problem, the present invention includes an electron source which generates an electron beam, a deflector which deflects the electron beam so as to scan a sample with the electron beam, an objective lens which focuses the electron beam on the sample, a detector which detects an elastically scattered electron and an inelastically scattered electron which are transmitted through the sample, and an aperture disposed between the sample and the detector to control detection angles of the elastically scattered electron and the inelastically scattered electron.
    Type: Grant
    Filed: March 25, 2013
    Date of Patent: May 26, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takeshi Ogashiwa, Mitsugu Sato, Mitsuru Konno
  • Publication number: 20150108351
    Abstract: Conventionally, in a general-purpose scanning electron microscope, the maximum accelerating voltage which can be set is low, and hence thin crystal samples which can be observed under normal high-resolution observation conditions are limited to samples with large lattice spacing. For this reason, there has no means for accurately performing magnification calibration. As means for solving this problem, the present invention includes an electron source which generates an electron beam, a deflector which deflects the electron beam so as to scan a sample with the electron beam, an objective lens which focuses the electron beam on the sample, a detector which detects an elastically scattered electron and an inelastically scattered electron which are transmitted through the sample, and an aperture disposed between the sample and the detector to control detection angles of the elastically scattered electron and the inelastically scattered electron.
    Type: Application
    Filed: March 25, 2013
    Publication date: April 23, 2015
    Inventors: Takeshi Ogashiwa, Mitsugu Sato, Mitsuru Konno
  • Publication number: 20150076348
    Abstract: For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation screen display observation target setting buttons for changing an observation condition for a specimen including a combination of parameter setting values of a charged particle beam apparatus. The processing unit has the operation screen display a radar chart including a characteristic, indicated by three or more incompatible items, of an observation condition for each of the observation target setting buttons. The radar chart indicates at least items of high resolution, emphasis on surface structure and emphasis on material difference.
    Type: Application
    Filed: March 15, 2013
    Publication date: March 19, 2015
    Inventors: Yayoi Konishi, Mitsugu Sato, Masaki Takano, Shotaro Tamayama, Masako Nishimura, Shunya Watanabe, Mami Konomi
  • Publication number: 20150074523
    Abstract: Skills of a novice user operating a charged particle beam apparatus can be improved. Provided are an image display device which displays operation items of an electron microscope on an operation screen, a storage device which stores information of assist buttons which display image state information acquired via a detector of the electron microscope such that the information of assist buttons is correspondent to image quality of the image thus acquired as well as to observation conditions composed of a combination of parameter setting values of the electron microscope, an operation program which analyzes the image quality of the image acquired via the detector, acquires the information of the assist buttons based on analytical results of the image quality of the image as well as current observation conditions, and makes the assist buttons be displayed on the predetermined part of the operation screen.
    Type: Application
    Filed: March 15, 2013
    Publication date: March 12, 2015
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yayoi Konishi, Hiroyuki Noda, Takahiro Inada, Kunji Shigeto, Tohru Ando, Noriko Iizumi, Ryuichiro Tamochi, Mitsugu Sato
  • Publication number: 20150014530
    Abstract: Provided is a charged particle beam apparatus (111) to and from which a diaphragm (101) can be easily attached and detached, and in which a sample (6) can be arranged under vacuum and under high pressure. The charged particle beam apparatus includes: a lens barrel (3) holding a charged particle source (110) and an electron optical system (1,2,7); a first housing (4) connected to the lens barrel (3); a second housing (100) recessed to inside the first housing (4); a first diaphragm (10) separating the space inside the lens barrel (3) and the space inside the first housing (4), and through which the charged particle beam passes; a second diaphragm (101) separating the spaces inside and outside the recessed section (100a) in the second housing (100), and through which the charged particle beam passes; and a pipe (23) connected to a third housing (22) accommodating the charged particle source (110).
    Type: Application
    Filed: February 15, 2013
    Publication date: January 15, 2015
    Applicant: Hitachi High-TEchnologies Corporation
    Inventors: Yusuke Ominami, Takashi Ohshima, Hiroyuki Ito, Mitsugu Sato, Sukehiro Ito
  • Publication number: 20140131590
    Abstract: In recent years, a range of users for a charged particle beam apparatus such as a scanning electron microscope has been broadened. All users want to learn a manual adjustment technology, but it is very difficult to adjust all parameters for observation to have an appropriate value. Therefore, a beginner is unlikely to sufficiently show a performance of an apparatus. This disclosure aims to provide the charged particle beam apparatus including a parameter adjustment practice function for allowing any user to easily learn the manual adjustment technology. In order to solve the above-described problem, there is provided means for practicing a focus adjustment and a stigma adjustment. Control conditions of the focus arrangement of an objective lens, an X-stigmator and a Y-stigmator are set according to the user's operation.
    Type: Application
    Filed: May 28, 2012
    Publication date: May 15, 2014
    Inventors: Kunji Shigeto, Mitsugu Sato, Noriko Iizumi, Hiroyuki Noda, Masako Nishimura, Shunya Watanabe, Mami Konomi, Shinichi Tomita, Ryuichiro Tamochi