Abstract: A solid-state imaging device includes: an imager including pixels arranged in rows and columns; vertical transfer portions in one-to-one correspondence with columns of the pixels, each of which includes a readout electrode that reads out signal charges generated in the pixels and a transfer electrode that transfers the read-out signal charges in the column direction; and a horizontal transfer portion which transfers, in the row direction, the signal charges transferred by the vertical transfer portions, and outputs the signal charges. The imager is formed by alternately disposing, in the column direction, a first row in which visible light pixels each including a first photoelectric converter that converts visible light into signal charges are arranged adjacent in the row direction and a second row in which infrared light pixels each including a second photoelectric converter that converts infrared light into signal charges are arranged adjacent in the row direction.

Abstract: A solid-state imaging device includes: an imager including pixels arranged in rows and columns; vertical transfer portions in one-to-one correspondence with columns of the pixels, each of which includes a readout electrode that reads out signal charges generated in the pixels and a transfer electrode that transfers the read-out signal charges in the column direction; and a horizontal transfer portion which transfers, in the row direction, the signal charges transferred by the vertical transfer portions, and outputs the signal charges. The imager is formed by alternately disposing, in the column direction, a first row in which visible light pixels each including a first photoelectric converter that converts visible light into signal charges are arranged adjacent in the row direction and a second row in which infrared light pixels each including a second photoelectric converter that converts infrared light into signal charges are arranged adjacent in the row direction.

Abstract: In a method for manufacturing a solid-state image sensor including forming a photodetector portion for a photoelectric conversion in a semiconductor substrate, and forming a shift register for transferring a signal charge read out from the photodetector portion, an annealing is carried out after an ion implantation for forming a buried channel region constituting the shift register. It is possible to provide a method for manufacturing a solid-state image sensor that avoids the formation of crystal defects in a shift register and a photodetector portion and achieves an excellent output image quality and a large saturation electric charge.